公开(公告)号：US07193229B2

公开(公告)日：2007-03-20

申请号：US11022943

申请日：2004-12-28

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Yurievich Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Yurievich Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H01J49/00

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

摘要翻译： 光刻设备包括用于产生辐射的源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括用于减轻随着辐射产生而释放的碎片颗粒的碎片减轻系统和用于收集辐射的光学系统。 碎片减缓系统被设置为直接蒸发碎片颗粒，或直接对碎屑颗粒进行充填，或直接从碎片颗粒或其任何组合产生等离子体，辐射沿着该路径从源传播到 光学系统。

公开(公告)号：US20060138350A1

公开(公告)日：2006-06-29

申请号：US11022943

申请日：2004-12-28

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

摘要翻译： 光刻设备包括用于产生辐射的源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括用于减轻随着辐射产生而释放的碎片颗粒的碎片减轻系统和用于收集辐射的光学系统。 碎片减缓系统被设置为直接蒸发碎片颗粒，或直接对碎屑颗粒进行充填，或直接从碎片颗粒或其任何组合产生等离子体，辐射沿着该路径从源传播到 光学系统。

公开(公告)号：US07279690B2

公开(公告)日：2007-10-09

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

IPC分类号： H05H3/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US07167232B2

公开(公告)日：2007-01-23

申请号：US10747613

申请日：2003-12-30

申请人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

发明人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

IPC分类号： G03B27/42

CPC分类号： G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

摘要翻译： 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源，提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。 碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。

公开(公告)号：US07897110B2

公开(公告)日：2011-03-01

申请号：US11311623

申请日：2005-12-20

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G01N7/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US08445873B2

公开(公告)日：2013-05-21

申请号：US13478446

申请日：2012-05-23

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G21G5/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US07868304B2

公开(公告)日：2011-01-11

申请号：US11051477

申请日：2005-02-07

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Johannes Christiaan Leonardus Franken ,  Arnoud Cornelis Wassink ,  Paul Peter Anna Antonius Brom

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Johannes Christiaan Leonardus Franken ,  Arnoud Cornelis Wassink ,  Paul Peter Anna Antonius Brom

IPC分类号： A61N5/00

CPC分类号： G03F7/70175 ,  G03F7/70916

摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

摘要翻译： 用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。 光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。 辐射收集器被周向壳体和气体屏障包围。 入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。

公开(公告)号：US07508487B2

公开(公告)日：2009-03-24

申请号：US10719065

申请日：2003-11-24

申请人： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

发明人： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70558 ,  G03F7/70883 ,  G03F7/70933 ,  G03F7/70941

摘要： In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.

摘要翻译： 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。

公开(公告)号：US07251012B2

公开(公告)日：2007-07-31

申请号：US10748851

申请日：2003-12-31

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Vladimir Vitalevitch Ivanov ,  Johannes Hubertus Josephina Moors ,  Givi Georgievitch Zukavishvili ,  Abraham Veefkind

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Vladimir Vitalevitch Ivanov ,  Johannes Hubertus Josephina Moors ,  Givi Georgievitch Zukavishvili ,  Abraham Veefkind

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，以及减轻碎片颗粒的碎片减轻系统，该碎片减小系统在使用期间形成的碎屑颗粒的至少一部分 光刻设备 碎片减轻系统被布置成施加磁场，使得至少带电的碎屑颗粒被减轻。

公开(公告)号：US08217347B2

公开(公告)日：2012-07-10

申请号：US13021226

申请日：2011-02-04

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G01N23/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。