公开(公告)号：US20200298344A1

公开(公告)日：2020-09-24

申请号：US16774261

申请日：2020-01-28

Applicant: VIA MECHANICS, LTD.

Inventor： Atsushi SAKAMOTO ,  Masaru FUTAANA ,  Takeshi SATOH ,  Yusuke TAKEGAWA

IPC: B23K26/388 ,  G02F1/33 ,  G02B26/08 ,  G02B26/10 ,  B23K26/064 ,  B23K26/06 ,  B23K26/073 ,  B23K26/082 ,  B23K26/40

Abstract: A laser processing apparatus includes: a laser oscillator configured to oscillate a laser pulse; a first laser deflection unit configured to deflect the laser pulse emitted from the laser oscillator in a two-dimensional direction; a second laser deflection unit having a slower operation speed and configured to deflect the laser pulse emitted from the first laser deflection unit in a two-dimensional direction on a same plane; a laser oscillation control unit configured to control the laser oscillator; and first and second laser deflection control units respectively configured to control operations of the first and second laser deflection units. The first laser deflection control unit controls the first laser deflection unit to successively irradiate the laser pulse to multiple sites along a predetermined track in each of the processing positions in turn, and to change energy of the laser pulse emitted therefrom in a middle of repeated irradiation.

公开(公告)号：US20200004057A1

公开(公告)日：2020-01-02

申请号：US16447474

申请日：2019-06-20

Applicant: Via Mechanics, Ltd.

Inventor： Kazuya MATSUMOTO ,  Kazuo WATANABE ,  Atsushi SAKAMOTO ,  Masanori SATO ,  Mitsuru KATO ,  Masaru KIKUCHI

IPC: G02F1/11 ,  H01S3/00 ,  H05K3/00 ,  B23K26/382

Abstract: A laser processing apparatus disclosed in the present application includes: an optical deflection unit capable of changing a deflection direction of and outgoing energy of an incoming laser pulse by changes of a frequency of and an amplitude of a driving signal to be supplied; and a control unit configured to supply driving signals with amplitudes corresponding to respective frequencies. In a laser processing apparatus configured to process a workpiece by leading outgoing laser pulse of the optical deflection unit to the workpiece and irradiating the workpiece with the laser pulse, as the amplitude corresponding to each of the frequencies, the control unit supplies an amplitude having the ratio that is close to the lowest ratio among ratios of the outgoing energy with respect to the incoming energy of the laser pulse at an amplitude having the largest outgoing energy of the optical deflection unit.