公开(公告)号：US20180034229A1

公开(公告)日：2018-02-01

申请号：US15654335

申请日：2017-07-19

Applicant: Via Mechanics, Ltd.

Inventor： Nobuyoshi OHTANI ,  Goichi OHMAE

IPC: H01S3/041 ,  H01S3/038 ,  H01S3/04 ,  H01S3/03 ,  H01S3/00 ,  H01S3/034 ,  H01S3/22 ,  H01S3/063

CPC classification number: H01S3/041 ,  H01S3/0071 ,  H01S3/0315 ,  H01S3/034 ,  H01S3/0384 ,  H01S3/0401 ,  H01S3/0402 ,  H01S3/063 ,  H01S3/22 ,  H03B17/00

Abstract: In a laser oscillator, a pair of electrodes is disposed in a housing into which a gas is sealed, a waveguide is formed by the pair of electrodes, and a laser beam is configured to be extracted from an end of the housing. The laser oscillator includes a mirror holder attached to an end of the electrode, the end serving as an end of the waveguide, and a reflection mirror attached to the mirror holder and reflecting a laser beam generated in the waveguide. In the laser oscillator, a passage through which a cooling medium is passed is formed inside each of the pair of electrodes.

公开(公告)号：US20150063397A1

公开(公告)日：2015-03-05

申请号：US14470148

申请日：2014-08-27

Applicant: Via Mechanics, Ltd.

Inventor： Hideho YAMAMURA ,  Goichi OHMAE ,  Nobuyoshi OHTANI

IPC: H01S3/032 ,  H01S3/07

CPC classification number: H01S3/032 ,  H01S3/03 ,  H01S3/0305 ,  H01S3/034 ,  H01S3/036 ,  H01S3/09705 ,  H01S3/134

Abstract: The present invention aims to prevent, in a gas laser resonator, the deterioration in quality of discharge by reduction of the change of the pressure in a discharge chamber and the inflow of impurity gases, such as air, into the discharge chamber.A bracket 6 is attached to one end of a tube 1 interposing a gasket 13 only for sealing an opening of the discharge chamber 2 only and a gasket 14 for sealing both openings of the discharge chamber 2 and a buffer chamber 12. Also, a glass plate 8 and further a bracket 9 are attached to the other end of the tube 1 interposing a gasket 15 only for sealing the opening of the discharge chamber 2 and a gasket 16 for sealing both openings of the discharge chamber 2 and the buffer chamber 12. The pressure in the buffer chamber 12 is set lower than that of the discharge chamber 2 or set higher than the atmospheric pressure to decrease the inflow of the impurity gases to the discharge chamber 2.

Abstract translation: 本发明旨在通过减小放电室中的压力变化和诸如空气的杂质气体的流入而在气体激光谐振器中防止放电质量的劣化进入放电室。 托架6安装在插入垫圈13的管1的一端，仅用于密封排出室2的开口和用于密封排出室2和缓冲室12的两个开口的垫圈14。 板8和另外的支架9附接到管1的另一端，该管1插入仅用于密封排出室2的开口的垫圈15和用于密封排出室2和缓冲室12的两个开口的垫圈16。 缓冲室12中的压力被设定为低于排放室2的压力或设定为高于大气压，以减少杂质气体流入排放室2。