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    System and method for dry chamber temperature control
    1.
    发明申请
    System and method for dry chamber temperature control 审中-公开
    干室温度控制系统和方法

    公开(公告)号：US20050016467A1

    公开(公告)日：2005-01-27

    申请号：US10626998

    申请日：2003-07-24

    申请人： Yi-Li Hsiao ,  Mei-Sheng Zhou ,  Chin-Hsin Peng ,  Chien-Ling Huang ,  Tse-Yi Chen ,  Chun-Yi Lee ,  Hsueh-Chang Wu

    发明人： Yi-Li Hsiao ,  Mei-Sheng Zhou ,  Chin-Hsin Peng ,  Chien-Ling Huang ,  Tse-Yi Chen ,  Chun-Yi Lee ,  Hsueh-Chang Wu

    IPC分类号： C23C16/00 ,  H01L21/00

    CPC分类号： H01L21/67248 ,  H01J2237/2001 ,  H01L21/67109

    摘要： A system and method which is capable of compensating for unintended elevations in process temperatures induced in a substrate during a semiconductor fabrication process in order to reduce or eliminate disparities in critical dimensions of device features. The system may be a plasma etching system comprising a process chamber containing an electrostatic chuck (ESC) for supporting a wafer substrate. A chiller outside the process chamber includes a main coolant chamber, which contains a main coolant fluid, as well as an compensation coolant chamber, which contains an compensation coolant fluid. A main circulation loop normally circulates the main coolant fluid from the main coolant chamber through the electrostatic chuck to maintain the chuck at a desired set point temperature.

    摘要翻译： 一种系统和方法，其能够在半导体制造过程期间补偿在衬底中感应的工艺温度中的意外高度，以便减少或消除器件特征的关键尺寸的不均匀性。 该系统可以是包括含有用于支撑晶片衬底的静电吸盘（ESC）的处理室的等离子体蚀刻系统。 处理室外部的冷却器包括主冷却剂室，其包含主冷却剂流体，以及补偿冷却剂室，其包含补偿冷却剂流体。 主循环回路通常使主冷却剂流体从主冷却剂室通过静电吸盘循环，以将卡盘保持在所需的设定点温度。

    Multi-phase pressure control valve for process chamber
    2.
    发明授权
    Multi-phase pressure control valve for process chamber 失效
    用于处理室的多相压力控制阀

    公开(公告)号：US06843264B2

    公开(公告)日：2005-01-18

    申请号：US10323377

    申请日：2002-12-18

    申请人： Chih-Tien Chang ,  Hsueh-Chang Wu ,  Sunny Wu ,  Chien-Ling Huang ,  Chin-Hsin Peng ,  Mei-Seng Zhou

    发明人： Chih-Tien Chang ,  Hsueh-Chang Wu ,  Sunny Wu ,  Chien-Ling Huang ,  Chin-Hsin Peng ,  Mei-Seng Zhou

    IPC分类号： C23C16/44 ,  F16K11/10 ,  F16K1/18

    CPC分类号： F16K1/223 ,  C23C16/4412 ,  Y10T137/0396 ,  Y10T137/86944 ,  Y10T137/87378 ,  Y10T137/87523

    摘要： A new and improved, multi-phase pressure control valve for facilitating quick and accurate attainment and stabilization of gas pressure inside a semiconductor fabrication process chamber such as an etch chamber or CVD chamber. In one embodiment, the multi-phase pressure control valve is a butterfly-type valve which includes outer and inner vanes that independently control flow of gases from a process chamber to a vacuum pump. The larger-diameter outer vane stabilizes gas pressures within a large range, whereas the inner vane stabilizes pressure within a smaller range. In another embodiment, the multi-phase pressure control valve is a gate-type valve which may include a pivoting outer vane and an inner vane slidably disposed with respect to the outer vane for exposing a central gas flow opening in the outer vane.

    摘要翻译： 一种新的和改进的多相压力控制阀，用于促进半导体制造工艺室（例如蚀刻室或CVD室）内的气体压力的快速和准确的获得和稳定。 在一个实施例中，多相压力控制阀是蝶形阀，其包括独立地控制气体从处理室到真空泵的流动的外叶片和内叶片。 较大直径的外叶片将气体压力稳定在大范围内，而内叶片将压力稳定在较小的范围内。 在另一个实施例中，多相压力控制阀是门型阀，其可以包括枢转外叶片和相对于外叶片可滑动地设置的用于暴露外叶片中的中心气流开口的内叶片。

    Continuous liquid delivery system with anti-clog function
    3.
    发明申请
    Continuous liquid delivery system with anti-clog function 审中-公开
    连续输液系统具有防堵塞功能

    公开(公告)号：US20060043029A1

    公开(公告)日：2006-03-02

    申请号：US10931123

    申请日：2004-08-30

    申请人： Chih-Tien Chang ,  Cheng-Husn Chan ,  Bing-Hung Chen ,  Hsueh-Chang Wu ,  Mei-Sheng Zhou

    发明人： Chih-Tien Chang ,  Cheng-Husn Chan ,  Bing-Hung Chen ,  Hsueh-Chang Wu ,  Mei-Sheng Zhou

    IPC分类号： B01D29/66

    CPC分类号： B01D37/00 ,  B24B57/02

    摘要： A continuous liquid delivery system which includes at least one primary filter and at least one secondary filter for alternatively receiving a liquid such as a CMP polishing slurry. A primary backwash circuit is provided in fluid communication with each primary filter for backwashing of the primary filter. At least one secondary backwash circuit is provided in fluid communication with each secondary filter for backwashing of the secondary filter. As the liquid is distributed through the primary filter or filters, the secondary filter or filters can be backwashed, and vice-versa to facilitate a continuous flow of the liquid from a source to a destination.

    摘要翻译： 一种连续液体输送系统，其包括至少一个初级过滤器和至少一个辅助过滤器，用于替代地接收液体，例如CMP抛光浆料。 提供主回流电路与每个主过滤器流体连通，用于主过滤器的反冲洗。 提供至少一个二次反洗电路与每个二次过滤器流体连通，用于二次过滤器的反冲洗。 当液体通过主过滤器或过滤器分配时，二次过滤器或过滤器可以被反冲洗，反之亦然，以便于液体从源到目的地的连续流动。