公开(公告)号：US20170183795A1

公开(公告)日：2017-06-29

申请号：US15327503

申请日：2015-07-23

申请人： VALORISATION-RECHERCHE, LIMITED PARTNERSHIP

发明人： Luc STAFFORD ,  Leron VANDSBURGER ,  Richard LEONELLI ,  Jason AFONSO-FERREIRA

IPC分类号： C30B31/20 ,  C30B31/08 ,  H01L21/02 ,  H01J37/32 ,  H01L33/00 ,  H01L29/16 ,  H01L21/223 ,  C30B29/40 ,  H01L29/20

CPC分类号： C30B31/20 ,  B82Y40/00 ,  C30B29/02 ,  C30B29/406 ,  C30B31/08 ,  H01J37/32192 ,  H01J37/32706 ,  H01J2237/303 ,  H01J2237/316 ,  H01J2237/3165 ,  H01J2237/31701 ,  H01L21/02527 ,  H01L21/0254 ,  H01L21/02603 ,  H01L21/02664 ,  H01L21/2236 ,  H01L29/1606 ,  H01L29/2003 ,  H01L33/0075

摘要： There are provided non-destructive methods for incorporating an atom such as N into a material such as graphene. The methods can comprise subjecting a gas comprising the atom to conditions to obtain a flowing plasma afterglow then exposing the material to the flowing plasma afterglow. There are also provided materials such as N-doped graphene produced by such methods.