摘要:
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups, RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and or RF-foam stabilizers. The RF portion can include at least two groups —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
摘要:
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups, RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and or RF-foam stabilizers. The RF portion can include at least two groups —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the Rf-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
摘要:
Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.
摘要:
RF-compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.
摘要:
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
摘要:
Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.
摘要:
Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.
摘要:
RF-compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.
摘要:
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
摘要翻译:提供了生产方法和系统,其包括卤代化合物,脱卤化合物,醇反应,烯烃与饱和化合物的反应,使具有至少两个-CF 3 N 3基团的反应物与具有环状基团的反应物反应。 R F - 如R 1 - 中间体,R 1 F - 表面活性剂,R 1 F - 单体,R 单 - 单体单元,R 1 F - 金属络合物,R 1 F - 磷酸酯,R 1 - 二醇, R F - 氨基甲酸酯,和/或R F - 泡沫稳定剂。 R 1 F 3部分可以包括至少两个-CF 3 N 3基团,至少三个-CF 3 N 3基团和/或至少两个 - CF 3个基团和至少两个-CH 2 - 基团。 提供了洗涤剂,乳化剂,油漆,粘合剂,油墨,润湿剂,起泡剂和消泡剂,包括R 1 F - 表面活性剂组合物。 提供了包括R 1 F单体单元的丙烯酸树脂,树脂和聚合物。 提供了包含其上具有R 1 -F 3 - 组成的底物的组合物。 提供了可以包括R 1 F - 表面活性剂的水性成膜泡沫(“AFFF”)制剂和/或提供的R 3 F泡沫体稳定剂。
摘要:
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
摘要翻译:制备方法和系统包括使卤代化合物,脱卤化合物,醇反应,烯烃与饱和化合物反应,使具有至少两个-CF 3 N 3基团的反应物与具有环状基团的反应物反应。 R F - 如R 1 - 中间体,R 1 F - 表面活性剂,R 1 F - 单体,R 单 - 单体单元,R 1 F - 金属络合物,R 1 F - 磷酸酯,R 1 - 二醇, R F - 氨基甲酸酯,和/或R F - 泡沫稳定剂。 R 1 F 3部分可以包括至少两个-CF 3 N 3基团,至少三个-CF 3 N 3基团和/或至少两个 - CF 3个基团和至少两个-CH 2 - 基团。 提供了洗涤剂,乳化剂,油漆,粘合剂,油墨,润湿剂,起泡剂和消泡剂,包括R 1 F - 表面活性剂组合物。 提供了包括R 1 F单体单元的丙烯酸树脂,树脂和聚合物。 提供了包含其上具有R 1 -F 3 - 组成的底物的组合物。 提供了可以包括R 1 F - 表面活性剂的水性成膜泡沫(“AFFF”)制剂和/或提供的R 3 F泡沫体稳定剂。