-
1.发明授权Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product 有权校准光刻设备的方法，设备制造方法以及相关的数据处理设备和计算机程序产品公开(公告)号：US09177219B2
公开(公告)日：2015-11-03
申请号：US13169673
申请日：2011-06-27
CPC分类号： G06K9/3216 , G03F7/70516 , G06T7/73 , G06T7/80 , G06T2207/10004 , G06T2207/10061 , G06T2207/20224 , G06T2207/30148
摘要： A lithographic apparatus is calibrated by reference to a primary reference substrate. Using an apparatus which need not be the same as the one being calibrated, there is obtained an apparatus-specific fingerprint of the primary reference substrate. Using the same set-up there is then obtained an apparatus-specific fingerprint of a secondary reference substrate. The apparatus-specific fingerprint of the primary reference substrate is subtracted from the apparatus-specific fingerprint of the secondary reference substrate to obtain and store an apparatus-independent fingerprint of the secondary reference substrate. The secondary reference substrate and stored apparatus-independent fingerprint are subsequently used together in place of the primary reference substrate as a reference for the calibration of the lithographic apparatus to be calibrated. Initial set-up for a cluster of lithographic tools can be performed with less use of the costly primary reference substrate, and with less interruption to normal production. The initial set-up can be integrated with on-going monitoring and re-calibration of the apparatuses.
摘要翻译： 通过参考主参考基板来校准光刻设备。 使用不需要与被校准的装置相同的装置，获得主参考基板的设备特定的指纹。 使用相同的装置，然后获得二次参考基板的设备特定指纹。 从第二参考基板的设备特定指纹中减去主参考基板的设备特定指纹，以获得并存储第二参考基板的与设备无关的指纹。 随后将二次参考基板和存储的与设备无关的指纹一起用于代替主参考基板，作为校准光刻设备的参考。 可以在较少使用昂贵的主要参考基板的情况下进行一组平版印刷工具的初始设置，并减少正常生产的中断。 初始设置可以与设备的正在进行的监视和重新校准相集成。
-
2.发明申请Method Of Calibrating A Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product 有权校准平版印刷设备，设备制造方法和相关数据处理设备和计算机程序产品的方法公开(公告)号：US20120008127A1
公开(公告)日：2012-01-12
申请号：US13169673
申请日：2011-06-27
CPC分类号： G06K9/3216 , G03F7/70516 , G06T7/73 , G06T7/80 , G06T2207/10004 , G06T2207/10061 , G06T2207/20224 , G06T2207/30148
摘要： A lithographic apparatus is calibrated by reference to a primary reference substrate. Using an apparatus which need not be the same as the one being calibrated, there is obtained an apparatus-specific fingerprint of the primary reference substrate. Using the same set-up there is then obtained an apparatus-specific fingerprint of a secondary reference substrate. The apparatus-specific fingerprint of the primary reference substrate is subtracted from the apparatus-specific fingerprint of the secondary reference substrate to obtain and store an apparatus-independent fingerprint of the secondary reference substrate. The secondary reference substrate and stored apparatus-independent fingerprint are subsequently used together in place of the primary reference substrate as a reference for the calibration of the lithographic apparatus to be calibrated. Initial set-up for a cluster of lithographic tools can be performed with less use of the costly primary reference substrate, and with less interruption to normal production. The initial set-up can be integrated with on-going monitoring and re-calibration of the apparatuses.
摘要翻译： 通过参考主参考基板来校准光刻设备。 使用不需要与被校准的装置相同的装置，获得主参考基板的设备特定的指纹。 使用相同的装置，然后获得二次参考基板的设备特定指纹。 从第二参考基板的设备特定指纹中减去主参考基板的设备特定指纹，以获得并存储第二参考基板的与设备无关的指纹。 随后将二次参考基板和存储的与设备无关的指纹一起用于代替主参考基板，作为校准光刻设备的参考。 可以在较少使用昂贵的主要参考基板的情况下进行一组平版印刷工具的初始设置，并减少正常生产的中断。 初始设置可以与设备的正在进行的监视和重新校准相集成。
-
公开(公告)号：US09310698B2
公开(公告)日：2016-04-12
申请号：US13012386
申请日：2011-01-24
IPC分类号： G03F7/20
CPC分类号： G03F7/70633 , G03F7/705 , G03F7/70516 , G03F7/70525
摘要： A lithographic exposure process is performed on a substrate using a scanner. The scanner comprises several subsystems. There are errors in the overlay arising from the subsystems during the exposure. The overlay errors are measured using a scatterometer to obtain overlay measurements. Modeling is performed to separately determine from the overlay measurements different subsets of estimated model parameters, for example field distortion model parameters, scan/step direction model parameters and position/deformation model parameters. Each subset is related to overlay errors arising from a corresponding specific subsystem of the lithographic apparatus. Finally, the exposure is controlled in the scanner by controlling a specific subsystem of the scanner using its corresponding subset of estimated model parameters. This results in a product wafer being exposed with a well controlled overlay.
摘要翻译： 使用扫描仪在基板上进行光刻曝光处理。 扫描仪包括几个子系统。 暴露过程中子系统产生的覆盖错误。 使用散射仪测量覆盖误差以获得覆盖测量。 执行建模以从覆盖测量单独确定估计模型参数的不同子集，例如场失真模型参数，扫描/步进方向模型参数和位置/变形模型参数。 每个子集与由光刻设备的相应特定子系统产生的叠加误差有关。 最后，通过使用其对应的估计模型参数子集来控制扫描仪的特定子系统，在扫描仪中控制曝光。 这导致用良好控制的覆盖物暴露产品晶片。
-
4.发明授权Lithographic apparatus and device manufacturing method for measuring wafer parameters using non-standard alignment settings 有权用于使用非标准对准设置测量晶片参数的平版印刷设备和器件制造方法公开(公告)号：US09134625B2
公开(公告)日：2015-09-15
申请号：US13010388
申请日：2011-01-20
CPC分类号： G03F7/70616 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer thereby determining parameter drift from the baseline. In doing this, allowance and/or correction can be to be made for the drift. The baseline is determined by initially exposing the monitor wafer(s) using the lithographic apparatus, such that the initial exposure is performed while using non-standard alignment model settings optimized for accuracy, such as those used for testing the apparatus. An associated lithographic apparatus is also disclosed.
摘要翻译： 一种方法产生用于光刻设备的至少一个监视晶片。 监视器晶片与扫描控制模块组合使用，以周期性地从监视器晶片检索定义基线的测量结果，从而确定基线的参数漂移。 在这样做时，可以对漂移进行津贴和/或修正。 通过使用光刻设备初始曝光监视器晶片来确定基线，使得在使用针对精度优化的非标准对准模型设置（例如用于测试设备的那些）时执行初始曝光。 还公开了相关的光刻设备。
-
5.发明申请Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product 有权平版印刷设备，设备制造方法及相关数据处理设备及计算机程序产品公开(公告)号：US20110216294A1
公开(公告)日：2011-09-08
申请号：US13009250
申请日：2011-01-19
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G03F7/70616
摘要： A lithographic apparatus operates by moving a substrate and a patterning device relative to each other in a sequence of movements such that a pattern is applied at a successive portions on the substrate. Each portion of the substrate is patterned by a scanning operation in which the patterning device is scanned through the radiation beam while synchronously scanning the substrate through the patterned radiation beam so as to apply the pattern to the desired portion on the substrate. An intrafield correction is applied during each scanning operation so as to compensate for distortion effects which vary during the scanning operation. The intrafield correction includes corrective variations of one or more properties of the projection system, and optionally out-of-plane movements of the patterning device and/or substrate table.
摘要翻译： 平版印刷设备通过以一系列运动相对于彼此移动基板和图案形成装置来操作，使得在基板上的连续部分施加图案。 通过扫描操作来对衬底的每个部分进行构图，其中图案形成装置通过辐射束扫描，同时通过图案化的辐射束同步扫描衬底，以将图案施加到衬底上的期望部分。 在每次扫描操作期间，进行场内校正，以补偿在扫描操作期间变化的失真效应。 场内校正包括投影系统的一个或多个特性的校正变化，以及图案形成装置和/或衬底台的任意的平面外运动。
-
公开(公告)号：US20110216293A1
公开(公告)日：2011-09-08
申请号：US13009232
申请日：2011-01-19
CPC分类号： G03F7/70616 , G03F7/70516 , G03F7/70525 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7046
摘要： A method controls a scanning function of a lithographic apparatus. A first alignment strategy is used. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control parameters are periodically retrieved from the monitor wafer. Parameter drift is determined from the baseline control parameters. Corrective action is taken based on the determination. A production wafer is exposed using a second alignment strategy, different to the first alignment strategy. The corrective action is modified so as to be substantially closer to the correction that would have been made had the second alignment strategy been used in exposing the monitor wafer.
摘要翻译： 方法控制光刻设备的扫描功能。 使用第一对齐策略。 暴露监视器晶片以确定与扫描功能有关的基线控制参数。 从监视器晶片周期性地检索基线控制参数。 参数漂移由基线控制参数决定。 根据确定采取纠正措施。 使用与第一对准策略不同的第二对准策略来曝光生产晶片。 校正动作被修改，以便基本上更接近如果在暴露监视器晶片时已经使用第二对准策略将会进行的校正。
-
7.发明授权Lithographic apparatus and method controlling parameter drift by performing multiple patterning passes on reference substrate 有权光刻设备和方法通过在参考基板上进行多次图案化，来控制参数漂移公开(公告)号：US08947643B2
公开(公告)日：2015-02-03
申请号：US13010409
申请日：2011-01-20
CPC分类号： G03F7/70516 , G03F7/70616
摘要： A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer, thereby determining parameter drift from the baseline. In doing this, allowance and/or correction can be to be made for the drift. The baseline is determined by initially exposing the monitor wafer(s) using the lithographic apparatus to perform multiple exposure passes on each of the monitor wafer(s). An associated lithographic apparatus is also disclosed.
摘要翻译： 一种方法产生用于光刻设备的至少一个监视晶片。 监视器晶片与扫描控制模块组合使用，以周期性地从监视器晶片检索限定基线的测量值，从而确定从基准线的参数漂移。 在这样做时，可以对漂移进行津贴和/或修正。 通过使用光刻设备最初暴露监视器晶片以在每个监视器晶片上执行多次曝光确定来确定基线。 还公开了相关的光刻设备。
-
公开(公告)号：US08793099B2
公开(公告)日：2014-07-29
申请号：US13018868
申请日：2011-02-01
CPC分类号： G03F7/70633 , G03F7/70516
摘要： System parameters are checked through self-assessment of a production wafer without a reference or a monitor wafer. In particular, exposure errors and substrate table positioning errors can be corrected for.
摘要翻译： 系统参数通过对生产晶片的自我评估进行检查，无需参考或监视晶片。 特别地，可以校正曝光误差和衬底台定位误差。
-
公开(公告)号：US08687167B2
公开(公告)日：2014-04-01
申请号：US13009232
申请日：2011-01-19
CPC分类号： G03F7/70616 , G03F7/70516 , G03F7/70525 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7046
摘要： A method controls a scanning function of a lithographic apparatus. A first alignment strategy is used. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control parameters are periodically retrieved from the monitor wafer. Parameter drift is determined from the baseline control parameters. Corrective action is taken based on the determination. A production wafer is exposed using a second alignment strategy, different to the first alignment strategy. The corrective action is modified so as to be substantially closer to the correction that would have been made had the second alignment strategy been used in exposing the monitor wafer.
摘要翻译： 方法控制光刻设备的扫描功能。 使用第一对齐策略。 暴露监视器晶片以确定与扫描功能有关的基线控制参数。 从监视器晶片周期性地检索基线控制参数。 参数漂移由基线控制参数决定。 根据确定采取纠正措施。 使用与第一对准策略不同的第二对准策略来曝光生产晶片。 校正动作被修改，以便基本上更接近如果在暴露监视器晶片时已经使用第二对准策略将会进行的校正。
-
公开(公告)号：US20110205515A1
公开(公告)日：2011-08-25
申请号：US13017640
申请日：2011-01-31
IPC分类号： G03B27/54
CPC分类号： G03B27/53 , G03F7/70516
摘要： System parameters are checked through self-assessment of a production wafer without using a reference or a monitor wafer. In particular, the wafer is exposed at different orientations, the data from which provides for the calibration of system parameters.
摘要翻译： 通过生产晶片的自我评估来检查系统参数，而不使用参考或监视晶片。 特别地，晶片以不同的取向曝光，其中的数据提供了系统参数的校准。
-
-
-
-
-
-
-
-
-
搜索结果
16 条记录 (耗时 0.048 秒)
