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1.发明授权Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product 有权校准光刻设备的方法，设备制造方法以及相关的数据处理设备和计算机程序产品公开(公告)号：US09177219B2
公开(公告)日：2015-11-03
申请号：US13169673
申请日：2011-06-27
CPC分类号： G06K9/3216 , G03F7/70516 , G06T7/73 , G06T7/80 , G06T2207/10004 , G06T2207/10061 , G06T2207/20224 , G06T2207/30148
摘要： A lithographic apparatus is calibrated by reference to a primary reference substrate. Using an apparatus which need not be the same as the one being calibrated, there is obtained an apparatus-specific fingerprint of the primary reference substrate. Using the same set-up there is then obtained an apparatus-specific fingerprint of a secondary reference substrate. The apparatus-specific fingerprint of the primary reference substrate is subtracted from the apparatus-specific fingerprint of the secondary reference substrate to obtain and store an apparatus-independent fingerprint of the secondary reference substrate. The secondary reference substrate and stored apparatus-independent fingerprint are subsequently used together in place of the primary reference substrate as a reference for the calibration of the lithographic apparatus to be calibrated. Initial set-up for a cluster of lithographic tools can be performed with less use of the costly primary reference substrate, and with less interruption to normal production. The initial set-up can be integrated with on-going monitoring and re-calibration of the apparatuses.
摘要翻译： 通过参考主参考基板来校准光刻设备。 使用不需要与被校准的装置相同的装置，获得主参考基板的设备特定的指纹。 使用相同的装置，然后获得二次参考基板的设备特定指纹。 从第二参考基板的设备特定指纹中减去主参考基板的设备特定指纹，以获得并存储第二参考基板的与设备无关的指纹。 随后将二次参考基板和存储的与设备无关的指纹一起用于代替主参考基板，作为校准光刻设备的参考。 可以在较少使用昂贵的主要参考基板的情况下进行一组平版印刷工具的初始设置，并减少正常生产的中断。 初始设置可以与设备的正在进行的监视和重新校准相集成。
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2.发明申请Method Of Calibrating A Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product 有权校准平版印刷设备，设备制造方法和相关数据处理设备和计算机程序产品的方法公开(公告)号：US20120008127A1
公开(公告)日：2012-01-12
申请号：US13169673
申请日：2011-06-27
CPC分类号： G06K9/3216 , G03F7/70516 , G06T7/73 , G06T7/80 , G06T2207/10004 , G06T2207/10061 , G06T2207/20224 , G06T2207/30148
摘要： A lithographic apparatus is calibrated by reference to a primary reference substrate. Using an apparatus which need not be the same as the one being calibrated, there is obtained an apparatus-specific fingerprint of the primary reference substrate. Using the same set-up there is then obtained an apparatus-specific fingerprint of a secondary reference substrate. The apparatus-specific fingerprint of the primary reference substrate is subtracted from the apparatus-specific fingerprint of the secondary reference substrate to obtain and store an apparatus-independent fingerprint of the secondary reference substrate. The secondary reference substrate and stored apparatus-independent fingerprint are subsequently used together in place of the primary reference substrate as a reference for the calibration of the lithographic apparatus to be calibrated. Initial set-up for a cluster of lithographic tools can be performed with less use of the costly primary reference substrate, and with less interruption to normal production. The initial set-up can be integrated with on-going monitoring and re-calibration of the apparatuses.
摘要翻译： 通过参考主参考基板来校准光刻设备。 使用不需要与被校准的装置相同的装置，获得主参考基板的设备特定的指纹。 使用相同的装置，然后获得二次参考基板的设备特定指纹。 从第二参考基板的设备特定指纹中减去主参考基板的设备特定指纹，以获得并存储第二参考基板的与设备无关的指纹。 随后将二次参考基板和存储的与设备无关的指纹一起用于代替主参考基板，作为校准光刻设备的参考。 可以在较少使用昂贵的主要参考基板的情况下进行一组平版印刷工具的初始设置，并减少正常生产的中断。 初始设置可以与设备的正在进行的监视和重新校准相集成。
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3.发明授权Method of determining focus corrections, lithographic processing cell and device manufacturing method 有权确定焦点校正的方法，光刻处理单元和器件制造方法公开(公告)号：US09360769B2
公开(公告)日：2016-06-07
申请号：US13571963
申请日：2012-08-10
CPC分类号： G03F7/70641 , G03F7/70616 , G03F7/70625 , G03F9/7026
摘要： A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
摘要翻译： 一种用于确定光刻投影装置的聚焦校正的方法和相关联的装置。 该方法包括在测试基板上暴露多个全局校正场，每个全局校正场均包括多个全局校正标记，并且每个全局校正场在其上以倾斜的焦点偏移曝光; 测量所述多个全局校正标记中的每一个的聚焦依赖特性，以确定场间焦点变化信息; 以及从所述场间焦点变化信息计算场间焦点校正。
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公开(公告)号：US20130050668A1
公开(公告)日：2013-02-28
申请号：US13571963
申请日：2012-08-10
IPC分类号： G03B27/52
CPC分类号： G03F7/70641 , G03F7/70616 , G03F7/70625 , G03F9/7026
摘要： A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
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