Coordinate measuring machine and method for calibrating the coordinate measuring machine
    1.
    发明授权
    Coordinate measuring machine and method for calibrating the coordinate measuring machine 有权
    坐标测量机和校准坐标测量机的方法

    公开(公告)号:US08115808B2

    公开(公告)日:2012-02-14

    申请号:US12215115

    申请日:2008-06-25

    IPC分类号: H04N7/18

    CPC分类号: G01B11/03 G01B21/042

    摘要: A coordinate measuring machine is disclosed having an orientor automatically orienting a substrate associated therewith. A control and computing unit is further associated with the coordinate measuring machine, so that self-calibration may be performed on the basis of at least two different and automatically set orientations of the substrate.

    摘要翻译: 公开了一种坐标测量机,其具有自动定向与其相关联的衬底的定向器。 控制和计算单元进一步与坐标测量机相关联,使得可以基于至少两个不同且自动设置的基板取向进行自校准。

    Coordinate measuring machine and method for calibrating the coordinate measuring machine
    2.
    发明申请
    Coordinate measuring machine and method for calibrating the coordinate measuring machine 有权
    坐标测量机和校准坐标测量机的方法

    公开(公告)号:US20090002486A1

    公开(公告)日:2009-01-01

    申请号:US12215115

    申请日:2008-06-25

    IPC分类号: H04N7/18

    CPC分类号: G01B11/03 G01B21/042

    摘要: A coordinate measuring machine is disclosed having an orientor automatically orienting a substrate associated therewith. A control and computing unit is further associated with the coordinate measuring machine, so that self-calibration may be performed on the basis of at least two different and automatically set orientations of the substrate.

    摘要翻译: 公开了一种坐标测量机,其具有自动定向与其相关联的衬底的定向器。 控制和计算单元进一步与坐标测量机相关联,使得可以基于至少两个不同且自动设置的基板取向进行自校准。

    Method for determining the systematic error in the measurement of positions of edges of structures on a substrate resulting from the substrate topology
    3.
    发明授权
    Method for determining the systematic error in the measurement of positions of edges of structures on a substrate resulting from the substrate topology 有权
    用于确定由衬底拓扑结果产生的衬底上的结构边缘的位置的测量中的系统误差的方法

    公开(公告)号:US08149383B2

    公开(公告)日:2012-04-03

    申请号:US12219000

    申请日:2008-07-21

    申请人: Slawomir Czerkas

    发明人: Slawomir Czerkas

    IPC分类号: G03B27/42

    CPC分类号: G01B21/045 G01B11/03

    摘要: A method for determining the lateral correction as a function of the substrate topology and/or the geometry of the substrate holder is disclosed. The substrate is placed on a measuring stage traversable in the X coordinate direction and Y coordinate direction, which carries the substrate to be measured. The substrate is supported on at least three support points which define a plane. An apparatus is provided for determining the position of a plurality of positions on the surface of the substrate in the in the X, Y and Z coordinate directions. The substrate is tiltable about an axis parallel to the X/Y plane, to enable the substrate to be measured in a tilted position.

    摘要翻译: 公开了一种用于确定横向校正作为衬底拓扑和/或衬底保持器的几何形状的函数的方法。 将基板放置在能够在X坐标方向和Y坐标方向上横穿的测量台,该坐标方向承载待测量的基板。 衬底被支撑在限定平面的至少三个支撑点上。 提供了一种用于在X,Y和Z坐标方向上确定基板表面上的多个位置的位置的装置。 基板可以围绕平行于X / Y平面的轴线倾斜,以使基板能够在倾斜位置被测量。

    Method for determining the systematic error in the measurement of positions of edges of structures on a substrate resulting from the substrate topology
    4.
    发明申请
    Method for determining the systematic error in the measurement of positions of edges of structures on a substrate resulting from the substrate topology 有权
    用于确定由衬底拓扑结果产生的衬底上的结构边缘的位置的测量中的系统误差的方法

    公开(公告)号:US20090033894A1

    公开(公告)日:2009-02-05

    申请号:US12219000

    申请日:2008-07-21

    申请人: Slawomir Czerkas

    发明人: Slawomir Czerkas

    IPC分类号: G03B27/68

    CPC分类号: G01B21/045 G01B11/03

    摘要: A method for determining the lateral correction as a function of the substrate topology and/or the geometry of the substrate holder is disclosed. The substrate is placed on a measuring stage traversable in the X coordinate direction and Y coordinate direction, which carries the substrate to be measured. The substrate is supported on at least three support points which define a plane. An apparatus is provided for determining the position of a plurality of positions on the surface of the substrate in the in the X, Y and Z coordinate directions. The substrate is tiltable about an axis parallel to the X/Y plane, to enable the substrate to be measured in a tilted position.

    摘要翻译: 公开了一种用于确定横向校正作为衬底拓扑和/或衬底保持器的几何形状的函数的方法。 将基板放置在能够在X坐标方向和Y坐标方向上横穿的测量台,该坐标方向承载待测量的基板。 衬底被支撑在限定平面的至少三个支撑点上。 提供了一种用于在X,Y和Z坐标方向上确定基板表面上的多个位置的位置的装置。 基板可以围绕平行于X / Y平面的轴线倾斜,以使基板能够在倾斜位置被测量。

    COORDINATE MEASURING MACHINE WITH TEMPERATURE ADAPTING STATION
    5.
    发明申请
    COORDINATE MEASURING MACHINE WITH TEMPERATURE ADAPTING STATION 审中-公开
    坐标测量机与温度适配台

    公开(公告)号:US20090153875A1

    公开(公告)日:2009-06-18

    申请号:US12197410

    申请日:2008-08-25

    申请人: Slawomir Czerkas

    发明人: Slawomir Czerkas

    IPC分类号: G01B11/03 F28D21/00

    摘要: The invention relates to a coordinate measuring machine (1) and a method for adapting the temperature of substrates. The coordinate measuring machine (1) includes at least one measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9) and a camera (10) for determining the positions of the structures (3) on the substrate (2). There is further provided an interferometer (24) for determining the positions of the measurement objective (9) and the measurement table (20). The entire system is enclosed by a housing (50) forming a climatic chamber, in which there are further provided a magazine (32) for substrates (2), a loading station (35) for substrates (2) and a transport means (38) transporting the substrates (2) between the loading station (35), the magazine (32) and/or the measurement table (20).

    摘要翻译: 本发明涉及一种坐标测量机(1)和一种适应基片温度的方法。 坐标测量机(1)包括至少一个可沿X坐标方向和Y坐标方向移动的测量台(20),用于确定结构位置的测量目标(9)和照相机(10) (3)在基板(2)上。 还提供了一种用于确定测量目标(9)和测量表(20)的位置的干涉仪(24)。 整个系统由形成气候室的壳体(50)包围,其中还设置有用于基板(2)的料盒(32),用于基板(2)的装载站(35)和输送装置(38) )在所述装载站(35),所述仓(32)和/或所述测量台(20)之间传送所述基板(2)。

    Metrology system and method for monitoring and correcting system generated errors
    6.
    发明申请
    Metrology system and method for monitoring and correcting system generated errors 审中-公开
    计量系统和方法,用于监控和校正系统产生的错误

    公开(公告)号:US20100302555A1

    公开(公告)日:2010-12-02

    申请号:US12799362

    申请日:2010-04-23

    IPC分类号: G01B11/02

    CPC分类号: G01B11/005 G01B21/047

    摘要: A metrology system (1) and a method for determining low order errors are disclosed. At least one measurement objective (9) for the determination of the position of structures (3) on a substrate (2) is provided. The substrate (2) to be measured rests in a support on three points of support (52). The support exhibits an opening (53) for measuring the substrate (2). At least two marks (54) are provided on the support for the mask (2) in such a way that the marks (54) are capturable with the measurement objective (9) by moving the measurement table (20). Furthermore the substrate (2) in the support does not screen the marks (54) on the support.

    摘要翻译: 公开了一种计量系统(1)和确定低阶误差的方法。 提供了用于确定衬底(2)上的结构(3)的位置的至少一个测量目标(9)。 要测量的基板(2)支撑在三个支撑点(52)上。 支撑件具有用于测量基板(2)的开口(53)。 在用于掩模(2)的支撑件上设置至少两个标记(54),使得通过移动测量台(20)可以通过测量物镜(9)捕获标记(54)。 此外,支撑件中的基板(2)不会屏蔽支撑件上的标记(54)。

    Method for correcting measured values resulting from the bending of a substrate
    7.
    发明授权
    Method for correcting measured values resulting from the bending of a substrate 有权
    用于校正由基板弯曲产生的测量值的方法

    公开(公告)号:US07826068B2

    公开(公告)日:2010-11-02

    申请号:US12147974

    申请日:2008-06-27

    申请人: Slawomir Czerkas

    发明人: Slawomir Czerkas

    IPC分类号: G01B11/24

    CPC分类号: G01B21/045 G03F1/84

    摘要: A method for correcting the measured values of positions of structures (3) on a substrate (2) resulting from bending of a substrate (2) is disclosed. A plurality of geometric parameters of the substrate (2) are determined. A plurality of physical parameters of the substrate (2) are determined. A degree of bending is calculated individually for each substrate (2) on the basis of the obtained geometric parameters, the physical parameters and the position of the support points (40). The measured position data of the structures (3) on the substrate (2) is corrected with the aid of each individually calculated degree of bending.

    摘要翻译: 公开了一种用于校正由于基板(2)的弯曲而导致的基板(2)上的结构(3)的位置的测量值的方法。 确定衬底(2)的多个几何参数。 确定基板(2)的多个物理参数。 基于获得的几何参数,物理参数和支撑点(40)的位置,针对每个基板(2)分别计算弯曲程度。 借助于每个单独计算的弯曲度来校正衬底(2)上的结构(3)的测量位置数据。

    Method for Correcting Measured Values Resulting from the Bending of a Substrate
    8.
    发明申请
    Method for Correcting Measured Values Resulting from the Bending of a Substrate 有权
    校正基板弯曲产生的测量值的方法

    公开(公告)号:US20090030639A1

    公开(公告)日:2009-01-29

    申请号:US12147974

    申请日:2008-06-27

    申请人: Slawomir Czerkas

    发明人: Slawomir Czerkas

    IPC分类号: G06F19/00

    CPC分类号: G01B21/045 G03F1/84

    摘要: A method for correcting the measured values of positions of structures (3) on a substrate (2) resulting from bending of a substrate (2) is disclosed. A plurality of geometric parameters of the substrate (2) are determined. A plurality of physical parameters of the substrate (2) are determined. A degree of bending is calculated individually for each substrate (2) on the basis of the obtained geometric parameters, the physical parameters and the position of the support points (40). The measured position data of the structures (3) on the substrate (2) is corrected with the aid of each individually calculated degree of bending.

    摘要翻译: 公开了一种用于校正由于基板(2)的弯曲而导致的基板(2)上的结构(3)的位置的测量值的方法。 确定衬底(2)的多个几何参数。 确定基板(2)的多个物理参数。 基于获得的几何参数,物理参数和支撑点(40)的位置,针对每个基板(2)分别计算弯曲程度。 借助于每个单独计算的弯曲度来校正衬底(2)上的结构(3)的测量位置数据。