公开(公告)号：US20070207409A1

公开(公告)日：2007-09-06

申请号：US11746316

申请日：2007-05-09

Applicant: Yoko TAKEBE ,  Isamu Kaneko

Inventor： Yoko TAKEBE ,  Isamu Kaneko

IPC: C07C43/16

CPC classification number: G03F7/0046 ,  C07C69/65 ,  C08F36/20 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/146

Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2═CFCH2CH-Q-CH2CH═CH2  (1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.

Abstract translation: 提供具有官能团并且在宽波长区域具有高透明度的含氟聚合物，以及包含含氟聚合物的抗蚀剂组合物。 具有通过由下式（1）表示的氟化二烯的聚合形成的单体单元的含氟聚合物（A）：<？in-line-formula description =“In-line formula”end =“lead”？> CF 2 < - CHCH 2 CH-CH-CH 2 CH-CH 2（1）<β在线公式描述 其中Q为（CH 2）2，C（CF 3）3）其中Q为（CH 3） >其中a为0〜3的整数，R 4为烷基或碳原子数为20以下的氟代烷基 可以具有醚性氧原子的原子，具有至多6个碳原子的烷氧基羰基或CH 2 R 5（其中R 5）是 具有至多6个碳原子的烷氧基羰基））或（CH 2）2 COR 6（其中d为0或1，以及 R 6是氢原子，或者具有至多20个碳原子的烷基或氟化烷基），其制备方法和抗蚀剂组合物 将含氟聚合物（A）作为碱。

公开(公告)号：US07026416B2

公开(公告)日：2006-04-11

申请号：US11124133

申请日：2005-05-09

Applicant: Yasuhide Kawaguchi ,  Shinji Okada ,  Yoko Takebe ,  Osamu Yokokoji ,  Isamu Kaneko

Inventor： Yasuhide Kawaguchi ,  Shinji Okada ,  Yoko Takebe ,  Osamu Yokokoji ,  Isamu Kaneko

IPC: C08F136/16 ,  C08F236/16 ,  C08F36/16 ,  G03F7/039

CPC classification number: C08F214/18 ,  C08F36/20 ,  C08F2/60

Abstract: To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter.A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2═CFCF2—C(CF3)(R5)—CH2CH═CH2  (3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.

Abstract translation: 提供适合作为波长为250nm以下的准分子激光的抗蚀剂材料的基础聚合物的氟聚合物。 具有由下式（3）表示的氟化二烯化合物的环化聚合形成的单体单元的含氟聚合物，<？in-line-formula description =“In-Line Formulas”end =“lead”→> CF 2 -CFCF 2 -C（CF 3）（R 5）CH 2 CH- （3）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R 5是羟基被封闭 或具有羟基的有机基团，R 8为环状饱和烃，例如环烷基 其可以具有取代基，或具有环状饱和烃的有机基团。

公开(公告)号：US20050202345A1

公开(公告)日：2005-09-15

申请号：US11124214

申请日：2005-05-09

Applicant: Yasuhide Kawaguchi ,  Isamu Kaneko ,  Yoko Takebe ,  Shinji Okada ,  Osamu Yokokoji

Inventor： Yasuhide Kawaguchi ,  Isamu Kaneko ,  Yoko Takebe ,  Shinji Okada ,  Osamu Yokokoji

IPC: C08F8/00 ,  C08F8/02 ,  C08F14/18 ,  C08F16/02 ,  C08F16/24 ,  C08F36/16 ,  G03C1/492 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0397 ,  C08F14/18 ,  C08F36/16 ,  G03C1/492 ,  G03F7/0046 ,  G03F7/0392

Abstract: A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.

Abstract translation: 能容易地形成例如F 2激子等真空紫外线透明性优异的抗干蚀剂组合物和干蚀刻特性，并且灵敏度，分辨率，平坦度，耐热性更好 等等。 抗蚀剂组合物，其特征在于，包含（A）具有被含有环烷基的封端基封闭的酸性基团的含氟聚合物，具有一个或多个环烷基的有机基团，双环烷基等，（B） 能够通过光照射产生酸的酸产生化合物，和（C）有机溶剂。

公开(公告)号：US20060122348A1

公开(公告)日：2006-06-08

申请号：US11336943

申请日：2006-01-23

Applicant: Yoko Takebe ,  Isamu Kaneko

Inventor： Yoko Takebe ,  Isamu Kaneko

IPC: C08F36/16

CPC classification number: G03F7/0046 ,  C07C69/65 ,  C08F36/20 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/146

Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2═CFCH2CH-Q-CH2CH═CH2   (1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.

Abstract translation: 提供具有官能团并且在宽波长区域具有高透明度的含氟聚合物，以及包含含氟聚合物的抗蚀剂组合物。 具有通过由下式（1）表示的氟化二烯的聚合形成的单体单元的含氟聚合物（A）：<？in-line-formula description =“In-line formula”end =“lead”？> CF 2 < - CHCH 2 CH-CH-CH 2 CH-CH 2（1）<β在线公式描述 其中Q为（CH 2）2，C（CF 3）3）其中Q为（CH 3） >其中a为0〜3的整数，R 4为烷基或碳原子数为20以下的氟代烷基 可以具有醚性氧原子的原子，具有至多6个碳原子的烷氧基羰基或CH 2 R 5（其中R 5）是 具有至多6个碳原子的烷氧基羰基））或（CH 2）2 COR 6（其中d为0或1，以及 R 6是氢原子或具有至多20个碳原子的烷基或氟化烷基），其制备方法和抗蚀剂组合物 以含氟聚合物（A）为基体。

公开(公告)号：US06984704B2

公开(公告)日：2006-01-10

申请号：US11059695

申请日：2005-02-17

Applicant: Shun-ichi Kodama ,  Isamu Kaneko ,  Osamu Yokokoji ,  Shinji Okada ,  Yoko Takebe ,  Yasuhide Kawaguchi

Inventor： Shun-ichi Kodama ,  Isamu Kaneko ,  Osamu Yokokoji ,  Shinji Okada ,  Yoko Takebe ,  Yasuhide Kawaguchi

IPC: C08F36/20 ,  C08F114/18

CPC classification number: C08F36/20 ,  C08F36/16 ,  C08F214/18 ,  C08F2/60

Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg.A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2-Q-CR3═CHR4  (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

公开(公告)号：US06916590B2

公开(公告)日：2005-07-12

申请号：US10322665

申请日：2002-12-19

Applicant: Isamu Kaneko ,  Yoko Takebe ,  Shun-ichi Kodama

Inventor： Isamu Kaneko ,  Yoko Takebe ,  Shun-ichi Kodama

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/108

Abstract: The following resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification type resist, is presented. A resist composition which comprises a fluoropolymer (A) having repeating units represented by a structure formed by the cyclopolymerization of one molecule of a fluorinated diene and one molecule of a monoene, in which the monoene unit in each repeating unit has a blocked acid group capable of regenerating the acid group by the action of an acid, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Abstract translation: 提出了以下抗蚀剂组合物，其特别是对光束的透明性和干蚀刻性能优异，并且提供了作为化学放大型抗蚀剂的灵敏度，分辨率，均匀性，耐热性等优异的抗蚀剂图案。 一种抗蚀剂组合物，其含有具有由一分子氟化二烯和一分子单烯环化聚合形成的结构的重复单元的含氟聚合物（A），其中每个重复单元中的单烯单元具有封闭的酸基团 通过酸的作用再生酸基，在照射时产生酸的产酸化合物（B）和有机溶剂（C）。

公开(公告)号：US20050143542A1

公开(公告)日：2005-06-30

申请号：US11059695

申请日：2005-02-17

Applicant: Shun-ichi Kodama ,  Isamu Kaneko ,  Osamu Yokokoji ,  Shinji Okada ,  Yoko Takebe ,  Yasuhide Kawaguchi

Inventor： Shun-ichi Kodama ,  Isamu Kaneko ,  Osamu Yokokoji ,  Shinji Okada ,  Yoko Takebe ,  Yasuhide Kawaguchi

IPC: C08F36/16 ,  C08F36/20 ,  C08F214/18

CPC classification number: C08F36/20 ,  C08F36/16 ,  C08F214/18 ,  C08F2/60

Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2-Q-CR3═CHR4   (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Abstract translation: 提供具有高浓度官能团的含氟聚合物以提供官能团的足够特性，并且不会降低Tg。 具有由式（1）表示的含官能团的氟化二烯的环化聚合形成的单体单元的含氟聚合物：<？in-line-formula description =“In-line formula”end =“lead”→CFR < 1 -CR 2 -Q-CR 3 -RR 4（1）<？在线公式描述=“ 其中独立的R 1〜R 4中的每一个表示氢原子，氟原子， 具有至多8个碳原子的烷基或脂环族烃基，并且其中至少一个是脂环族烃基，条件是烷基或脂环族烃基中的氢原子可以被氟原子取代， 烷基或氟代烷基; Q表示可以通过酸或能够转化为这种封端的酸性基团的基团而能够形成酸性基团的封端酸性基团的二价有机基团。

公开(公告)号：US07550545B2

公开(公告)日：2009-06-23

申请号：US11746316

申请日：2007-05-09

Applicant: Yoko Takebe ,  Isamu Kaneko

Inventor： Yoko Takebe ,  Isamu Kaneko

IPC: C08F136/16

CPC classification number: G03F7/0046 ,  C07C69/65 ,  C08F36/20 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/146

Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer.A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2═CFCH2CH-Q-CH2CH═CH2  (1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.

Abstract translation: 提供具有官能团并且在宽波长区域具有高透明度的含氟聚合物，以及包含含氟聚合物的抗蚀剂组合物。 具有通过由下式（1）表示的氟化二烯的聚合形成的单体单元的含氟聚合物（A）：<？in-line-formula description =“In-line formula”end =“lead”>> CF2-CFCH2CH- 其中Q是（CH 2）aC（CF 3）2 OR 4（其中a是0的整数） 至3，R 4为烷基或具有至多20个碳原子的可具有醚性氧原子，最多6个碳原子的烷氧基羰基或CH 2 R 5的氟代烷基（其中R 5为至多6个的烷氧基羰基 碳原子））或（CH2）dCOOR6（其中d为0或1，R6为氢原子，或烷基或至多为20个碳原子的氟代烷基），其制备方法和抗蚀剂 具有含氟聚合物（A）作为基质的组合物。

公开(公告)号：US07015366B2

公开(公告)日：2006-03-21

申请号：US11218472

申请日：2005-09-06

Applicant: Shun-ichi Kodama ,  Isamu Kaneko ,  Osamu Yokokoji ,  Shinji Okada ,  Yoko Takebe ,  Yasuhide Kawaguchi

Inventor： Shun-ichi Kodama ,  Isamu Kaneko ,  Osamu Yokokoji ,  Shinji Okada ,  Yoko Takebe ,  Yasuhide Kawaguchi

IPC: C07C41/00 ,  C07C43/00 ,  C07C407/00 ,  C07C409/00 ,  C08F136/16

CPC classification number: C08F36/20 ,  C08F36/16 ,  C08F214/18 ,  C08F2/60

Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg.A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2—Q—CR3═CHR4   (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Abstract translation: 提供具有高浓度官能团的含氟聚合物以提供官能团的足够特性，并且不会降低Tg。 具有由式（1）表示的含官能团的氟化二烯的环化聚合形成的单体单元的含氟聚合物：<？in-line-formula description =“In-line formula”end =“lead”→CFR < 1 -CR 2 -Q-CR 3 -RR 4（1）<？在线公式描述=“ 其中独立的R 1〜R 4中的每一个表示氢原子，氟原子， 具有至多8个碳原子的烷基或脂环族烃基，并且其中至少一个是脂环族烃基，条件是烷基或脂环族烃基中的氢原子可以被氟原子取代， 烷基或氟代烷基; Q表示可以通过酸或能够转化为这种封端的酸性基团的基团而能够形成酸性基团的封端酸性基团的二价有机基团。

公开(公告)号：US20090221845A1

公开(公告)日：2009-09-03

申请号：US12425453

申请日：2009-04-17

Applicant: Yoko Takebe ,  Isamu Kaneko

Inventor： Yoko Takebe ,  Isamu Kaneko

IPC: C07C69/65

CPC classification number: G03F7/0046 ,  C07C69/65 ,  C08F36/20 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/146

Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer.A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2═CFCH2CH-Q-CH2CH═CH2  (1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.

Abstract translation: 提供具有官能团并且在宽波长区域具有高透明度的含氟聚合物，以及包含含氟聚合物的抗蚀剂组合物。 具有通过由下式（1）表示的氟化二烯的聚合形成的单体单元的含氟聚合物（A）：<？in-line-formula description =“In-line formula”end =“lead”>> CF2-CFCH2CH- 其中Q是（CH 2）aC（CF 3）2 OR 4（其中a是0的整数） 至3，R 4为烷基或具有至多20个碳原子的可具有醚性氧原子，最多6个碳原子的烷氧基羰基或CH 2 R 5的氟代烷基（其中R 5为至多6个的烷氧基羰基 碳原子））或（CH2）dCOOR6（其中d为0或1，R6为氢原子，或烷基或至多为20个碳原子的氟代烷基），其制备方法和抗蚀剂 具有含氟聚合物（A）作为基质的组合物。