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12 条记录 (耗时 0.028 秒)

    Radiation Detector
    1.
    发明申请
    Radiation Detector 有权
    辐射检测器

    公开(公告)号：US20120091357A1

    公开(公告)日：2012-04-19

    申请号：US13331140

    申请日：2011-12-20

    申请人： Wilhelmus Jacobus Maria ROOIJAKKERS ,  Martijn Gerard Dominique Wehrens

    发明人： Wilhelmus Jacobus Maria ROOIJAKKERS ,  Martijn Gerard Dominique Wehrens

    IPC分类号： G01J1/42

    CPC分类号： H01J40/02 ,  G03F7/70575 ,  G03F7/7085

    摘要： A method for detecting radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.

    摘要翻译： 一种检测辐射的方法。 辐射检测器包括多个法拉第杯。 每个法拉第杯都配有一个盖子。 每个盖子包括一个窗口装置，辐射可通过该窗口装置进入法拉第杯。 每个盖子的窗口布置对于每个法拉第杯是不同的。 每个法拉第杯容纳目标，如果辐射入射在目标上，则其配置为发射光电子。

    Radiation detector
    2.
    发明授权
    Radiation detector 有权
    辐射检测器

    公开(公告)号：US08269186B2

    公开(公告)日：2012-09-18

    申请号：US13331140

    申请日：2011-12-20

    申请人： Wilhelmus Jacobus Maria Rooijakkers ,  Martijn Gerard Dominique Wehrens

    发明人： Wilhelmus Jacobus Maria Rooijakkers ,  Martijn Gerard Dominique Wehrens

    IPC分类号： G01J1/42

    CPC分类号： H01J40/02 ,  G03F7/70575 ,  G03F7/7085

    摘要： A method for detecting radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.

    摘要翻译： 一种检测辐射的方法。 辐射检测器包括多个法拉第杯。 每个法拉第杯都配有一个盖子。 每个盖子包括一个窗口装置，辐射可通过该窗口装置进入法拉第杯。 每个盖子的窗口布置对于每个法拉第杯是不同的。 每个法拉第杯容纳目标，如果辐射入射在目标上，则其配置为发射光电子。

    Radiation detector
    4.
    发明授权
    Radiation detector 有权
    辐射检测器

    公开(公告)号：US08124939B2

    公开(公告)日：2012-02-28

    申请号：US12859583

    申请日：2010-08-19

    申请人： Wilhelmus Jacobus Maria Rooijakkers ,  Martijn Gerard Dominique Wehrens

    发明人： Wilhelmus Jacobus Maria Rooijakkers ,  Martijn Gerard Dominique Wehrens

    IPC分类号： G01J1/42

    CPC分类号： H01J40/02 ,  G03F7/70575 ,  G03F7/7085

    摘要： A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.

    摘要翻译： 辐射检测器检测辐射。 辐射检测器包括多个法拉第杯。 每个法拉第杯都配有一个盖子。 每个盖子包括一个窗口装置，辐射可通过该窗口装置进入法拉第杯。 每个盖子的窗口布置对于每个法拉第杯是不同的。 每个法拉第杯容纳目标，如果辐射入射在目标上，则其配置为发射光电子。

    Radiation Detector
    5.
    发明申请
    Radiation Detector 有权
    辐射检测器

    公开(公告)号：US20110220806A1

    公开(公告)日：2011-09-15

    申请号：US12859583

    申请日：2010-08-19

    申请人： Wilhelmus Jacobus Maria Rooijakkers ,  Martijn Gerard Dominique Wehrens

    发明人： Wilhelmus Jacobus Maria Rooijakkers ,  Martijn Gerard Dominique Wehrens

    IPC分类号： G01J1/42

    CPC分类号： H01J40/02 ,  G03F7/70575 ,  G03F7/7085

    摘要： A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.

    摘要翻译： 辐射检测器检测辐射。 辐射检测器包括多个法拉第杯。 每个法拉第杯都配有一个盖子。 每个盖子包括一个窗口装置，辐射可通过该窗口装置进入法拉第杯。 每个盖子的窗口布置对于每个法拉第杯是不同的。 每个法拉第杯容纳目标，如果辐射入射在目标上，则其配置为发射光电子。

    Lithographic apparatus
    9.
    发明授权
    Lithographic apparatus 有权
    平版印刷设备

    公开(公告)号：US07375799B2

    公开(公告)日：2008-05-20

    申请号：US11065349

    申请日：2005-02-25

    申请人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk

    发明人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk

    IPC分类号： G03B27/72 ,  G03B27/54

    CPC分类号： G03F7/70133 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a detector for measuring the intensity of the radiation after it has passed through the projection system. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable; and a polarization analyzer, such as a linear polarizer, wherein the polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements, using the detector, for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及用于在辐射通过投影系统之后测量辐射强度的检测器。 该装置还包括可调节的诸如四分之一波片的偏振变化元件; 以及诸如线性偏振器的偏振分析器，其中偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。 通过采用强度测量，使用检测器，对于偏振变化元件的不同的旋转取向，可以获得关于在图案形成装置的电平处的辐射的偏振状态的信息。 由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。