Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby
    2.
    发明申请
    Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby 失效
    具有污染抑制的光刻设备,器件制造方法以及由此制造的器件

    公开(公告)号:US20050122491A1

    公开(公告)日:2005-06-09

    申请号:US10985037

    申请日:2004-11-10

    IPC分类号: G03F7/20 H01L21/027 G03B27/52

    摘要: A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

    摘要翻译: 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台,用于将图案化的辐射束投影到基板的目标部分上的投影系统,以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元,以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。

    Radiation source
    6.
    发明申请
    Radiation source 失效
    辐射源

    公开(公告)号:US20070152175A1

    公开(公告)日:2007-07-05

    申请号:US11319770

    申请日:2005-12-29

    IPC分类号: G21G4/00

    摘要: A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.

    摘要翻译: 辐射源产生用于光刻的短波长辐射,例如极紫外辐射。 提供旋转电极,其浸入液体金属例如锡的各个浴中。 在电极之间产生放电以产生辐射。 在电极周围设置孔和/或在电极周围的金属屏蔽板中,以便在排出附近更好地向下降低压力以提高源的转换效率。 电极中的孔通过搅拌液态金属而改善电极的冷却,并改善电极和液态金属之间的热和电接触。 改善的电接触也降低了放电电路的时间常数,从而进一步提高了源的转换效率。

    Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
    10.
    发明申请
    Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation 有权
    光刻设备,照明系统和提供EUV辐射投影光束的方法

    公开(公告)号:US20050121624A1

    公开(公告)日:2005-06-09

    申请号:US10727035

    申请日:2003-12-04

    CPC分类号: G03F7/70858 G03F7/70916

    摘要: A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.

    摘要翻译: 公开了一种光刻设备。 光刻设备包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 照明系统包括产生极紫外辐射的辐射生产系统和收集极紫外辐射的辐射收集系统。 作为极紫外线辐射产物的副产物产生的颗粒基本上沿颗粒移动方向移动。 辐射采集系统被布置成收集与收集方向辐射的极微紫外辐射,其与颗粒运动方向基本上不同。