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公开(公告)号：US20220230773A1
公开(公告)日：2022-07-21
申请号：US17715411
申请日：2022-04-07
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US11328833B2
公开(公告)日：2022-05-10
申请号：US17485281
申请日：2021-09-24
IPC分类号： B32B3/10 , H01B1/08 , H01B3/10 , H01B13/00 , H01L51/00 , H01M8/124 , H01M4/04 , H01M6/40 , G02B1/118 , B82Y30/00 , H01L51/44 , H01M8/1286 , H01L51/52
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy, Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US11961628B2
公开(公告)日：2024-04-16
申请号：US18098804
申请日：2023-01-19
IPC分类号： B32B3/10 , G02B1/118 , H01B1/08 , H01B3/10 , H01B13/00 , H01M4/04 , H01M6/40 , H01M8/124 , H10K71/20 , B82Y30/00 , H01M8/1286 , H10K30/82 , H10K50/813 , H10K102/00
CPC分类号： H01B1/08 , G02B1/118 , H01B3/10 , H01B13/003 , H01M4/04 , H01M6/40 , H01M8/124 , H10K71/211 , B82Y30/00 , H01M4/0433 , H01M8/1286 , H10K30/82 , H10K50/813 , H10K2102/331 , Y02P70/50 , Y10T428/24893
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US11133118B2
公开(公告)日：2021-09-28
申请号：US13900248
申请日：2013-05-22
IPC分类号： B32B3/10 , H01B1/08 , H01B3/10 , H01B13/00 , H01L51/00 , H01M8/124 , H01M4/04 , H01M6/40 , B82Y30/00 , H01L51/44 , H01M8/1286 , H01L51/52
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder material, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a suitable pattern on to the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and suitably joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may, in turn, be arranged to form a three-dimensional patterned nanostructure in accordance with suitable applications.
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公开(公告)号：US20140072720A1
公开(公告)日：2014-03-13
申请号：US13900248
申请日：2013-05-22
CPC分类号： H01B1/08 , B82Y30/00 , H01B3/10 , H01B13/003 , H01L51/0015 , H01L51/442 , H01L51/5209 , H01L2251/5369 , H01M4/04 , H01M6/40 , H01M8/124 , H01M8/1286 , Y02P70/56
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder material, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a suitable pattern on to the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and suitably joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may, in turn, be arranged to form a three-dimensional patterned nanostructure in accordance with suitable applications.
摘要翻译： 方面涉及图案化纳米结构，其特征尺寸不包括膜厚度低于5微米。 图案化纳米结构由平均粒度小于100nm的纳米颗粒构成。 将纳米粒子组合物（在一些情况下包括粘合剂材料）施加到基底上。 与电磁辐射一起使用的图案化模具用于在形成图案化纳米结构时操纵纳米颗粒组合物。 在一些实施方案中，图案化的模具将合适的图案纳米压印到纳米颗粒组合物上，并且组合物通过UV或热能固化。 可以形成三维图案化纳米结构。 可以制备多个图案化的纳米结构层并适当地接合在一起。 在一些情况下，图案化的纳米结构可以形成为从其初始形成的基底可释放的层。 这样的可释放层又可以根据适当的应用被布置成形成三维图案化的纳米结构。
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公开(公告)号：US20230154641A1
公开(公告)日：2023-05-18
申请号：US18098804
申请日：2023-01-19
CPC分类号： H01B1/08 , G02B1/118 , H01B3/10 , H01B13/003 , H01M4/04 , H01M6/40 , H01M8/124 , H10K71/211 , B82Y30/00
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US11282616B2
公开(公告)日：2022-03-22
申请号：US16578524
申请日：2019-09-23
IPC分类号： B32B3/10 , H01B1/08 , H01B3/10 , H01B13/00 , H01L51/00 , H01M8/124 , H01M4/04 , H01M6/40 , B82Y30/00 , H01L51/44 , H01M8/1286 , H01L51/52
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder material, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a suitable pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure in accordance with suitable applications.
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公开(公告)号：US20220013247A1
公开(公告)日：2022-01-13
申请号：US17485281
申请日：2021-09-24
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy, Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US20230352206A1
公开(公告)日：2023-11-02
申请号：US18347034
申请日：2023-07-05
CPC分类号： H01B1/08 , H01B3/10 , H01B13/003 , H01M8/124 , H01M4/04 , H01M6/40 , G02B1/118 , H10K71/211 , B82Y30/00
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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公开(公告)号：US11587696B2
公开(公告)日：2023-02-21
申请号：US17715411
申请日：2022-04-07
IPC分类号： B32B3/10 , H01B1/08 , H01B3/10 , H01B13/00 , H01L51/00 , H01M8/124 , H01M4/04 , H01M6/40 , G02B1/118 , B82Y30/00 , H01L51/44 , H01M8/1286 , H01L51/52
摘要： Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
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