摘要:
To form sharp image free from flow of image or fog with an electrophotographic apparatus, which uses an a-Si photo-sensitive drum charged uniformly by having resort to the discharge phenomenon, the electrophotographic apparatus comprises an electrophotographic photo-sensitive drum having a surface layer being represented by an elementary ratio composition formula ( a-Si.sub.1-x C.sub.x :H ), x being 0.95.ltoreq..times.
摘要:
An electroconductive magnetic carrier which is composed of carrier particles, each of the carrier particles comprising a basic particle in which magnetic particles with an average particle diameter of 0.05 to 1.0 .mu.m are dispersed in a binder resin, and electroconductive finely-divided particles with an average particle diameter of 0.5 .mu.m or less which are fixed on the surface of said basic particle to form a carrier particle with an average particle diameter of 5 to 100 .mu.m; a developer which is composed of the above electroconductive magnetic carrier and an electrically insulating toner; and an image formation method of forming toner images on a photoconductor by using this developer are described.
摘要:
An electroconductive magnetic carrier which is composed of basic particles, each of the basic particles comprising a binder resin and a magnetic material dispersed in the binder resin, and an electroconductive layer formed on the surface of the basic particle, a developer which is composed of the above electroconductive magnetic carrier and (b) an electrically insulating toner, and an image formation method of forming toner images on a photoconductor by using this developer are described.
摘要:
An electroconductive magnetic carrier which is composed of basic particles, each of the basic particles comprising a binder resin and a magnetic material dispersed in the binder resin, and an electroconductive layer formed on the surface of the basic particle, a developer which is composed of the above electroconductive magnetic carrier and (b) an electrically insulating toner, and an image formation method of forming toner images on a photoconductor by using this developer are described.
摘要:
A nonvolatile semiconductor memory includes first and second memory cells having a floating gate and a control gate. The floating gate of the first and second memory cells is comprised a first part, and a second part arranged on the first part, and a width of the second part in an extending direction of the control gate is narrower than that of the first part. A first space between the first parts of the first and second memory cells is filled with one kind of an insulator. The control gate is arranged at a second space between the second parts of the first and second memory cells.
摘要:
A semiconductor device includes a semiconductor substrate, and a nonvolatile memory cell provided on the semiconductor substrate, the nonvolatile memory cell including a tunnel insulating film provided on a surface of the semiconductor substrate, the tunnel insulating film including semiconductor grains, the semiconductor grains included in both end portions of the tunnel insulating film having smaller grain size than the semiconductor grains included in other portions of the tunnel insulating film, a charge storage layer provided on the tunnel insulating film, an insulating film provided on the charge storage layer, and a control gate electrode provided on the insulating film.
摘要:
A semiconductor device includes a memory cell transistor including a first lower insulating film provided on a semiconductor substrate, a first intermediate insulating film provided on the first lower insulating film, a first upper insulating film provided on the first intermediate insulating film, and a first gate electrode provided on the first upper insulating film, and a select transistor including a second lower insulating film provided on the semiconductor substrate, a second intermediate insulating film provided on the second lower insulating film, a second upper insulating film provided on the second intermediate insulating film, and a second gate electrode provided on the second upper insulating film, wherein trap density of the second intermediate insulating film is lower than that of the first intermediate insulating film.
摘要:
A nonvolatile semiconductor memory includes first and second memory cells having a floating gate and a control gate. The floating gate of the first and second memory cells is comprised a first part, and a second part arranged on the first part, and a width of the second part in an extending direction of the control gate is narrower than that of the first part. A first space between the first parts of the first and second memory cells is filled with one kind of an insulator. The control gate is arranged at a second space between the second parts of the first and second memory cells.
摘要:
In one embodiment, a method of manufacturing a semiconductor device includes forming a conductive film whose upper surface and side surface are exposed and an insulation film whose upper surface is exposed, on a semiconductor substrate. The method further includes supplying oxidizing ions or nitriding ions contained in plasma generated by a microwave, a radio-frequency wave, or electron cyclotron resonance to the exposed side surface of the conductive film and the exposed upper surface of the insulation film, by applying a predetermined voltage to the semiconductor substrate, thereby performing anisotropic oxidation or anisotropic nitridation of the exposed side surface of the conductive film and the exposed upper surface of the insulation film.
摘要:
According to an embodiment, there is provided a method of manufacturing a semiconductor device, including forming a nitride film by nitriding a surface of an underlying region having a semiconductor region containing silicon as a main component and an insulating region containing silicon and oxygen as a main component and adjacent to the semiconductor region, carrying out oxidation with respect to the nitride film to convert a portion of the nitride film which is formed on the insulating region into an oxide film and to leave a portion of the nitride film which is formed on the semiconductor region as at least part of a charge storage insulating film, forming a block insulating film on the charge storage insulating film, and forming a gate electrode film on the block insulating film.