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    Radiation source
    1.
    发明申请
    Radiation source 失效
    辐射源

    公开(公告)号：US20070152175A1

    公开(公告)日：2007-07-05

    申请号：US11319770

    申请日：2005-12-29

    申请人： Johannes Moors ,  Vadim Banine ,  Johannes Christiaan Franken ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Alexander Struycken

    发明人： Johannes Moors ,  Vadim Banine ,  Johannes Christiaan Franken ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Alexander Struycken

    IPC分类号： G21G4/00

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005

    摘要： A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.

    摘要翻译： 辐射源产生用于光刻的短波长辐射，例如极紫外辐射。 提供旋转电极，其浸入液体金属例如锡的各个浴中。 在电极之间产生放电以产生辐射。 在电极周围设置孔和/或在电极周围的金属屏蔽板中，以便在排出附近更好地向下降低压力以提高源的转换效率。 电极中的孔通过搅拌液态金属而改善电极的冷却，并改善电极和液态金属之间的热和电接触。 改善的电接触也降低了放电电路的时间常数，从而进一步提高了源的转换效率。

    Optical apparatus, lithographic apparatus and device manufacturing method
    5.
    发明申请
    Optical apparatus, lithographic apparatus and device manufacturing method 失效
    光学设备，光刻设备和器件制造方法

    公开(公告)号：US20070158579A1

    公开(公告)日：2007-07-12

    申请号：US11643955

    申请日：2006-12-22

    申请人： Johannes Moors ,  Vadim Banine ,  Bastiaan Wolschrijn ,  Carolus Antonius Spee ,  Rik Jansen

    发明人： Johannes Moors ,  Vadim Banine ,  Bastiaan Wolschrijn ,  Carolus Antonius Spee ,  Rik Jansen

    IPC分类号： H01J27/00

    CPC分类号： G03F7/2043 ,  G03F7/70041 ,  G03F7/70925

    摘要： An optical apparatus includes an illumination system configured to form a pulsed radiation beam, an optical element with a surface on which the radiation beam is incident in operation, and a gas source arranged to supply a mixture of a first type of gas and a second type of gas to a space adjacent the surface. Particles of the first and second types of gas are capable of reacting with the surface, when activated by the radiation beam. The gas source is configured to generate a combination of surface occupation numbers of molecules of the first and second types of gas on the surface under operating conditions, at least prior to pulses of the radiation beam, the combination of surface occupation numbers lying in a range in which reactions of particles with the surface during pulses of the radiation beam are in majority reversed.

    摘要翻译： 光学装置包括被配置为形成脉冲辐射束的照明系统，具有辐射束在其中入射的表面的光学元件，以及设置成供应第一类型气体和第二类型的混合物的气体源 的气体到邻近表面的空间。 当由辐射束激活时，第一和第二类气体的颗粒能够与表面反应。 气源被配置成至少在辐射束的脉冲之前，在工作条件下，在表面上产生第一和第二类气体的分子的表面占有数量的组合，表面占有数的组合在一个范围内 其中在辐射束的脉冲期间颗粒与表面的反应多数反转。

    Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus
    8.
    发明申请
    Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus 有权
    光刻设备和辐射源包括用于减轻光刻设备中的碎屑颗粒的碎片减轻系统和方法

    公开(公告)号：US20050139785A1

    公开(公告)日：2005-06-30

    申请号：US10747613

    申请日：2003-12-30

    申请人： Vadim Banine ,  Johannes De Kuster ,  Johannes Moors ,  Frank Schuurmans ,  Lucas Stevens

    发明人： Vadim Banine ,  Johannes De Kuster ,  Johannes Moors ,  Frank Schuurmans ,  Lucas Stevens

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70908 ,  G03F7/70916

    摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

    摘要翻译： 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源，提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。 碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。

    Lithographic apparatus having a monitoring device for detecting contamination
    9.
    发明申请
    Lithographic apparatus having a monitoring device for detecting contamination 失效
    具有用于检测污染物的监测装置的平版印刷设备

    公开(公告)号：US20070138414A1

    公开(公告)日：2007-06-21

    申请号：US11311624

    申请日：2005-12-20

    申请人： Lucas Stevens ,  Vadim Banine ,  Johannes Moors ,  Bastiaan Wolschrijn

    发明人： Lucas Stevens ,  Vadim Banine ,  Johannes Moors ,  Bastiaan Wolschrijn

    IPC分类号： G01J3/10

    CPC分类号： G01N21/9501 ,  G01N21/94 ,  G03F7/70916

    摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.

    摘要翻译： 公开了一种光刻设备。 该装置包括被配置为将第一辐射束投射到基板的目标部分上的投影系统，以及用于检测内部空间中的污染的至少一个监视装置。 监测装置包括至少一个具有至少一个污染物接收表面的虚拟元件。 在本发明的一个方面中，提供了至少一个虚拟元件，其不参与将辐射束传送到基板的目标部分上，其中监视虚设元件的污染物接收表面是否已被污染。