Method of manufacturing a thin film transistor array substrate
    1.
    发明授权
    Method of manufacturing a thin film transistor array substrate 有权
    制造薄膜晶体管阵列基板的方法

    公开(公告)号:US07902006B2

    公开(公告)日:2011-03-08

    申请号:US12436356

    申请日:2009-05-06

    摘要: In manufacturing a thin film transistor array substrate, a passivation film is formed over the transistors. A first photoresist pattern is formed over the passivation film, with a first portion partially overlying at least one source/drain electrode of each transistor and overlying each pixel electrode region, and with a second portion thicker than the first portion. The passivation film is patterned using the first photoresist pattern as a mask. The first photoresist pattern's first portion is removed to form a second photoresist pattern which protrudes upward around the pixel electrode regions. A transparent conductive film is formed with recesses in the pixel electrode regions. A masking pattern is formed over the transparent film in each pixel electrode region, the masking pattern's top surface being below a top of the transparent film. The transparent film is patterned using the masking pattern as a mask to form the pixel electrodes.

    摘要翻译: 在制造薄膜晶体管阵列基板时,在晶体管上形成钝化膜。 在钝化膜上形成第一光致抗蚀剂图案,其中第一部分部分地覆盖每个晶体管的至少一个源极/漏电极并且覆盖每个像素电极区域,并且具有比第一部分更厚的第二部分。 使用第一光致抗蚀剂图案作为掩模来图案化钝化膜。 去除第一光致抗蚀剂图案的第一部分以形成在像素电极区域周围向上突出的第二光致抗蚀剂图案。 透明导电膜在像素电极区域中形成有凹陷。 在每个像素电极区域中的透明膜上形成掩模图案,掩模图案的顶表面在透明膜的顶部之下。 使用掩模图案作为掩模来对透明膜进行图案化以形成像素电极。

    METHOD OF MANUFACTURING A THIN FILM TRANSISTOR ARRAY SUBSTRATE
    2.
    发明申请
    METHOD OF MANUFACTURING A THIN FILM TRANSISTOR ARRAY SUBSTRATE 有权
    制造薄膜晶体管阵列基板的方法

    公开(公告)号:US20100159652A1

    公开(公告)日:2010-06-24

    申请号:US12436356

    申请日:2009-05-06

    IPC分类号: H01L21/336

    摘要: In manufacturing a thin film transistor array substrate, a passivation film is formed over the transistors. A first photoresist pattern is formed over the passivation film, with a first portion partially overlying at least one source/drain electrode of each transistor and overlying each pixel electrode region, and with a second portion thicker than the first portion. The passivation film is patterned using the first photoresist pattern as a mask. The first photoresist pattern's first portion is removed to form a second photoresist pattern which protrudes upward around the pixel electrode regions. A transparent conductive film is formed with recesses in the pixel electrode regions. A masking pattern is formed over the transparent film in each pixel electrode region, the masking pattern's top surface being below a top of the transparent film. The transparent film is patterned using the masking pattern as a mask to form the pixel electrodes.

    摘要翻译: 在制造薄膜晶体管阵列基板时,在晶体管上形成钝化膜。 在钝化膜上形成第一光致抗蚀剂图案,其中第一部分部分地覆盖每个晶体管的至少一个源极/漏电极并且覆盖每个像素电极区域,并且具有比第一部分更厚的第二部分。 使用第一光致抗蚀剂图案作为掩模来图案化钝化膜。 去除第一光致抗蚀剂图案的第一部分以形成在像素电极区域周围向上突出的第二光致抗蚀剂图案。 透明导电膜在像素电极区域中形成有凹陷。 在每个像素电极区域中的透明膜上形成掩模图案,掩模图案的顶表面在透明膜的顶部之下。 使用掩模图案作为掩模来对透明膜进行图案化以形成像素电极。

    Thin film transistor substrate and manufacturing method thereof
    3.
    发明授权
    Thin film transistor substrate and manufacturing method thereof 有权
    薄膜晶体管基板及其制造方法

    公开(公告)号:US08450129B2

    公开(公告)日:2013-05-28

    申请号:US13231225

    申请日:2011-09-13

    IPC分类号: H01L33/16

    摘要: A thin film transistor (TFT) substrate is provided in which a sufficiently large contact area between conductive materials is provided in a contact portion and a method of fabricating the TFT substrate. The TFT substrate includes a gate interconnection line formed on an insulating substrate, a gate insulating layer covering the gate interconnection line, a semiconductor layer arranged on the gate insulating layer, a data interconnection line including a data line, a source electrode and a drain electrode formed on the semiconductor layer, a first passivation layer formed on the data interconnection line and exposing the drain electrode, a second passivation layer formed on the first passivation film and a pixel electrode electrically connected to the drain electrode. An outer sidewall of the second passivation layer is positioned inside an outer sidewall of the first passivation layer.

    摘要翻译: 提供一种薄膜晶体管(TFT)基板,其中在接触部分中提供导电材料之间的足够大的接触面积以及制造TFT基板的方法。 TFT基板包括形成在绝缘基板上的栅极互连线,覆盖栅极互连线的栅极绝缘层,布置在栅极绝缘层上的半导体层,包括数据线,源极和漏极的数据互连线 形成在所述半导体层上,形成在所述数据互连线上并暴露所述漏电极的第一钝化层,形成在所述第一钝化膜上的第二钝化层和与所述漏电极电连接的像素电极。 第二钝化层的外侧壁位于第一钝化层的外侧壁的内侧。

    Thin film transistor substrate and manufacturing method thereof
    4.
    发明授权
    Thin film transistor substrate and manufacturing method thereof 有权
    薄膜晶体管基板及其制造方法

    公开(公告)号:US08044405B2

    公开(公告)日:2011-10-25

    申请号:US12429388

    申请日:2009-04-24

    IPC分类号: H01L29/12 H01L21/336

    摘要: A thin film transistor (TFT) substrate is provided in which a sufficiently large contact area between conductive materials is provided in a contact portion and a method of fabricating the TFT substrate. The TFT substrate includes a gate interconnection line formed on an insulating substrate, a gate insulating layer covering the gate interconnection line, a semiconductor layer arranged on the gate insulating layer, a data interconnection line including a data line, a source electrode and a drain electrode formed on the semiconductor layer, a first passivation layer formed on the data interconnection line and exposing the drain electrode, a second passivation layer formed on the first passivation film and a pixel electrode electrically connected to the drain electrode. An outer sidewall of the second passivation layer is positioned inside an outer sidewall of the first passivation layer.

    摘要翻译: 提供一种薄膜晶体管(TFT)基板,其中在接触部分中提供导电材料之间的足够大的接触面积以及制造TFT基板的方法。 TFT基板包括形成在绝缘基板上的栅极互连线,覆盖栅极互连线的栅极绝缘层,布置在栅极绝缘层上的半导体层,包括数据线,源极和漏极的数据互连线 形成在所述半导体层上,形成在所述数据互连线上并暴露所述漏电极的第一钝化层,形成在所述第一钝化膜上的第二钝化层和与所述漏电极电连接的像素电极。 第二钝化层的外侧壁位于第一钝化层的外侧壁的内侧。

    Thin film transistor array substrate and manufacturing method thereof
    9.
    发明授权
    Thin film transistor array substrate and manufacturing method thereof 有权
    薄膜晶体管阵列基板及其制造方法

    公开(公告)号:US07947985B2

    公开(公告)日:2011-05-24

    申请号:US12435773

    申请日:2009-05-05

    IPC分类号: H01L27/14

    摘要: A thin film transistor array substrate and its manufacturing method are disclosed. A thin film transistor (TFT) includes a gate electrode formed on a substrate, and source and drain electrodes formed on the gate electrode and separated from each other. A common line made of the same material as the gate electrode is formed on the substrate. A storage capacitor includes a storage electrode connected with a storage electrode line and a pixel electrode formed on the storage electrode. The storage electrode and the pixel electrode are formed by patterning a transparent conductive film, and accordingly, light can be transmitted through the region where the storage capacitor is formed to thus increase an aperture ratio.

    摘要翻译: 公开了薄膜晶体管阵列基板及其制造方法。 薄膜晶体管(TFT)包括形成在基板上的栅极电极和形成在栅电极上并彼此分离的源极和漏极。 在基板上形成由与栅电极相同的材料构成的公共线。 存储电容器包括与存储电极线连接的存储电极和形成在存储电极上的像素电极。 存储电极和像素电极通过图案化透明导电膜而形成,因此可以通过形成存储电容器的区域透射光,从而增加开口率。