Lithographic apparatus and device manufacturing method
    3.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US06864958B2

    公开(公告)日:2005-03-08

    申请号:US10613218

    申请日:2003-07-07

    摘要: A programmable patterning structure for use with a lithographic projection apparatus according to one embodiment of the invention includes a plurality of reflective elements A, B, C, each reflective element having two distributed Bragg reflectors 51, 52. A separation D1 between the two distributed Bragg reflectors is adjustable between a first relation, at which destructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in substantially zero reflectivity, and a second relation, in which constructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in high reflectivity.

    摘要翻译: 与根据本发明的一个实施例的光刻投影设备一起使用的可编程图案化结构包括多个反射元件A,B,C,每个反射元件具有两个分布布拉格反射器51,52。两个分布布拉格 反射器可以在第一关系之间调节,在第一关系处,来自第一和第二分布布拉格反射器51,52的反射之间的相消干涉导致基本上为零的反射率,以及第二关系,其中来自第一和第二分布式布拉格反射器的反射之间的相长干涉 51,52导致高反射率。

    Lithographic apparatus and device manufacturing method
    9.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US06992754B2

    公开(公告)日:2006-01-31

    申请号:US11019215

    申请日:2004-12-23

    IPC分类号: G03B27/54 G03B27/42 G03F1/00

    摘要: A programmable patterning structure for use with a lithographic projection apparatus according to one embodiment of the invention includes a plurality of reflective elements A, B, C, each reflective element having two distributed Bragg reflectors 51, 52. A separation D1 between the two distributed Bragg reflectors is adjustable between a first relation, at which destructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in substantially zero reflectivity, and a second relation, in which constructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in high reflectivity.

    摘要翻译: 与根据本发明的一个实施例的光刻投影设备一起使用的可编程图案化结构包括多个反射元件A,B,C,每个反射元件具有两个分布式布拉格反射器51,52。两个分布式 布拉格反射器可以在第一关系之间调节,在第一关系处,来自第一和第二分布布拉格反射器51,52的反射之间的相消干涉导致基本上为零的反射率,以及第二关系,其中来自第一和第二分布布拉格 反射器51,52导致高反射率。

    Lithographic apparatus and device manufacturing method
    10.
    发明申请
    Lithographic apparatus and device manufacturing method 审中-公开
    平版印刷设备和器件制造方法

    公开(公告)号:US20080259298A1

    公开(公告)日:2008-10-23

    申请号:US11785745

    申请日:2007-04-19

    IPC分类号: G03B27/42

    摘要: A lithographic apparatus for maskless EUV applications includes an illumination system constructed and arranged to condition a radiation beam and to supply the conditioned radiation beam to a spatial light modulator, a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the conditioned radiation beam onto a target portion of the substrate. The illumination system includes a field facet mirror constructed and arranged to define a field of the conditioned radiation beam. The field facet mirror is constructed and arranged to optically match a source of radiation and the illumination system.

    摘要翻译: 用于无掩模EUV应用的光刻设备包括被构造和布置成调节辐射束并且将经调节的辐射束提供给空间光调制器的照明系统,被构造和布置成保持衬底的衬底台,以及构造和布置的投影系统 以将调节的辐射束投影到基板的目标部分上。 照明系统包括构造和布置成限定经调节的辐射束的场的场面反射镜。 场面反射镜被构造和布置成光学匹配辐射源和照明系统。