Electrophotographic apparatus
    1.
    发明授权
    Electrophotographic apparatus 失效
    电子照相设备

    公开(公告)号:US5797071A

    公开(公告)日:1998-08-18

    申请号:US757737

    申请日:1996-11-26

    IPC分类号: G03G5/082 G03G15/00 G03G21/20

    摘要: To form sharp image free from flow of image or fog with an electrophotographic apparatus, which uses an a-Si photo-sensitive drum charged uniformly by having resort to the discharge phenomenon, the electrophotographic apparatus comprises an electrophotographic photo-sensitive drum having a surface layer being represented by an elementary ratio composition formula ( a-Si.sub.1-x C.sub.x :H ), x being 0.95.ltoreq..times.

    摘要翻译: 为了通过使用通过借助于放电现象均匀地带电的a-Si感光鼓的电子照相设备形成没有图像或雾的清晰图像,电子照相设备包括具有表面层的电子照相感光鼓 由基本比例组成式(a-Si1-xCx:H)表示,x为0.95

    Electroconductive magnetic carrier, developer using the same and image
formation method
    2.
    发明授权
    Electroconductive magnetic carrier, developer using the same and image formation method 失效
    导电磁性载体,使用相同的显影剂和成像方法

    公开(公告)号:US5346791A

    公开(公告)日:1994-09-13

    申请号:US982841

    申请日:1992-11-30

    摘要: An electroconductive magnetic carrier which is composed of carrier particles, each of the carrier particles comprising a basic particle in which magnetic particles with an average particle diameter of 0.05 to 1.0 .mu.m are dispersed in a binder resin, and electroconductive finely-divided particles with an average particle diameter of 0.5 .mu.m or less which are fixed on the surface of said basic particle to form a carrier particle with an average particle diameter of 5 to 100 .mu.m; a developer which is composed of the above electroconductive magnetic carrier and an electrically insulating toner; and an image formation method of forming toner images on a photoconductor by using this developer are described.

    摘要翻译: 一种由载体颗粒构成的导电磁性载体,每个载体颗粒包含平均粒径为0.05-1.0μm的磁性颗粒分散在粘合剂树脂中的碱性颗粒,以及导电细碎颗粒与 平均粒径为0.5μm以下,固定在所述碱性粒子的表面,形成平均粒径为5〜100μm的载体颗粒; 由上述导电磁性载体和电绝缘调色剂组成的显影剂; 并描述了通过使用该显影剂在感光体上形成调色剂图像的图像形成方法。

    Semiconductor device and method for manufacturing the same
    6.
    再颁专利
    Semiconductor device and method for manufacturing the same 失效
    半导体装置及其制造方法

    公开(公告)号:USRE44630E1

    公开(公告)日:2013-12-10

    申请号:US13616208

    申请日:2012-09-14

    IPC分类号: H01L21/331

    摘要: A semiconductor device includes a semiconductor substrate, and a nonvolatile memory cell provided on the semiconductor substrate, the nonvolatile memory cell including a tunnel insulating film provided on a surface of the semiconductor substrate, the tunnel insulating film including semiconductor grains, the semiconductor grains included in both end portions of the tunnel insulating film having smaller grain size than the semiconductor grains included in other portions of the tunnel insulating film, a charge storage layer provided on the tunnel insulating film, an insulating film provided on the charge storage layer, and a control gate electrode provided on the insulating film.

    摘要翻译: 半导体器件包括半导体衬底和设置在半导体衬底上的非易失性存储单元,所述非易失性存储单元包括设置在所述半导体衬底的表面上的隧道绝缘膜,所述隧道绝缘膜包括半导体晶粒,所述半导体晶粒包括在 隧道绝缘膜的两端部比隧道绝缘膜的其他部分所包含的半导体晶粒小的晶粒尺寸,隧道绝缘膜上设置的电荷存储层,设置在电荷存储层上的绝缘膜,以及控制 栅电极设置在绝缘膜上。

    Semiconductor device and method of manufacturing the same
    7.
    发明授权
    Semiconductor device and method of manufacturing the same 有权
    半导体装置及其制造方法

    公开(公告)号:US08604536B2

    公开(公告)日:2013-12-10

    申请号:US12406841

    申请日:2009-03-18

    IPC分类号: H01L29/792

    摘要: A semiconductor device includes a memory cell transistor including a first lower insulating film provided on a semiconductor substrate, a first intermediate insulating film provided on the first lower insulating film, a first upper insulating film provided on the first intermediate insulating film, and a first gate electrode provided on the first upper insulating film, and a select transistor including a second lower insulating film provided on the semiconductor substrate, a second intermediate insulating film provided on the second lower insulating film, a second upper insulating film provided on the second intermediate insulating film, and a second gate electrode provided on the second upper insulating film, wherein trap density of the second intermediate insulating film is lower than that of the first intermediate insulating film.

    摘要翻译: 半导体器件包括存储单元晶体管,其包括设置在半导体衬底上的第一下绝缘膜,设置在第一下绝缘膜上的第一中间绝缘膜,设置在第一中间绝缘膜上的第一上绝缘膜和第一栅极 设置在第一上绝缘膜上的电极和设置在半导体衬底上的第二下绝缘膜的选择晶体管,设置在第二下绝缘膜上的第二中间绝缘膜,设置在第二中间绝缘膜上的第二上绝缘膜 以及设置在第二上绝缘膜上的第二栅电极,其中第二中间绝缘膜的阱密度低于第一中间绝缘膜的陷阱密度。

    METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    9.
    发明申请
    METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
    制造半导体器件的方法

    公开(公告)号:US20120282773A1

    公开(公告)日:2012-11-08

    申请号:US13487280

    申请日:2012-06-04

    IPC分类号: H01L21/302

    摘要: In one embodiment, a method of manufacturing a semiconductor device includes forming a conductive film whose upper surface and side surface are exposed and an insulation film whose upper surface is exposed, on a semiconductor substrate. The method further includes supplying oxidizing ions or nitriding ions contained in plasma generated by a microwave, a radio-frequency wave, or electron cyclotron resonance to the exposed side surface of the conductive film and the exposed upper surface of the insulation film, by applying a predetermined voltage to the semiconductor substrate, thereby performing anisotropic oxidation or anisotropic nitridation of the exposed side surface of the conductive film and the exposed upper surface of the insulation film.

    摘要翻译: 在一个实施例中,制造半导体器件的方法包括在半导体衬底上形成其上表面和侧表面被暴露的导电膜和上表面暴露的绝缘膜。 该方法还包括通过施加微波,射频波或电子回旋共振等将由等离子体产生的等离子体中包含的氧化离子或氮化离子供应到导电膜的暴露侧表面和绝缘膜的暴露的上表面 对半导体衬底施加预定的电压,从而进行导电膜的暴露的侧表面和绝缘膜的暴露的上表面的各向异性氧化或各向异性氮化。

    Method of manufacturing a semiconductor device
    10.
    发明授权
    Method of manufacturing a semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US08304352B2

    公开(公告)日:2012-11-06

    申请号:US13051031

    申请日:2011-03-18

    IPC分类号: H01L21/31 H01L21/469

    摘要: According to an embodiment, there is provided a method of manufacturing a semiconductor device, including forming a nitride film by nitriding a surface of an underlying region having a semiconductor region containing silicon as a main component and an insulating region containing silicon and oxygen as a main component and adjacent to the semiconductor region, carrying out oxidation with respect to the nitride film to convert a portion of the nitride film which is formed on the insulating region into an oxide film and to leave a portion of the nitride film which is formed on the semiconductor region as at least part of a charge storage insulating film, forming a block insulating film on the charge storage insulating film, and forming a gate electrode film on the block insulating film.

    摘要翻译: 根据一个实施例,提供一种制造半导体器件的方法,包括通过氮化作为主要成分的含有硅的半导体区域的下面的区域的表面和以硅和氧为主要的绝缘区域来形成氮化物膜 并且与半导体区域相邻,相对于氮化物膜进行氧化,将形成在绝缘区域上的氮化物膜的一部分转换为氧化膜,并且使形成在该半导体层上的氮化膜的一部分 半导体区域作为电荷存储绝缘膜的至少一部分,在电荷存储绝缘膜上形成块绝缘膜,并在块绝缘膜上形成栅极电极膜。