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    Method and apparatus for detecting defects on a wafer
    1.
    发明申请
    Method and apparatus for detecting defects on a wafer 有权
    用于检测晶片上的缺陷的方法和装置

    公开(公告)号：US20070070337A1

    公开(公告)日：2007-03-29

    申请号：US11500421

    申请日：2006-08-08

    申请人： Yoshimasa Ohshima ,  Sachio Uto ,  Yukihiro Shibata

    发明人： Yoshimasa Ohshima ,  Sachio Uto ,  Yukihiro Shibata

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95623 ,  G01N2201/0697

    摘要： As circuit patterns become finer in recent years, improvement in detection sensitivity of defects is required. To answer this, sensitivity is being enhanced using a laser with a wavelength of the UV band as the laser for irradiation. A pulse oscillation laser is often used as the UV laser. However, a peak (maximum output) of the pulse oscillation laser becomes very large to an average output power required. For example, in the case of a laser of average output power 2 W, pulse interval 10 ns, and pulse width 10 ps, the peak (maximum output) becomes as high as 2 kW, and there is the possibility of causing a damage to a sample. Therefore, it is necessary to reduce the peak (maximum output) with the average output power being maintained, so that it may not cause a damage to the sample. In this invention, the device is configured in such a way that pulsed light is optically divided into several pulses and these pulses are given respective paths whose lengths are set different from one another, whereby the peak (maximum output) is reduced while the average output value are maintained.

    摘要翻译： 随着近年来电路图案变得越来越精细，需要提高缺陷检测灵敏度。 为了解决这个问题，使用具有UV波段波长的激光作为照射用激光，正在提高灵敏度。 经常使用脉冲振荡激光器作为UV激光器。 然而，脉冲振荡激光器的峰值（最大输出）变得非常大，达到所需的平均输出功率。 例如，在平均输出功率2W，脉冲间隔10ns，脉冲宽度10ps的激光器的情况下，峰值（最大输出）变得高达2kW，并且存在对 一个样品。 因此，需要在保持平均输出功率的同时降低峰值（最大输出），从而不会对样品造成损害。 在本发明中，器件被配置成使得脉冲光被光学地分成几个脉冲，并且这些脉冲被给予各自的长度彼此不同的路径，从而峰值（最大输出）减小，而平均输出 保持价值。

    Method and apparatus for detecting defects on a wafer
    2.
    发明授权
    Method and apparatus for detecting defects on a wafer 有权
    用于检测晶片上的缺陷的方法和装置

    公开(公告)号：US07567343B2

    公开(公告)日：2009-07-28

    申请号：US11500421

    申请日：2006-08-08

    申请人： Yoshimasa Ohshima ,  Sachio Uto ,  Yukihiro Shibata

    发明人： Yoshimasa Ohshima ,  Sachio Uto ,  Yukihiro Shibata

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95623 ,  G01N2201/0697

    摘要： As circuit patterns become finer in recent years, improvement in detection sensitivity of defects is required. To answer this, sensitivity is being enhanced using a laser with a wavelength of the UV band as the laser for irradiation. A pulse oscillation laser is often used as the UV laser. However, a peak (maximum output) of the pulse oscillation laser becomes very large to an average output power required. For example, in the case of a laser of average output power 2 W, pulse interval 10 ns, and pulse width 10 ps, the peak (maximum output) becomes as high as 2 kW, and there is the possibility of causing a damage to a sample. Therefore, it is necessary to reduce the peak (maximum output) with the average output power being maintained, so that it may not cause a damage to the sample. In this invention, the device is configured in such a way that pulsed light is optically divided into several pulses and these pulses are given respective paths whose lengths are set different from one another, whereby the peak (maximum output) is reduced while the average output value are maintained.

    摘要翻译： 随着近年来电路图案变得越来越精细，需要提高缺陷检测灵敏度。 为了解决这个问题，使用具有UV波段波长的激光作为照射用激光，正在提高灵敏度。 经常使用脉冲振荡激光器作为UV激光器。 然而，脉冲振荡激光器的峰值（最大输出）变得非常大，达到所需的平均输出功率。 例如，在平均输出功率2W，脉冲间隔10ns，脉冲宽度10ps的激光器的情况下，峰值（最大输出）变得高达2kW，并且存在对 一个样品。 因此，需要在保持平均输出功率的同时降低峰值（最大输出），从而不会对样品造成损害。 在本发明中，器件被配置成使得脉冲光被光学地分成几个脉冲，并且这些脉冲被给予各自的长度彼此不同的路径，从而峰值（最大输出）减小，而平均输出 保持价值。

    Method of apparatus for detecting particles on a specimen
    4.
    发明授权
    Method of apparatus for detecting particles on a specimen 有权
    用于检测样品上的颗粒的装置的方法

    公开(公告)号：US07952700B2

    公开(公告)日：2011-05-31

    申请号：US12907895

    申请日：2010-10-19

    申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

    发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956

    摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

    摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

    Method of apparatus for detecting particles on a specimen
    5.
    发明授权
    Method of apparatus for detecting particles on a specimen 有权
    用于检测样品上的颗粒的装置的方法

    公开(公告)号：US07817261B2

    公开(公告)日：2010-10-19

    申请号：US12114139

    申请日：2008-05-02

    申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

    发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956

    摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

    摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

    Method Of Apparatus For Detecting Particles On A Specimen
    7.
    发明申请
    Method Of Apparatus For Detecting Particles On A Specimen 有权
    检测样品中颗粒物的方法

    公开(公告)号：US20080204724A1

    公开(公告)日：2008-08-28

    申请号：US12114139

    申请日：2008-05-02

    申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

    发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956

    摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

    摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

    Method for inspecting defect and apparatus for inspecting defect
    10.
    发明授权
    Method for inspecting defect and apparatus for inspecting defect 有权
    检查缺陷的方法和缺陷检查装置

    公开(公告)号：US07586594B2

    公开(公告)日：2009-09-08

    申请号：US11770217

    申请日：2007-06-28

    申请人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    发明人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    IPC分类号： G01N21/00

    CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

    摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

    摘要翻译： 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。