公开(公告)号：US20110043784A1

公开(公告)日：2011-02-24

申请号：US12855181

申请日：2010-08-12

申请人： Yasuo AOKI ,  Tomohide Hamada ,  Hiroshi Shirasu ,  Manabu Toguchi

发明人： Yasuo AOKI ,  Tomohide Hamada ,  Hiroshi Shirasu ,  Manabu Toguchi

IPC分类号： G03B27/58 ,  B65G47/00 ,  B65G43/00

CPC分类号： G03F7/707 ,  B65G49/065 ,  G03F1/82 ,  G03F7/70791 ,  G03F7/70816 ,  H01L21/67784 ,  H01L21/68 ,  H01L21/6838

摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.

摘要翻译： 基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。 在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。 由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

公开(公告)号：US08699001B2

公开(公告)日：2014-04-15

申请号：US12855181

申请日：2010-08-12

申请人： Yasuo Aoki ,  Tomohide Hamada ,  Hiroshi Shirasu ,  Manabu Toguchi

发明人： Yasuo Aoki ,  Tomohide Hamada ,  Hiroshi Shirasu ,  Manabu Toguchi

IPC分类号： G03B27/58 ,  G03F7/20 ,  H01L21/677 ,  B65G49/06

CPC分类号： G03F7/707 ,  B65G49/065 ,  G03F1/82 ,  G03F7/70791 ,  G03F7/70816 ,  H01L21/67784 ,  H01L21/68 ,  H01L21/6838

摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.

摘要翻译： 基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。 在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。 由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

公开(公告)号：US5920378A

公开(公告)日：1999-07-06

申请号：US853389

申请日：1997-05-09

申请人： Masaichi Murakami ,  Hiroshi Shirasu ,  Tomohide Hamada ,  Kazuaki Saiki ,  Susumu Mori

发明人： Masaichi Murakami ,  Hiroshi Shirasu ,  Tomohide Hamada ,  Kazuaki Saiki ,  Susumu Mori

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/70691 ,  G03F7/70791 ,  G03F9/70

摘要： A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.

摘要翻译： 投影曝光装置包括离轴型板对准系统，其能够缩短对准时间，从而提高生产量。 大型感光板的曝光是可能的，而不会增加平板台面行程的长度。 使用了多个基准标记，其中包括在平台上不同位置的基准标记成员。 多个离轴型板对准系统用于观察多个基准标记。

公开(公告)号：US5581075A

公开(公告)日：1996-12-03

申请号：US446509

申请日：1995-05-22

申请人： Tsuyoshi Naraki ,  Masamitsu Yanagihara ,  Hiroshi Shirasu ,  Tomohide Hamada ,  Tetsuo Kikuchi ,  Noriaki Yamamoto

发明人： Tsuyoshi Naraki ,  Masamitsu Yanagihara ,  Hiroshi Shirasu ,  Tomohide Hamada ,  Tetsuo Kikuchi ,  Noriaki Yamamoto

IPC分类号： G03F7/20 ,  G01J1/32

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70791

摘要： An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.

摘要翻译： 曝光装置包括多个用于产生多个光束的照明光学系统，分别对应于多个照明光学系统设置的多个投影光学系统，分别为多个照明设置的多个光强度检测器 用于检测多个光束的各个强度的光学系统，用于改变多个光束的各个强度的光强度改变装置，以及用于控制光强度改变装置的控制装置，并且使多个光束的强度均匀化 光束达到基本上固定的水平。

公开(公告)号：US06266131B1

公开(公告)日：2001-07-24

申请号：US09309709

申请日：1999-05-11

申请人： Tomohide Hamada ,  Hiroshi Shirasu

发明人： Tomohide Hamada ,  Hiroshi Shirasu

IPC分类号： G03B2742

CPC分类号： G03F7/70691 ,  G02F1/1303 ,  G03B27/58 ,  G03F7/70358

摘要： A method of transferring a pattern of a mask onto an object through a projection system, includes the steps of providing a carriage having a mask holder surface adapted to hold the mask in a position which is angularly displaced from a horizontal position by a predetermined angle and an object holder surface adapted to the object in a position which is angularly displaced from the horizontal position by the predetermined angle, the carriage being movable in a first direction; transferring the pattern onto the object, the projection system being located between the mask and the object during the transfer operation; moving the carriage so that the projection system comes to a position out of a place between the mask holder surface and the object holder surface; and conveying the object from the object holder surface.

摘要翻译： 通过投影系统将掩模图案转印到物体上的方法包括以下步骤：提供具有掩模保持器表面的托架，所述托架表面适于将掩模保持在与水平位置成角度地移位预定角度的位置，以及 所述物体保持器表面适于在与所述水平位置成角度地移位预定角度的位置处，所述托架能够沿第一方向移动; 将图案转移到物体上，投影系统在转印操作期间位于掩模和物体之间; 移动滑架使得投影系统进入位于掩模保持器表面和物体保持器表面之间的位置; 并从物体保持器表面传送物体。

公开(公告)号：US06317196B1

公开(公告)日：2001-11-13

申请号：US09209270

申请日：1998-12-11

申请人： Tomohide Hamada ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kinya Kats

发明人： Tomohide Hamada ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kinya Kats

IPC分类号： G03B2118

CPC分类号： G03F7/70775 ,  G03F7/70358 ,  G03F7/70716 ,  G03F9/70

摘要： A projection exposure apparatus is provided. The projection exposure apparatus includes an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system to successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.

摘要翻译： 提供投影曝光装置。 投影曝光装置包括：照射光学系统，用于以掩模形式曝光掩模图案的一部分，其具有预定形状的曝光辐射通量;固定支架;固定在固定支架上的投影光学系统，用于投射照明图像 掩模图案的一部分到基板上，以及滑架，用于一体地保持掩模和基板，托架可相对于投影光学系统沿预定方向移动，以使基板与由 曝光辐射通量。 投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统 掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

公开(公告)号：US06570641B2

公开(公告)日：2003-05-27

申请号：US09955116

申请日：2001-09-19

申请人： Tomohide Hamada ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kinya Kato

发明人： Tomohide Hamada ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kinya Kato

IPC分类号： G03B2118

CPC分类号： G03F7/70775 ,  G03F7/70358 ,  G03F7/70716 ,  G03F9/70

摘要： The projection exposure apparatus can include an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.

摘要翻译： 投影曝光装置可以包括照射光学系统，用于以掩模形式的一部分掩模图案照射预定形状的曝光辐射通量，固定支撑件，固定在固定支架上的投影光学系统，用于投影图像的图像 掩模图案的照明部分到基板上，以及滑架，用于一体地保持掩模和基板，滑架可相对于投影光学系统沿预定方向移动，连续地将基板与由 曝光辐射通量。 投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统 掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

公开(公告)号：US5923409A

公开(公告)日：1999-07-13

申请号：US917226

申请日：1997-08-25

申请人： Tomohide Hamada ,  Hiroshi Shirasu

发明人： Tomohide Hamada ,  Hiroshi Shirasu

IPC分类号： G03B27/58 ,  G03F7/20 ,  G03B27/42 ,  G03B27/62

CPC分类号： G03F7/70691 ,  G03B27/58 ,  G03F7/70358 ,  G02F1/1303

摘要： In a scanning-type exposure apparatus, a mask and a light-sensitive substrate are disposed substantially vertically in opposed relation to each other, with an optical projection system disposed between the mask and the substrate. Optical projection system includes a plurality of optical elements for projecting an equal-size, erected image of a mask pattern onto the light-sensitive substrate, and these optical elements are arranged in a predetermined direction. A scanning device scanningly moves the mask and the light-sensitive substrate in synchronism with each other relative to the optical projection system in a direction which is perpendicular to both of the predetermined direction and an optical axis of the optical projection system.

摘要翻译： 在扫描型曝光装置中，掩模和感光基板以彼此相对的方式大致垂直地设置，并且光​​学投影系统设置在掩模和基板之间。 光学投影系统包括多个光学元件，用于将相同尺寸的竖立的掩模图案的图像投影到感光基板上，并且这些光学元件沿预定方向布置。 扫描装置相对于光学投影系统在垂直于光学投影系统的预定方向和光轴的方向上彼此同步地扫描地移动掩模和感光基板。

公开(公告)号：US5523574A

公开(公告)日：1996-06-04

申请号：US448659

申请日：1995-05-24

申请人： Tomohide Hamada ,  Hiroshi Shirasu

发明人： Tomohide Hamada ,  Hiroshi Shirasu

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F7/70358 ,  G03F9/70

摘要： An exposure apparatus has an illumination system for illuminating a mask with a light beam, a projection optical system for projecting a mask pattern on a photosensitive substrate and a carriage for integrally holding the mask and the photosensitive substrate. The exposure apparatus further has a detection system for detecting a change in attitude of the carriage and a correction system for correcting a positional deviation between the mask and the photosensitive substrate on the basis of a detected result of the detection system.

摘要翻译： 曝光装置具有用于用光束照射掩模的照明系统，用于在感光基板上投射掩模图案的投影光学系统和用于整体地保持掩模和感光基板的滑架。 曝光装置还具有用于检测滑架的姿态变化的检测系统和用于基于检测系统的检测结果校正掩模和感光基板之间的位置偏差的校正系统。

公开(公告)号：US08704431B2

公开(公告)日：2014-04-22

申请号：US13462454

申请日：2012-05-02

申请人： Hiroshi Shirasu ,  Yasuo Aoki ,  Motoo Koyama ,  Takayuki Kikuchi

发明人： Hiroshi Shirasu ,  Yasuo Aoki ,  Motoo Koyama ,  Takayuki Kikuchi

IPC分类号： H01J61/52

CPC分类号： F21V19/006 ,  G03F7/70016 ,  H01J5/56 ,  H01J61/523 ,  H01J61/822

摘要： A light source apparatus is equipped with a discharge lamp, which has a glass tube that forms a light emitting part and a base member that is coupled thereto, and a mounting apparatus that holds the discharge lamp via the base member. Therein, the base member has a flange part that contacts positioning plate of the mounting apparatus, and a fixed part that is urged with a pressing force that presses the flange part to the positioning plate. Furthermore, the mounting apparatus has a fixing arm that urges the fixed part by a compression coil spring.

摘要翻译： 光源装置配备有放电灯，其具有形成发光部的玻璃管和与其连接的基座部件，以及通过基座部件保持放电灯的安装装置。 其特征在于，所述基座部件具有与所述安装装置的定位板接触的凸缘部以及将所述凸缘部压向所述定位板的按压力而被推压的固定部。 此外，安装装置具有通过压缩螺旋弹簧推压固定部的固定臂。