公开(公告)号：US20130075361A1

公开(公告)日：2013-03-28

申请号：US13528348

申请日：2012-06-20

申请人： Yoshiaki KAWAMONZEN ,  Yasuaki OOTERA ,  Akiko YUZAWA ,  Naoko KIHARA ,  Yoshiyuki KAMATA ,  Hiroyuki HIEDA ,  Norikatsu SASAO ,  Ryosuke YAMAMOTO ,  Takeshi OKINO ,  Tomoyuki MAEDA ,  Takuya SHIMADA

发明人： Yoshiaki KAWAMONZEN ,  Yasuaki OOTERA ,  Akiko YUZAWA ,  Naoko KIHARA ,  Yoshiyuki KAMATA ,  Hiroyuki HIEDA ,  Norikatsu SASAO ,  Ryosuke YAMAMOTO ,  Takeshi OKINO ,  Tomoyuki MAEDA ,  Takuya SHIMADA

IPC分类号： B44C1/22

CPC分类号： B44C1/227 ,  B41M5/00 ,  B81C1/0046 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337 ,  Y10T156/1041

摘要： A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

摘要翻译： 根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。

公开(公告)号：US20130069272A1

公开(公告)日：2013-03-21

申请号：US13423543

申请日：2012-03-19

申请人： Yasuaki OOTERA ,  Yoshiyuki KAMATA ,  Naoko KIHARA ,  Yoshiaki KAWAMONZEN ,  Takeshi OKINO ,  Ryosuke YAMAMOTO ,  Tomoyuki MAEDA ,  Norikatsu SASAO ,  Akiko YUZAWA ,  Takuya SHIMADA ,  Hiroyuki Hieda

发明人： Yasuaki OOTERA ,  Yoshiyuki KAMATA ,  Naoko KIHARA ,  Yoshiaki KAWAMONZEN ,  Takeshi OKINO ,  Ryosuke YAMAMOTO ,  Tomoyuki MAEDA ,  Norikatsu SASAO ,  Akiko YUZAWA ,  Takuya SHIMADA ,  Hiroyuki Hieda

IPC分类号： B29C41/22 ,  G11B5/84 ,  B44C1/22

CPC分类号： B29C33/3857 ,  G11B5/855

摘要： In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

摘要翻译： 在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。

公开(公告)号：US20120075972A1

公开(公告)日：2012-03-29

申请号：US13053877

申请日：2011-03-22

申请人： Takeshi OKINO

发明人： Takeshi OKINO

IPC分类号： G11B20/16

CPC分类号： G11B20/10009 ,  G11B20/10222 ,  G11B20/10407 ,  G11B2220/2516

摘要： An electron beam irradiating apparatus according to an embodiment includes: a deflector configured to perform blanking or deflecting of the electron beam emitted from an electron gun, the blanking being performed based on a blanking control signal, the deflecting being performed based on a deflection control signal, or blanking and deflecting being performed based on the blanking control signal and the deflection control signal; a first clock signal generation circuit configured to generate a first reference clock signal having cycles which vary with a drawing radial position on the stage; a second clock signal generation circuit configured to generate a second reference clock signal having cycles which are independent of the first reference clock signal; and a control signal generation circuit configured to generate a first control signal that is at least one of the blanking control signal and the deflection control signal, based on the first reference clock signal and the second reference clock signal.

摘要翻译： 根据实施例的电子束照射装置包括：偏转器，被配置为执行从电子枪发射的电子束的消隐或偏转，基于消隐控制信号执行消隐，偏转根据偏转控制信号执行 ，或者基于消隐控制信号和偏转控制信号执行消隐和偏转; 第一时钟信号生成电路，被配置为生成具有随着所述载物台上的绘制径向位置而变化的周期的第一参考时钟信号; 第二时钟信号产生电路，被配置为产生具有与所述第一参考时钟信号无关的周期的第二参考时钟信号; 以及控制信号生成电路，被配置为基于所述第一参考时钟信号和所述第二参考时钟信号来生成作为所述消隐控制信号和所述偏转控制信号中的至少一个的第一控制信号。

公开(公告)号：US20080204935A1

公开(公告)日：2008-08-28

申请号：US12031972

申请日：2008-02-15

申请人： Takeshi OKINO

发明人： Takeshi OKINO

IPC分类号： G11B5/82 ,  G03F7/20

CPC分类号： G11B5/865 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855 ,  G11B9/10 ,  H01J37/3174

摘要： It is made possible to fabricate a bit-patterned magnetic recording medium having a high recording density and making favorable address deciphering possible. An original disk fabrication method for irradiating a photosensitive resin film with an electron beam to draw a pattern, the method includes: irradiating the electron beam by using a plurality of blanking signals every rotation of a stage per bit unit, when drawing the pattern in a part corresponding to an address part on a photosensitive resin film.

摘要翻译： 可以制造具有高记录密度的位图形磁记录介质，并且可以实现有利的地址解密。 一种用于用电子束照射感光性树脂膜以绘制图案的原始光盘制造方法，所述方法包括：当以每位单位的每一次旋转时，使用多个消隐信号照射电子束，当将图案绘制在 对应于感光性树脂膜上的地址部分的部分。