Coordinate measuring machine and method for calibrating the coordinate measuring machine
    1.
    发明授权
    Coordinate measuring machine and method for calibrating the coordinate measuring machine 有权
    坐标测量机和校准坐标测量机的方法

    公开(公告)号:US08115808B2

    公开(公告)日:2012-02-14

    申请号:US12215115

    申请日:2008-06-25

    IPC分类号: H04N7/18

    CPC分类号: G01B11/03 G01B21/042

    摘要: A coordinate measuring machine is disclosed having an orientor automatically orienting a substrate associated therewith. A control and computing unit is further associated with the coordinate measuring machine, so that self-calibration may be performed on the basis of at least two different and automatically set orientations of the substrate.

    摘要翻译: 公开了一种坐标测量机,其具有自动定向与其相关联的衬底的定向器。 控制和计算单元进一步与坐标测量机相关联,使得可以基于至少两个不同且自动设置的基板取向进行自校准。

    Coordinate measuring machine and method for calibrating the coordinate measuring machine
    2.
    发明申请
    Coordinate measuring machine and method for calibrating the coordinate measuring machine 有权
    坐标测量机和校准坐标测量机的方法

    公开(公告)号:US20090002486A1

    公开(公告)日:2009-01-01

    申请号:US12215115

    申请日:2008-06-25

    IPC分类号: H04N7/18

    CPC分类号: G01B11/03 G01B21/042

    摘要: A coordinate measuring machine is disclosed having an orientor automatically orienting a substrate associated therewith. A control and computing unit is further associated with the coordinate measuring machine, so that self-calibration may be performed on the basis of at least two different and automatically set orientations of the substrate.

    摘要翻译: 公开了一种坐标测量机,其具有自动定向与其相关联的衬底的定向器。 控制和计算单元进一步与坐标测量机相关联,使得可以基于至少两个不同且自动设置的基板取向进行自校准。

    Method and measuring instrument for determining the position of an edge of a pattern element on a substrate
    3.
    发明授权
    Method and measuring instrument for determining the position of an edge of a pattern element on a substrate 有权
    用于确定图案元件在基底上的边缘的位置的方法和测量仪器

    公开(公告)号:US06920249B2

    公开(公告)日:2005-07-19

    申请号:US09960734

    申请日:2001-09-24

    摘要: A method and a measuring instrument for determining the position of an edge to be measured on a pattern on a substrate are described. A complete, nonlinear model intensity profile, which identifies the edge to be measured, of a model edge is ascertained and stored, and a desired edge position xk is defined therein with subpixel accuracy. A camera image of the substrate having the edge to be measured is acquired, and a one-dimensional measured intensity profile of the edge to be measured is determined therefrom. The model intensity profile is identified in the measured intensity profile with an indication of its location xm relative to a reference point. The desired position p of the edge to be measured is determined with subpixel accuracy as p=xm+xk.

    摘要翻译: 描述了一种用于确定待测量边缘在基板上的图案上的位置的方法和测量仪器。 确定并存储识别模型边缘的待测量边缘的完整的非线性模型强度分布,并且在其中以子像素精度来定义期望的边缘位置x k。 获取具有待测边缘的基板的相机图像,并从其确定待测边缘的一维测量强度分布。 模型强度分布在测量的强度分布中被识别,并具有相对于参考点的位置x m的指示。 要测量的边缘的期望位置p由子像素精度确定为p = x m + x k k。

    System and method for determining positions of structures on a substrate
    4.
    发明申请
    System and method for determining positions of structures on a substrate 失效
    用于确定衬底上的结构位置的系统和方法

    公开(公告)号:US20090033508A1

    公开(公告)日:2009-02-05

    申请号:US12221145

    申请日:2008-07-31

    IPC分类号: G01B11/03 G08B21/00

    摘要: A system and a method for determining positions of structures on a substrate are disclosed. The system includes at least one measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9) and a camera for determining the positions of the structures (3) on the substrate (2). The position of the measurement objective (9) and/or the measurement table (20) may be determined by at least one interferometer (24). The system is surrounded by a housing representing a climatic chamber (50) provided with an active pressure regulation.

    摘要翻译: 公开了一种用于确定衬底上的结构位置的系统和方法。 该系统包括至少一个在X坐标方向和Y坐标方向上可移动的测量台(20),用于确定基板(2)上的结构(3)的位置的测量目标(9)和相机 )。 测量目标(9)和/或测量表(20)的位置可以由至少一个干涉仪(24)确定。 该系统由表示具有主动压力调节的气候室(50)的壳体包围。

    Method for determining correction values for the measured values of positions of structures on a substrate
    5.
    发明授权
    Method for determining correction values for the measured values of positions of structures on a substrate 有权
    用于确定衬底上的结构的位置的测量值的校正值的方法

    公开(公告)号:US07584072B2

    公开(公告)日:2009-09-01

    申请号:US12147703

    申请日:2008-06-27

    IPC分类号: G01P11/00

    CPC分类号: G01B21/045

    摘要: A method for allocating correction values of the degree of bending of a substrate (2) relative to a coordinate system (40) of a coordinate measuring machine (1) is disclosed. The positions of the at least two reference marks (32) on the substrate holder (27) are automatically determined relative to the coordinate system (40) of the coordinate measuring machine (1) for each substrate (2) currently placed in the substrate holder (27) in the coordinate measuring machine (1).

    摘要翻译: 公开了一种用于分配基板(2)相对于坐标测量机(1)的坐标系(40)的弯曲程度的校正值的方法。 基板保持器(27)上的至少两个参考标记(32)的位置相对于当前放置在基板保持器中的每个基板(2)的坐标测量机(1)的坐标系(40)自动确定 (27)在坐标测量机(1)中。

    Method for determining the focal position of at least two edges of structures on a substrate
    6.
    发明授权
    Method for determining the focal position of at least two edges of structures on a substrate 有权
    用于确定衬底上的结构的至少两个边缘的焦点位置的方法

    公开(公告)号:US07551296B2

    公开(公告)日:2009-06-23

    申请号:US12040872

    申请日:2008-03-01

    IPC分类号: G01B11/14

    CPC分类号: G02B7/38 G03F1/84

    摘要: A method for determining the focal position of at least two edges of structures (31) on a substrate (30) is disclosed. During the movement of a measurement objective (21) in the Z-coordinate direction, a plurality of images of the at least one structure (31) is acquired with at least one measurement window (45) of a detector. An intensity profile of the structure (31) is determined for each image.

    摘要翻译: 公开了一种用于确定衬底(30)上的结构(31)的至少两个边缘的焦点位置的方法。 在测量目标(21)在Z坐标方向移动期间,采用检测器的至少一个测量窗(45)获取所述至少一个结构(31)的多个图像。 为每个图像确定结构(31)的强度分布。

    System and method for determining positions of structures on a substrate
    7.
    发明授权
    System and method for determining positions of structures on a substrate 失效
    用于确定衬底上的结构位置的系统和方法

    公开(公告)号:US07978340B2

    公开(公告)日:2011-07-12

    申请号:US12221145

    申请日:2008-07-31

    IPC分类号: G01B11/02 G08B21/00

    摘要: A system and a method for determining positions of structures on a substrate are disclosed. The system includes at least one measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9) and a camera for determining the positions of the structures (3) on the substrate (2). The position of the measurement objective (9) and/or the measurement table (20) may be determined by at least one interferometer (24). The system is surrounded by a housing representing a climatic chamber (50) provided with an active pressure regulation.

    摘要翻译: 公开了一种用于确定衬底上的结构位置的系统和方法。 该系统包括至少一个在X坐标方向和Y坐标方向上可移动的测量台(20),用于确定基板(2)上的结构(3)的位置的测量目标(9)和相机 )。 测量目标(9)和/或测量表(20)的位置可以由至少一个干涉仪(24)确定。 该系统由表示具有主动压力调节的气候室(50)的壳体包围。

    Method for Determining Correction Values for the Measured Values of Positions of Structures on a Substrate
    8.
    发明申请
    Method for Determining Correction Values for the Measured Values of Positions of Structures on a Substrate 有权
    确定基板上结构位置的测量值的校正值的方法

    公开(公告)号:US20090024351A1

    公开(公告)日:2009-01-22

    申请号:US12147703

    申请日:2008-06-27

    IPC分类号: G01B11/03

    CPC分类号: G01B21/045

    摘要: A method for allocating correction values of the degree of bending of a substrate (2) relative to a coordinate system (40) of a coordinate measuring machine (1) is disclosed. The positions of the at least two reference marks (32) on the substrate holder (27) are automatically determined relative to the coordinate system (40) of the coordinate measuring machine (1) for each substrate (2) currently placed in the substrate holder (27) in the coordinate measuring machine (1).

    摘要翻译: 公开了一种用于分配基板(2)相对于坐标测量机(1)的坐标系(40)的弯曲程度的校正值的方法。 基板保持器(27)上的至少两个参考标记(32)的位置相对于当前放置在基板保持器中的每个基板(2)的坐标测量机(1)的坐标系(40)自动确定 (27)在坐标测量机(1)中。

    DEVICE AND METHOD FOR COATING IN THE EDGE AREA OF THE SMALL SIDES OF WORKPIECES
    9.
    发明申请
    DEVICE AND METHOD FOR COATING IN THE EDGE AREA OF THE SMALL SIDES OF WORKPIECES 审中-公开
    在工作的小边缘边缘涂层的装置和方法

    公开(公告)号:US20120288629A1

    公开(公告)日:2012-11-15

    申请号:US13469784

    申请日:2012-05-11

    IPC分类号: B05D5/00 B05D1/28 B05C1/00

    CPC分类号: B05C1/0813 B05C1/006

    摘要: A device 1 for the application of coating agents in the edge area of the small sides of workpieces 8 comprises a conveyance device 2, a coating roller 3, and at least two coating stamps 4. The coating roller 3 and/or the coating stamps 4 is/are advanced to the workpiece 8 with the help of pneumatic cylinders 6. The coating roller 3 and the coating stamps 4 in each case include a spraying device 5. The spraying processes of the coating roller 3 and of the coating stamps 4 are in each case pneumatically controllable.

    摘要翻译: 用于在工件8的小边缘的边缘区域中涂覆涂布剂的装置1包括输送装置2,涂布辊3和至少两个涂料印章4.涂布辊3和/或涂料印章4 在气动缸6的帮助下被推进到工件8上。涂覆辊3和涂覆戳4在每种情况下都包括喷涂装置5.涂布辊3和涂料邮票4的喷涂工艺处于 每种情况均可气动控制。

    METHOD FOR DETERMINING THE FOCAL POSITION OF AT LEAST TWO EDGES OF STRUCTURES ON A SUBSTRATE
    10.
    发明申请
    METHOD FOR DETERMINING THE FOCAL POSITION OF AT LEAST TWO EDGES OF STRUCTURES ON A SUBSTRATE 有权
    用于确定基底上最少两个结构边缘的焦点位置的方法

    公开(公告)号:US20080252903A1

    公开(公告)日:2008-10-16

    申请号:US12040872

    申请日:2008-03-01

    IPC分类号: G01B11/14

    CPC分类号: G02B7/38 G03F1/84

    摘要: A method for determining the focal position of at least two edges of structures (31) on a substrate (30) is disclosed. During the movement of a measurement objective (21) in the Z-coordinate direction, a plurality of images of the at least one structure (31) is acquired with at least one measurement window (45) of a detector. An intensity profile of the structure (31) is determined for each image.

    摘要翻译: 公开了一种用于确定衬底(30)上的结构(31)的至少两个边缘的焦点位置的方法。 在测量目标(21)在Z坐标方向移动期间,采用检测器的至少一个测量窗(45)获取至少一个结构(31)的多个图像。 为每个图像确定结构(31)的强度分布。