公开(公告)号：US07226801B2

公开(公告)日：2007-06-05

申请号：US11319839

申请日：2005-12-28

Applicant: Yi-Chen Chiang ,  Kuo-Yu Huang

Inventor： Yi-Chen Chiang ,  Kuo-Yu Huang

IPC: H01L21/00 ,  H01L29/04

CPC classification number: G02F1/1339

Abstract: A sealant region pattern for a liquid crystal display apparatus and a method for fabricating the same. The method comprises providing a first substrate and a second substrate opposite thereto, forming a predetermined material layer on the first substrate, forming an organic material pattern layer having openings of a saw tooth pattern on the predetermined material layer to expose the surface of the predetermined material layer underneath, The surface of the predetermined material layer and the sidewall of the organic material pattern layer form a predetermined angle.

Abstract translation: 一种用于液晶显示装置的密封剂区域图案及其制造方法。 该方法包括提供第一基板和与其相对的第二基板，在第一基板上形成预定的材料层，在预定材料层上形成具有锯齿图案开口的有机材料图案层，以露出预定材料的表面 预定材料层的表面和有机材料图案层的侧壁形成预定角度。

公开(公告)号：US20060160259A1

公开(公告)日：2006-07-20

申请号：US11319839

申请日：2005-12-28

Applicant: Yi-Chen Chiang ,  Kuo-Yu Huang

Inventor： Yi-Chen Chiang ,  Kuo-Yu Huang

IPC: H01L21/00 ,  H01L51/40 ,  H01L21/50

CPC classification number: G02F1/1339

Abstract: A sealant region pattern for a liquid crystal display apparatus and a method for fabricating the same. The method comprises providing a first substrate and a second substrate opposite thereto, forming a predetermined material layer on the first substrate, forming an organic material pattern layer having openings of a saw tooth pattern on the predetermined material layer to expose the surface of the predetermined material layer underneath, The surface of the predetermined material layer and the sidewall of the organic material pattern layer form a predetermined angle.

Abstract translation: 一种用于液晶显示装置的密封剂区域图案及其制造方法。 该方法包括提供第一基板和与其相对的第二基板，在第一基板上形成预定的材料层，在预定材料层上形成具有锯齿图案开口的有机材料图案层，以露出预定材料的表面 预定材料层的表面和有机材料图案层的侧壁形成预定角度。

公开(公告)号：US08772780B2

公开(公告)日：2014-07-08

申请号：US13609272

申请日：2012-09-11

Applicant: Kuo-Yu Huang ,  Te-Chun Huang

Inventor： Kuo-Yu Huang ,  Te-Chun Huang

IPC: H01L29/04

CPC classification number: H01L27/1244 ,  G02F2001/13456 ,  H01L27/1259

Abstract: An array substrate structure of a display panel includes a substrate, a plurality of first wirings, a first patterned insulating layer, a plurality of second wirings, a plurality of first protective patterns, and a plurality of second protective patterns. The substrate has a wiring region. The first wirings are disposed in the wiring region. The first patterned insulating layer is disposed on the first wirings. The second wirings are disposed on the first patterned insulating layer. The first protective patterns are disposed in the wiring region and disposed on the corresponding second wiring, respectively, where the first protective pattern includes a semiconductor material. The second protective patterns are disposed on the corresponding first protective pattern, respectively, where the second protective pattern includes an inorganic insulating material.

Abstract translation: 显示面板的阵列基板结构包括基板，多个第一布线，第一图案化绝缘层，多个第二布线，多个第一保护图案和多个第二保护图案。 基板具有布线区域。 第一布线布置在布线区域中。 第一图案化绝缘层设置在第一布线上。 第二布线布置在第一图案化绝缘层上。 第一保护图案分别布置在布线区域中并且分别布置在第一保护图案包括半导体材料的相应的第二布线上。 第二保护图案分别设置在相应的第一保护图案上，其中第二保护图案包括无机绝缘材料。

公开(公告)号：US20130168707A1

公开(公告)日：2013-07-04

申请号：US13609272

申请日：2012-09-11

Applicant: Kuo-Yu Huang ,  Te-Chun Huang

Inventor： Kuo-Yu Huang ,  Te-Chun Huang

IPC: H01L33/08 ,  H01L21/336

CPC classification number: H01L27/1244 ,  G02F2001/13456 ,  H01L27/1259

Abstract: An array substrate structure of a display panel includes a substrate, a plurality of first wirings, a first patterned insulating layer, a plurality of second wirings, a plurality of first protective patterns, and a plurality of second protective patterns. The substrate has a wiring region. The first wirings are disposed in the wiring region. The first patterned insulating layer is disposed on the first wirings. The second wirings are disposed on the first patterned insulating layer. The first protective patterns are disposed in the wiring region and disposed on the corresponding second wiring, respectively, where the first protective pattern includes a semiconductor material. The second protective patterns are disposed on the corresponding first protective pattern, respectively, where the second protective pattern includes an inorganic insulating material.

Abstract translation: 显示面板的阵列基板结构包括基板，多个第一布线，第一图案化绝缘层，多个第二布线，多个第一保护图案和多个第二保护图案。 基板具有布线区域。 第一布线布置在布线区域中。 第一图案化绝缘层设置在第一布线上。 第二布线布置在第一图案化绝缘层上。 第一保护图案分别布置在布线区域中并且分别布置在第一保护图案包括半导体材料的相应的第二布线上。 第二保护图案分别设置在相应的第一保护图案上，其中第二保护图案包括无机绝缘材料。

公开(公告)号：US08247245B2

公开(公告)日：2012-08-21

申请号：US13047610

申请日：2011-03-14

Applicant: Hsiang-Lin Lin ,  Liu-Chung Lee ,  Kuo-Yu Huang

Inventor： Hsiang-Lin Lin ,  Liu-Chung Lee ,  Kuo-Yu Huang

IPC: H01L29/72

CPC classification number: G02F1/136213 ,  G02F2001/136218

Abstract: A pixel structure is disclosed. The pixel structure includes a substrate, a first data line having at least one end formed on the substrate, a first insulation layer overlying the first data line and exposing a part of the end of the first data line, a shielding electrode disposed on the first insulation layer and overlapped with the first data line, a second data line formed on the first insulation layer and electrically connected to the exposed end of the first data line, a second insulation layer overlying the shielding electrode and the second data line, and a pixel electrode formed on the second insulation layer and overlapped with the shielding electrode. The invention also provides a method for fabricating the pixel structure.

Abstract translation: 公开了像素结构。 像素结构包括基板，具有至少一个端部形成在基板上的第一数据线，覆盖第一数据线并暴露第一数据线的端部的一部分的第一绝缘层，设置在第一数据线上的屏蔽电极 绝缘层并与第一数据线重叠，形成在第一绝缘层上并电连接到第一数据线的暴露端的第二数据线，覆盖屏蔽电极和第二数据线的第二绝缘层，以及像素 电极，形成在第二绝缘层上并与屏蔽电极重叠。 本发明还提供了一种用于制造像素结构的方法。

公开(公告)号：US07924353B2

公开(公告)日：2011-04-12

申请号：US12168165

申请日：2008-07-07

Applicant: Hsin-Ming Liao ,  Kuo-Yu Huang ,  Han-Tu Lin

Inventor： Hsin-Ming Liao ,  Kuo-Yu Huang ,  Han-Tu Lin

IPC: G02F1/1343

CPC classification number: G02F1/136213 ,  G02F2201/40 ,  H01L27/1255

Abstract: A pixel structure is disposed on a substrate and electrically connected to a scan line and a data line. The pixel structure including an active device, a bottom capacitor electrode, an insulator, and a pixel electrode is provided. The active device is disposed on the substrate and has a gate, a source and a drain. Besides, the active device is electrically connected to the scan line and the data line. The bottom capacitor electrode and the gate are separately disposed on the substrate. The insulator covering the active device and the bottom capacitor electrode is made of a mono film. The pixel electrode is electrically connected to the active device, and at least a part of the pixel electrode extends to the insulator above the bottom capacitor electrode.

Abstract translation: 像素结构设置在基板上并电连接到扫描线和数据线。 提供了包括有源器件，底部电容器电极，绝缘体和像素电极的像素结构。 有源器件设置在衬底上并具有栅极，源极和漏极。 此外，有源器件电连接到扫描线和数据线。 底部电容器电极和栅极分别设置在基板上。 覆盖有源器件和底部电容器电极的绝缘体由单膜制成。 像素电极电连接到有源器件，并且像素电极的至少一部分延伸到底部电容器电极之上的绝缘体。

公开(公告)号：US07829393B2

公开(公告)日：2010-11-09

申请号：US12366693

申请日：2009-02-06

Applicant: Yu-Wei Liu ,  Wen-Ching Tsai ,  Kuo-Yu Huang ,  Hui-Fen Lin

Inventor： Yu-Wei Liu ,  Wen-Ching Tsai ,  Kuo-Yu Huang ,  Hui-Fen Lin

IPC: H01L21/00

CPC classification number: H01L29/4908

Abstract: A copper gate electrode, applied in a thin-film-transistor liquid crystal display (LCD) device, at least comprises a patterned copper layer formed on a glass substrate, and a barrier layer formed on the patterned copper layer. The barrier layer comprises at least one of nitrogen and phosphorus, or comprises an alloy formularized as M1M2R wherein M1 is cobalt (Co) or molybdenum (Mo), M2 is tungsten (W), molybdenum (Mo), rhenium (Re) or vanadium (V), and R is boron (B) or phosphorus (P).

Abstract translation: 施加在薄膜晶体管液晶显示器（LCD）装置中的铜栅电极至​​少包括形成在玻璃基板上的图案化铜层和形成在图案化铜层上的阻挡层。 阻挡层包括氮和磷中的至少一种，或包含形式为M1M2R的合金，其中M1是钴（Co）或钼（Mo），M2是钨（W），钼（Mo），铼（Re）或钒 （V），R为硼（B）或磷（P）。

公开(公告)号：US20090262269A1

公开(公告)日：2009-10-22

申请号：US12168165

申请日：2008-07-07

Applicant: Hsin-Ming Liao ,  Kuo-Yu Huang ,  Han-Tu Lin

Inventor： Hsin-Ming Liao ,  Kuo-Yu Huang ,  Han-Tu Lin

IPC: G02F1/133

CPC classification number: G02F1/136213 ,  G02F2201/40 ,  H01L27/1255

Abstract: A pixel structure is disposed on a substrate and electrically connected to a scan line and a data line. The pixel structure including an active device, a bottom capacitor electrode, an insulator, and a pixel electrode is provided. The active device is disposed on the substrate and has a gate, a source and a drain. Besides, the active device is electrically connected to the scan line and the data line. The bottom capacitor electrode and the gate are separately disposed on the substrate. The insulator covering the active device and the bottom capacitor electrode is made of a mono film. The pixel electrode is electrically connected to the active device, and at least a part of the pixel electrode extends to the insulator above the bottom capacitor electrode.

Abstract translation: 像素结构设置在基板上并电连接到扫描线和数据线。 提供了包括有源器件，底部电容器电极，绝缘体和像素电极的像素结构。 有源器件设置在衬底上并具有栅极，源极和漏极。 此外，有源器件电连接到扫描线和数据线。 底部电容器电极和栅极分别设置在基板上。 覆盖有源器件和底部电容器电极的绝缘体由单膜制成。 像素电极电连接到有源器件，并且像素电极的至少一部分延伸到底部电容器电极之上的绝缘体。

公开(公告)号：US07569333B2

公开(公告)日：2009-08-04

申请号：US11852365

申请日：2007-09-10

Applicant: Tzeng-Guang Tsai ,  Kuo-Yu Huang ,  Hui-Fen Lin ,  Yu-Wei Liu

Inventor： Tzeng-Guang Tsai ,  Kuo-Yu Huang ,  Hui-Fen Lin ,  Yu-Wei Liu

IPC: G03F7/00 ,  G03C5/00 ,  C23C28/00

CPC classification number: H01L21/76885 ,  G02F2001/136295 ,  H01L21/76834 ,  H05K3/0023 ,  H05K3/064 ,  H05K3/108 ,  H05K3/388 ,  H05K2201/0108 ,  H05K2203/0571 ,  H05K2203/0585 ,  H05K2203/0597

Abstract: The wiring line structure comprises a transparent substrate, a barrier layer, a metal layer, and a photosensitive protecting layer. The barrier layer and a metal layer are successively disposed on the transparent substrate. The photosensitive protecting layer is formed on the barrier layer and both sides of the metal layer. A method for fabricating the wiring line structure is also disclosed.

Abstract translation: 布线线结构包括透明基板，阻挡层，金属层和光敏保护层。 阻挡层和金属层依次设置在透明基板上。 感光保护层形成在阻挡层和金属层的两侧。 还公开了一种用于制造布线结构的方法。

公开(公告)号：US20090047749A1

公开(公告)日：2009-02-19

申请号：US12213253

申请日：2008-06-17

Applicant: Han-Tu Lin ,  Kuo-Yu Huang

Inventor： Han-Tu Lin ,  Kuo-Yu Huang

IPC: H01L21/336 ,  H01L33/00

CPC classification number: H01L27/1288 ,  H01L27/1214 ,  H01L27/124

Abstract: A first patterned conductive layer is formed on a substrate. A dielectric layer, a semiconductor layer, a second conductive layer and a photoresist layer are formed above the first patterned conductive layer. The photoresist layer is patterned using a photomask with multiple different transparencies, and the patterned photoresist layer has at least three different thicknesses. The photoresist layer within the channel region is removed. The second conductive layer within the channel region and part of semiconductor layer are etched to form a channel, source and drain of a thin film transistor. The photoresist layer corresponding to a pixel connecting region and a data pad region is removed to expose a pixel connecting region and a data pad. The remained photoresist layer is reflowed so as to cover the channel. The uncovered semiconductor layer is removed using the reflowed photoresist layer and the patterned second conductive layer as a mask.

Abstract translation: 在基板上形成第一图案化导电层。 在第一图案化导电层的上方形成介电层，半导体层，第二导电层和光致抗蚀剂层。 使用具有多个不同透明度的光掩模对光致抗蚀剂层进行图案化，并且图案化的光致抗蚀剂层具有至少三个不同的厚度。 去除沟道区内的光致抗蚀剂层。 沟道区域内的第二导电层和半导体层的一部分被蚀刻以形成薄膜晶体管的沟道，源极和漏极。 对应于像素连接区域和数据焊盘区域的光致抗蚀剂层被去除以暴露像素连接区域和数据焊盘。 保留的光致抗蚀剂层被回流以覆盖通道。 使用回流光致抗蚀剂层和图案化的第二导电层作为掩模去除未覆盖的半导体层。