GAS DISTRIBUTOR FOR A SIEMENS REACTOR
    2.
    发明申请
    GAS DISTRIBUTOR FOR A SIEMENS REACTOR 审中-公开
    用于西门子反应器的气体分配器

    公开(公告)号:US20160067663A1

    公开(公告)日:2016-03-10

    申请号:US14782855

    申请日:2014-03-19

    Abstract: A gas distribution system for a polysilicon deposition reactor eliminates or mitigates the problems associated with prior art distribution systems employs at least two segments which are gas-tightly connected to one another by readily detachable fasteners, with at least one gas inlet opening and one gas outlet opening, the gas distributor of the system being mounted by readily detachable fasteners to the polysilicon reactor.

    Abstract translation: 用于多晶硅沉积反应器的气体分配系统消除或减轻与现有技术分配系统相关的问题,采用通过易拆卸的紧固件彼此气密地连接的至少两个段,其中至少一个气体入口和一个气体出口 系统的气体分配器通过容易拆卸的紧固件安装到多晶硅反应器。

    POLYCRYSTALLINE SILICON DEPOSITION METHOD
    5.
    发明申请
    POLYCRYSTALLINE SILICON DEPOSITION METHOD 有权
    多晶硅沉积方法

    公开(公告)号:US20160297684A1

    公开(公告)日:2016-10-13

    申请号:US14777643

    申请日:2014-02-26

    CPC classification number: C01B33/035 C23C16/455

    Abstract: The deposition of polycrystalline silicon onto heated filament rods in a Siemens process is improved by supplying reaction gas at least partially through nozzles in the vertical wall of the deposition reactor, at an angle of 0° to 45° to the reactor wall, towards the base plate of the reactor.

    Abstract translation: 通过将反应气体至少部分地通过沉积反应器的垂直壁中的喷嘴以与反应器壁成0°至45°的角度朝向底部供应反应气体而将多晶硅沉积到加热的丝杆上 反应堆板。

Patent Agency Ranking