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1.发明申请Method Of Calibrating A Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product 有权校准平版印刷设备，设备制造方法和相关数据处理设备和计算机程序产品的方法公开(公告)号：US20120008127A1
公开(公告)日：2012-01-12
申请号：US13169673
申请日：2011-06-27
CPC分类号： G06K9/3216 , G03F7/70516 , G06T7/73 , G06T7/80 , G06T2207/10004 , G06T2207/10061 , G06T2207/20224 , G06T2207/30148
摘要： A lithographic apparatus is calibrated by reference to a primary reference substrate. Using an apparatus which need not be the same as the one being calibrated, there is obtained an apparatus-specific fingerprint of the primary reference substrate. Using the same set-up there is then obtained an apparatus-specific fingerprint of a secondary reference substrate. The apparatus-specific fingerprint of the primary reference substrate is subtracted from the apparatus-specific fingerprint of the secondary reference substrate to obtain and store an apparatus-independent fingerprint of the secondary reference substrate. The secondary reference substrate and stored apparatus-independent fingerprint are subsequently used together in place of the primary reference substrate as a reference for the calibration of the lithographic apparatus to be calibrated. Initial set-up for a cluster of lithographic tools can be performed with less use of the costly primary reference substrate, and with less interruption to normal production. The initial set-up can be integrated with on-going monitoring and re-calibration of the apparatuses.
摘要翻译： 通过参考主参考基板来校准光刻设备。 使用不需要与被校准的装置相同的装置，获得主参考基板的设备特定的指纹。 使用相同的装置，然后获得二次参考基板的设备特定指纹。 从第二参考基板的设备特定指纹中减去主参考基板的设备特定指纹，以获得并存储第二参考基板的与设备无关的指纹。 随后将二次参考基板和存储的与设备无关的指纹一起用于代替主参考基板，作为校准光刻设备的参考。 可以在较少使用昂贵的主要参考基板的情况下进行一组平版印刷工具的初始设置，并减少正常生产的中断。 初始设置可以与设备的正在进行的监视和重新校准相集成。
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2.发明授权Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product 有权校准光刻设备的方法，设备制造方法以及相关的数据处理设备和计算机程序产品公开(公告)号：US09177219B2
公开(公告)日：2015-11-03
申请号：US13169673
申请日：2011-06-27
CPC分类号： G06K9/3216 , G03F7/70516 , G06T7/73 , G06T7/80 , G06T2207/10004 , G06T2207/10061 , G06T2207/20224 , G06T2207/30148
摘要： A lithographic apparatus is calibrated by reference to a primary reference substrate. Using an apparatus which need not be the same as the one being calibrated, there is obtained an apparatus-specific fingerprint of the primary reference substrate. Using the same set-up there is then obtained an apparatus-specific fingerprint of a secondary reference substrate. The apparatus-specific fingerprint of the primary reference substrate is subtracted from the apparatus-specific fingerprint of the secondary reference substrate to obtain and store an apparatus-independent fingerprint of the secondary reference substrate. The secondary reference substrate and stored apparatus-independent fingerprint are subsequently used together in place of the primary reference substrate as a reference for the calibration of the lithographic apparatus to be calibrated. Initial set-up for a cluster of lithographic tools can be performed with less use of the costly primary reference substrate, and with less interruption to normal production. The initial set-up can be integrated with on-going monitoring and re-calibration of the apparatuses.
摘要翻译： 通过参考主参考基板来校准光刻设备。 使用不需要与被校准的装置相同的装置，获得主参考基板的设备特定的指纹。 使用相同的装置，然后获得二次参考基板的设备特定指纹。 从第二参考基板的设备特定指纹中减去主参考基板的设备特定指纹，以获得并存储第二参考基板的与设备无关的指纹。 随后将二次参考基板和存储的与设备无关的指纹一起用于代替主参考基板，作为校准光刻设备的参考。 可以在较少使用昂贵的主要参考基板的情况下进行一组平版印刷工具的初始设置，并减少正常生产的中断。 初始设置可以与设备的正在进行的监视和重新校准相集成。
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3.发明授权Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness 有权用于确定Z位置误差/变化和衬底台平面度的平版印刷设备和方法公开(公告)号：US07333174B2
公开(公告)日：2008-02-19
申请号：US11317230
申请日：2005-12-27
申请人： Willem Herman Gertruda Anna Koenen , Arthur Winfried Eduardus Minnaert , Luberthus Ouwehand , Johannes Mathias Theodorus Antonius Adriens , Wouter Onno Pril
发明人： Willem Herman Gertruda Anna Koenen , Arthur Winfried Eduardus Minnaert , Luberthus Ouwehand , Johannes Mathias Theodorus Antonius Adriens , Wouter Onno Pril
CPC分类号： G03F9/7049 , B23D43/04 , G03F9/7011 , G03F9/7019 , G03F9/7034 , G03F9/7088
摘要： A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substrate, a projection system configured to project the patterned radiation onto a target portion of the substrate, a plurality of level sensors for sensing a level of a substrate carried on the substrate table at a plurality of different positions, and a system for determining the position of the substrate table. Also provided is a controller that is configured to cause relative movement between the substrate and the level sensor array from a first position at which a first measurement is taken to a plurality of overlapping positions at which further measurements are taken, and a calculator for calculating a measure of Z position errors and/or substrate table unflatness and/or a measure of the level sensor position/offset using the plurality of overlapping measurements.
摘要翻译： 一种光刻投影设备，包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，所述图案形成装置被配置为在其横截面中赋予所述光束图案;被配置为保持基板的基板台， 投影系统，被配置为将所述图案化的辐射投影到所述基板的目标部分上;多个液位传感器，用于感测在多个不同位置承载在所述基板台上的基板的水平;以及系统，用于确定所述基板的位置 底物台。 还提供了一种控制器，其被配置为从第一位置引起基板和液位传感器阵列之间的相对移动，在第一位置处，进行进一步测量的多个重叠位置，以及计算器 使用多个重叠测量来测量Z位置误差和/或衬底台不平坦度和/或液位传感器位置/偏移的量度。
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公开(公告)号：US07535578B2
公开(公告)日：2009-05-19
申请号：US10899437
申请日：2004-07-27
申请人： Wouter Onno Pril
发明人： Wouter Onno Pril
IPC分类号： G01B9/02
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is presented that includes a substrate holder configured to hold a substrate, an illuminator configured to condition a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a projection system that projects the patterned beam onto a target portion of the substrate, and an interferometer system configured to measure a position of the object to assist in positioning the object.
摘要翻译： 提供了一种光刻设备，其包括被配置为保持基板的基板保持器，被配置为调节辐射束的照明器;被配置为支撑将辐射束施加所需图案的图案形成装置的支撑结构，支撑结构，投影系统， 将图案化的光束投影到基板的目标部分上，以及被配置为测量物体的位置以帮助定位物体的干涉仪系统。
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公开(公告)号：US07348574B2
公开(公告)日：2008-03-25
申请号：US11217670
申请日：2005-09-02
IPC分类号： G21G5/00
CPC分类号： G03F7/70775
摘要： A position measurement system for measuring a position of an object is described, the system including: a first incremental measurement unit for measuring a first number of first distance steps in a distance between a reference frame and the object, wherein the first number equals a first integer value plus a first fraction, and a second incremental measurement unit for measuring a second number of second distance steps in a distance between the reference frame and the object, wherein the second number equals a second integer value plus a second fraction, wherein the position measurement system is constructed and arranged to initialize the second incremental measurement unit on the basis of the first number and the second fraction.
摘要翻译： 描述了一种用于测量物体位置的位置测量系统，该系统包括：第一增量测量单元，用于测量参考系和物体之间的距离中的第一数量的第一距离步骤，其中第一数量等于第一 以及第二增量测量单元，用于测量所述参考帧和所述对象之间的距离中的第二数量的第二距离步长，其中所述第二数字等于第二整数值加上第二分数，其中所述位置 测量系统被构造和布置为基于第一数量和第二分数来初始化第二增量测量单元。
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公开(公告)号：US06987557B2
公开(公告)日：2006-01-17
申请号：US10719067
申请日：2003-11-24
申请人： Wouter Onno Pril , Engelbertus Antonius F. Van De Pasch , Robert F. Dillon , Philip Dennis Henshaw
发明人： Wouter Onno Pril , Engelbertus Antonius F. Van De Pasch , Robert F. Dillon , Philip Dennis Henshaw
CPC分类号： G03F7/70958 , G01B9/02007 , G01B9/02014 , G01B9/02027 , G01B9/0207 , G01B9/02074 , G01B2290/45 , G01B2290/60 , G01B2290/70 , G03F7/70775 , G03F7/70883
摘要： Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.
摘要翻译： 使用来自二次谐波干涉仪（SHI）的测量，对诸如压力，温度和湍流的大气条件的变化校正干涉测量系统的测量。 在使用SHI数据之前，除去表示SHI数据对路径长度的依赖性的斜坡。 SHI可以包括作为光源的无源Q开关激光器和接收器模块中的布鲁斯特棱镜。 光纤可以用于向检测器传导光。 反映测量光束的反射镜具有选择的厚度的涂层，以使SHI数据对涂层厚度变化的敏感性最小化。
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公开(公告)号：US07251042B2
公开(公告)日：2007-07-31
申请号：US10976346
申请日：2004-10-29
申请人： Wouter Onno Pril
发明人： Wouter Onno Pril
IPC分类号： G01B11/02
CPC分类号： G03F7/70775
摘要： A lithographic apparatus includes an interferometer configured to measure a position of a mirror of the lithographic apparatus. For measuring unflatness of the mirror the interferometer includes a modulator configured to modulate a position of an input beam of the interferometer, a synchronous detector configured to synchronously detect an interfered, modulated beam, and a calculator configured to calculate an unflatness of an area of the mirror from an effect of the modulation of the position of the input beam on an output signal of the synchronous detector. The modulator can include a rotatable, tilted, plan plate.
摘要翻译： 光刻设备包括被配置为测量光刻设备的反射镜的位置的干涉仪。 为了测量反射镜的不平坦度，干涉仪包括配置成调制干涉仪的输入光束的位置的调制器，配置成同步检测受干扰的调制光束的同步检测器，以及被配置为计算干涉仪的区域的不平坦性的计算器 从输入光束的位置的调制对同步检测器的输出信号的影响反射。 调制器可以包括可旋转的，倾斜的平板。
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公开(公告)号：US06958807B2
公开(公告)日：2005-10-25
申请号：US10719067
申请日：2003-11-24
申请人： Wouter Onno Pril , Engelbertus Antonius F. Van De Pasch , Robert F. Dillon , Philip Dennis Henshaw
发明人： Wouter Onno Pril , Engelbertus Antonius F. Van De Pasch , Robert F. Dillon , Philip Dennis Henshaw
摘要： Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.
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9.发明授权Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition 有权平版印刷设备，器件制造方法，由此制造的器件和气体组成公开(公告)号：US06747729B2
公开(公告)日：2004-06-08
申请号：US09899566
申请日：2001-07-06
申请人： Wouter Onno Pril , Philip Dennis Henshaw , Engelbertus Antonius Fransiscus Van De Pasch , Marcel Hendrikus Maria Beems
发明人： Wouter Onno Pril , Philip Dennis Henshaw , Engelbertus Antonius Fransiscus Van De Pasch , Marcel Hendrikus Maria Beems
IPC分类号： G03B2752
CPC分类号： C01B23/00 , G03F7/70775 , G03F7/70866 , G03F7/70933
摘要： A lithographic projection apparatus which uses one, and optionally also two or more color interferometric devices to accurately determine the position of a movable table within the apparatus. The apparatus comprises a purge gas source to supply purge gas to a space accommodating at least a part of said movable table, the purge gas being selected such that leakage of the purge gas into the area of operation of the interferometric devices does not cause significant error in the interferometric measurements.
摘要翻译： 一种光刻投影设备，其使用一个也可选地两个或更多个彩色干涉仪来精确地确定可移动台在设备内的位置。 该装置包括净化气体源，以将吹扫气体供应到容纳所述可移动工作台的至少一部分的空间，所述吹扫气体被选择为使得吹扫气体泄漏到干涉仪装置的操作区域中不会引起显着误差 在干涉测量中。
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公开(公告)号：US07599043B2
公开(公告)日：2009-10-06
申请号：US11503370
申请日：2006-08-14
CPC分类号： G03F7/70775
摘要： A position measurement system includes a first position measurement unit configured to measure a position of an object in a first and a second direction, the first position measurement unit including a first sensor and a first grating that extends in a first direction, a second position measurement unit configured to measure the position of the object in the first and the second direction, the second position measurement unit including a second sensor and a second grating that extends in the first direction. The position measurement system is configured to initialize the second position measurement unit based on a position measurement of the first position measurement unit.
摘要翻译： 位置测量系统包括：第一位置测量单元，被配置为测量物体在第一和第二方向上的位置，所述第一位置测量单元包括第一传感器和沿第一方向延伸的第一光栅，第二位置测量 被配置为测量所述物体在所述第一和第二方向上的位置的单元，所述第二位置测量单元包括沿所述第一方向延伸的第二传感器和第二光栅。 位置测量系统被配置为基于第一位置测量单元的位置测量来初始化第二位置测量单元。
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