Thin film transistor substrate and method for fabricating the same
    1.
    发明授权
    Thin film transistor substrate and method for fabricating the same 失效
    薄膜晶体管基板及其制造方法

    公开(公告)号:US07605395B2

    公开(公告)日:2009-10-20

    申请号:US11433733

    申请日:2006-05-12

    IPC分类号: H01L51/10

    CPC分类号: H01L51/0533 H01L51/107

    摘要: A thin film transistor substrate includes an insulating substrate, a gate electrode formed on the insulating substrate, a first gate insulating film formed on the gate electrode and having an opening for exposing at least part of the gate electrode, a second gate insulating film covering the gate electrode exposed by the opening and having a larger dielectric constant than the first gate insulating film, a source electrode and a drain electrode disposed apart from each other in a central area of the second gate insulating film and defining a channel region there between, and an organic semiconductor layer formed in the channel region. A method for forming the TFT substrate is also provided. Thus, the present invention provides a TFT substrate in which a characteristic of a TFT is improved.

    摘要翻译: 薄膜晶体管基板包括绝缘基板,形成在绝缘基板上的栅极电极,形成在栅电极上并具有用于暴露栅电极的至少一部分的开口的第一栅极绝缘膜,覆盖 栅电极由开口暴露并且具有比第一栅极绝缘膜更大的介电常数,在第二栅极绝缘膜的中心区域彼此分开设置的源电极和漏电极,并在其间限定沟道区域, 形成在沟道区域中的有机半导体层。 还提供了一种用于形成TFT基板的方法。 因此,本发明提供了TFT的特性提高的TFT基板。

    Display device and method of manufacturing the same
    2.
    发明申请
    Display device and method of manufacturing the same 审中-公开
    显示装置及其制造方法

    公开(公告)号:US20070166855A1

    公开(公告)日:2007-07-19

    申请号:US11534106

    申请日:2006-09-21

    摘要: A display device comprises an insulating substrate, an organic semiconductor layer formed on the insulating substrate, a source electrode and a drain electrode, wherein the source electrode and the drain electrode are interposed between the insulating substrate and the organic semiconductor layer, and spaced away from each other to define a channel region therebetween which is biased to one side of a region in which the organic semiconductor layer is formed.

    摘要翻译: 显示装置包括绝缘基板,形成在绝缘基板上的有机半导体层,源电极和漏电极,其中源电极和漏电极介于绝缘基板和有机半导体层之间,并与 彼此限定它们之间的沟道区域,其被偏压到形成有机半导体层的区域的一侧。

    Display device and manufacturing method
    3.
    发明申请
    Display device and manufacturing method 审中-公开
    显示装置及制造方法

    公开(公告)号:US20070114525A1

    公开(公告)日:2007-05-24

    申请号:US11604076

    申请日:2006-11-22

    IPC分类号: H01L51/00

    摘要: Embodiments of a display device comprises an insulating substrate; a source electrode and a drain electrode on the insulating substrate and separated from one another to define a channel region; a wall having one or more openings to expose the channel region, at least a portion of the source electrode, and at least a portion of the drain electrode; and an organic semiconductor layer formed in the one or more openings, the one or more openings comprising a channel part exposing the channel region and an ink guide part extending outward from the channel part. The ink-jet printing process for the display device has an improved processing margin.

    摘要翻译: 显示装置的实施例包括绝缘基板; 源电极和漏极,并且彼此分离以限定沟道区; 具有一个或多个开口以暴露沟道区域的壁,源电极的至少一部分以及漏电极的至少一部分; 以及形成在所述一个或多个开口中的有机半导体层,所述一个或多个开口包括暴露所述沟道区的沟道部分和从所述沟道部向外延伸的引导部。 用于显示装置的喷墨打印处理具有改进的处理余量。

    Thin film transistor substrate and method for fabricating the same
    4.
    发明授权
    Thin film transistor substrate and method for fabricating the same 有权
    薄膜晶体管基板及其制造方法

    公开(公告)号:US07863086B2

    公开(公告)日:2011-01-04

    申请号:US12553780

    申请日:2009-09-03

    IPC分类号: H01L51/40

    CPC分类号: H01L51/0533 H01L51/107

    摘要: A thin film transistor substrate includes an insulating substrate, a gate electrode formed on the insulating substrate, a first gate insulating film formed on the gate electrode and having an opening for exposing at least part of the gate electrode, a second gate insulating film covering the gate electrode exposed by the opening and having a larger dielectric constant than the first gate insulating film, a source electrode and a drain electrode disposed apart from each other in a central area of the second gate insulating film and defining a channel region there between, and an organic semiconductor layer formed in the channel region. A method for forming the TFT substrate is also provided. Thus, the present invention provides a TFT substrate in which a characteristic of a TFT is improved.

    摘要翻译: 薄膜晶体管基板包括绝缘基板,形成在绝缘基板上的栅极电极,形成在栅电极上并具有用于暴露栅电极的至少一部分的开口的第一栅极绝缘膜,覆盖 栅电极由开口暴露并且具有比第一栅极绝缘膜更大的介电常数,在第二栅极绝缘膜的中心区域彼此分开设置的源电极和漏电极,并在其间限定沟道区域, 形成在沟道区域中的有机半导体层。 还提供了一种用于形成TFT基板的方法。 因此,本发明提供了TFT的特性提高的TFT基板。

    Thin film transistor substrate and method for fabricating the same
    5.
    发明申请
    Thin film transistor substrate and method for fabricating the same 失效
    薄膜晶体管基板及其制造方法

    公开(公告)号:US20070018161A1

    公开(公告)日:2007-01-25

    申请号:US11433733

    申请日:2006-05-12

    IPC分类号: H01L29/04 H01L21/84

    CPC分类号: H01L51/0533 H01L51/107

    摘要: A thin film transistor substrate includes an insulating substrate, a gate electrode formed on the insulating substrate, a first gate insulating film formed on the gate electrode and having an opening for exposing at least part of the gate electrode, a second gate insulating film covering the gate electrode exposed by the opening and having a larger dielectric constant than the first gate insulating film, a source electrode and a drain electrode disposed apart from each other in a central area of the second gate insulating film and defining a channel region there between, and an organic semiconductor layer formed in the channel region. A method for forming the TFT substrate is also provided. Thus, the present invention provides a TFT substrate in which a characteristic of a TFT is improved.

    摘要翻译: 薄膜晶体管基板包括绝缘基板,形成在绝缘基板上的栅极电极,形成在栅电极上并具有用于暴露栅电极的至少一部分的开口的第一栅极绝缘膜,覆盖 栅电极由开口暴露并且具有比第一栅极绝缘膜更大的介电常数,在第二栅极绝缘膜的中心区域彼此分开设置的源电极和漏电极,并在其间限定沟道区域, 形成在沟道区域中的有机半导体层。 还提供了一种用于形成TFT基板的方法。 因此,本发明提供了TFT的特性提高的TFT基板。

    Flat panel display and manufacturing method of flat panel display
    6.
    发明授权
    Flat panel display and manufacturing method of flat panel display 有权
    平板显示器的平板显示及制造方法

    公开(公告)号:US07682886B2

    公开(公告)日:2010-03-23

    申请号:US12325951

    申请日:2008-12-01

    IPC分类号: H01L21/84

    CPC分类号: H01L51/0533

    摘要: The present disclosure relates to a display device comprising an insulating substrate; a source electrode and a drain electrode on the insulating substrate and separated by a channel area; an organic semiconductor layer formed in the channel area and on at least a portion of the source electrode and at least a portion of the drain electrode; and a self-assembly monolayer having a first portion disposed between the organic semiconductor layer and the source electrode and a second portion disposed between the organic semiconductor layer and the drain electrode to reduce contact resistance between the electrodes and the organic semiconductor layer. Thus, embodiments of present invention provide a display device including a TFT that is enhanced in its performance.

    摘要翻译: 本公开涉及包括绝缘基板的显示装置; 绝缘基板上的源电极和漏极,并由沟道区分离; 有机半导体层,其形成在所述沟道区域中以及所述源电极和所述漏电极的至少一部分的至少一部分上; 以及具有设置在有机半导体层和源电极之间的第一部分的自组装单层和设置在有机半导体层和漏电极之间的第二部分,以减小电极和有机半导体层之间的接触电阻。 因此,本发明的实施例提供了一种显示装置,其包括增强其性能的TFT。

    Flat panel display and manufacturing method of flat panel display
    7.
    发明授权
    Flat panel display and manufacturing method of flat panel display 有权
    平板显示器的平板显示及制造方法

    公开(公告)号:US07619245B2

    公开(公告)日:2009-11-17

    申请号:US11497690

    申请日:2006-08-01

    IPC分类号: H01L35/24

    CPC分类号: H01L51/0533

    摘要: The present disclosure relates to a display device comprising an insulating substrate; a source electrode and a drain electrode on the insulating substrate and separated by a channel area; an organic semiconductor layer formed in the channel area and on at least a portion of the source electrode and at least a portion of the drain electrode; and a self-assembly monolayer having a first portion disposed between the organic semiconductor layer and the source electrode and a second portion disposed between the organic semiconductor layer and the drain electrode to reduce contact resistance between the electrodes and the organic semiconductor layer. Thus, embodiments of present invention provide a display device including a TFT that is enhanced in its performance.

    摘要翻译: 本公开涉及包括绝缘基板的显示装置; 绝缘基板上的源电极和漏极,并由沟道区分离; 有机半导体层,其形成在所述沟道区域中以及所述源电极和所述漏电极的至少一部分的至少一部分上; 以及具有设置在有机半导体层和源电极之间的第一部分的自组装单层和设置在有机半导体层和漏电极之间的第二部分,以减小电极和有机半导体层之间的接触电阻。 因此,本发明的实施例提供了一种显示装置,其包括增强其性能的TFT。

    Thin film transistor substrate and method of making the same
    8.
    发明授权
    Thin film transistor substrate and method of making the same 有权
    薄膜晶体管基板及其制造方法

    公开(公告)号:US07808044B2

    公开(公告)日:2010-10-05

    申请号:US11495911

    申请日:2006-07-27

    IPC分类号: H01L27/12

    摘要: The present invention relates to a thin film transistor substrate comprising: an insulating substrate; a source electrode and a drain electrode which are formed on the insulating substrate and separated from each other and have a channel area therebetween; a wall exposing at least portions of the source electrode and the drain electrode, respectively, encompassing the channel area, and formed of fluoropolymer; and an organic semiconductor layer formed inside the wall. Thus, the present invention provides a TFT substrate where an organic semiconductor layer is planarized. Further, the present invention also provides a method of making a TFT substrate of which an organic semiconductor layer is planarized.

    摘要翻译: 本发明涉及一种薄膜晶体管基板,包括:绝缘基板; 源电极和漏电极,其形成在绝缘基板上并且彼此分离并且在其间具有沟道区域; 分别暴露出源电极和漏电极的至少部分,其包围沟道区域,并由含氟聚合物形成; 和形成在壁内的有机半导体层。 因此,本发明提供了有机半导体层被平坦化的TFT基板。 此外,本发明还提供一种使有机半导体层平坦化的TFT基板的制造方法。

    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
    9.
    发明申请
    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF 失效
    显示装置及其制造方法

    公开(公告)号:US20100006832A1

    公开(公告)日:2010-01-14

    申请号:US12561218

    申请日:2009-09-16

    IPC分类号: H01L51/10 H01L51/40

    摘要: According to an embodiment of the present invention, a manufacturing method of a display device includes forming a plurality of gate wires comprising a gate electrode on an insulating substrate, forming an electrode layer comprising a source electrode and a drain electrode spaced apart from each other to define a channel region on the gate electrode interposed therebetween, forming a first barrier wall having a first opening for exposing the channel region, a portion of the source electrode, and a portion of the drain electrode on the electrode layer where the first barrier wall has a surface, forming a shielding film to cover the channel region inside the first opening, treating the surface of the first barrier wall, removing the shielding film, and forming an organic semiconductor layer inside the first opening.

    摘要翻译: 根据本发明的实施例,显示装置的制造方法包括在绝缘基板上形成包括栅电极的多条栅极线,形成包括彼此间隔开的源电极和漏极的电极层, 在所述栅极电极之间限定沟道区,形成第一阻挡壁,所述第一阻挡壁具有用于暴露所述沟道区的第一开口,所述源极的一部分以及所述第一阻挡壁具有的所述电极层上的所述漏电极的一部分 形成屏蔽膜以覆盖第一开口内的沟道区域,处理第一阻挡壁的表面,去除屏蔽膜,以及在第一开口内部形成有机半导体层。

    Display device and manufacturing method thereof
    10.
    发明申请
    Display device and manufacturing method thereof 失效
    显示装置及其制造方法

    公开(公告)号:US20070114524A1

    公开(公告)日:2007-05-24

    申请号:US11601086

    申请日:2006-11-17

    IPC分类号: H01L51/00 H01L51/40

    摘要: According to an embodiment of the present invention, a manufacturing method of a display device includes forming a plurality of gate wires comprising a gate electrode on an insulating substrate, forming an electrode layer comprising a source electrode and a drain electrode spaced apart from each other to define a channel region on the gate electrode interposed therebetween, forming a first barrier wall having a first opening for exposing the channel region, a portion of the source electrode, and a portion of the drain electrode on the electrode layer where the first barrier wall has a surface, forming a shielding film to cover the channel region inside the first opening, treating the surface of the first barrier wall, removing the shielding film, and forming an organic semiconductor layer inside the first opening.

    摘要翻译: 根据本发明的实施例,显示装置的制造方法包括在绝缘基板上形成包括栅电极的多条栅极线,形成包括彼此间隔开的源电极和漏极的电极层, 在所述栅极电极之间限定沟道区,形成第一阻挡壁,所述第一阻挡壁具有用于暴露所述沟道区的第一开口,所述源极的一部分以及所述第一阻挡壁具有的所述电极层上的所述漏电极的一部分 形成屏蔽膜以覆盖第一开口内的沟道区域,处理第一阻挡壁的表面,去除屏蔽膜,以及在第一开口内部形成有机半导体层。