公开(公告)号：US5975505A

公开(公告)日：1999-11-02

申请号：US832842

申请日：1997-04-04

申请人： Yoshiaki Yoshimoto ,  Chikara Itoh

发明人： Yoshiaki Yoshimoto ,  Chikara Itoh

IPC分类号： B60G15/06 ,  F16F9/32 ,  F16F9/54 ,  F16F15/08 ,  B60G13/00

CPC分类号： B60G15/068

摘要： A mount insulator is structured by a core metal body, installed at a fixed side and including an almost flat intermediate flange section having a piercing hole at an axial center section and a ring-shaped wall section extensively provided at the outer periphery of the intermediate flange in the direction of both sides crossing the intermediate section, and a mount elastic body section integrally fixed and formed with both sides of the intermediate flange section, an inner peripheral surface of the piercing hole and an inner peripheral surface of the ring-shaped wall section, and including an extension section expanded in a direction to cross the intermediate flange section and projecting from both wall sections, and a piercing supporting hole provided at the inner periphery side of the piercing hole of the intermediate flange section and piercing through between end surfaces of both extension sections of smaller diameter than that of the piercing hole and almost concentric with the piercing hole for piercingly support the axis section of a material to be mounted. Therefore, it is possible to restrict damaging of the mount insulator and generation of abnormal noise.

摘要翻译： 安装绝缘体由芯金属体构成，安装在固定侧，并且包括在轴向中心部分处具有穿孔的几乎平坦的中间凸缘部分和广泛设置在中间凸缘的外周处的环形壁部分 在与中间部分交叉的两侧的方向上，以及一体地固定并形成有中间凸缘部的两侧的安装弹性体部，穿孔的内周面和环状壁部的内周面 并且包括沿着与中间凸缘部分交叉并从两个壁部分突出的方向膨胀的延伸部分和设置在中间凸缘部分的穿孔的内周侧处的穿孔支撑孔，并穿过中间凸缘部分的端面之间 两个延伸部分的直径小于穿孔的直径，几乎与馅饼同心 用于穿刺地支撑要安装的材料的轴线部分的加热孔。 因此，可以限制安装绝缘子的损坏和异常噪声的产生。

公开(公告)号：US5602645A

公开(公告)日：1997-02-11

申请号：US527633

申请日：1995-09-13

申请人： Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

发明人： Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

IPC分类号： G01N21/956 ,  G03F1/84 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F1/84 ,  G01N21/95607 ,  G03F1/62

摘要： The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.

摘要翻译： 本发明提供了一种图案评估装置，其包括用于将来自光源的光线照射到物体上的光照射装置，穿过物体的光穿过的物镜通过阻止光束直径的孔径构件 已经通过物镜的光接收元件，接收由孔部件阻挡直径的光束的光接收元件，以及用于评估图案的判断装置，遵循由光接收元件接收的光的信息，并且对应于 所述图案，其中所述孔径构件能够根据样品是否设置有微孔而能够改变数值孔径。

公开(公告)号：US4572956A

公开(公告)日：1986-02-25

申请号：US525419

申请日：1983-08-22

申请人： Toru Tojo ,  Ichiro Mori ,  Toshiaki Shinozaki ,  Kazuyoshi Sugihara ,  Mitsuo Tabata ,  Chikara Itoh

发明人： Toru Tojo ,  Ichiro Mori ,  Toshiaki Shinozaki ,  Kazuyoshi Sugihara ,  Mitsuo Tabata ,  Chikara Itoh

IPC分类号： G03F7/207 ,  H01J37/21 ,  H01J37/304 ,  H01J37/317 ,  H01J37/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J37/3175 ,  H01J2237/216 ,  H01J2237/30455 ,  H01J2237/31779 ,  Y10S505/879

摘要： An electron beam pattern transfer system is disclosed which includes a photoelectric transducing mask disposed within a vacuum container and adapted to transfer a photoelectron beam pattern corresponding to a pattern of the mask onto a sample according to an amount of an incident light, a DC voltage generator connected to vary a voltage applied between the mask and the sample, and a focusing coil of a superconductive magnet for creating a magnetic field of a predetermined intensity between the mask and the sample. When a mask-to-sample distance and/or magnetic field intensity varies undesirably, the variation is electrically detected by detectors. In order to compensate for the defocusing of the photoelectron beam pattern on the sample due to the above-mentioned variation, a microprocessor automatically calculates an amount of correction with respect to the intensity of the electric field between the mask and the sample, on a real-time basis and supplies its control signal to the DC voltage generator.

摘要翻译： 公开了一种电子束图案转印系统，其包括设置在真空容器内并适于根据入射光量将对应于掩模图案的光电子束图案转移到样品上的光电转换掩模，直流电压发生器 连接以改变施加在掩模和样品之间的电压，以及用于在掩模和样品之间产生预定强度的磁场的超导磁体的聚焦线圈。 当掩模到采样距离和/或磁场强度变化不期望时，变化由检测器电检测。 为了补偿由于上述变化而导致的样品上的光电子束图案的散焦，微处理器自动地计算相对于掩模和样品之间的电场强度的校正量，实际上 并将其控制信号提供给直流电压发生器。