公开(公告)号：US09812156B2

公开(公告)日：2017-11-07

申请号：US14600460

申请日：2015-01-20

申请人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Hideo Mamiya ,  Hironori Araki ,  Seiichiro Tomita

发明人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Hideo Mamiya ,  Hironori Araki ,  Seiichiro Tomita

IPC分类号： G11B5/127 ,  G11B5/31 ,  G11B5/60 ,  G11B5/00 ,  G11B5/012

CPC分类号： G11B5/314 ,  G11B5/012 ,  G11B5/127 ,  G11B5/1272 ,  G11B5/6088 ,  G11B2005/0021

摘要： A thermally-assisted magnetic recording head includes a main pole and a plasmon generator. The main pole has a front end face located in the medium facing surface. The plasmon generator has a near-field light generating surface located in the medium facing surface. The front end face of the main pole includes a first end face portion and a second end face portion. The second end face portion is located farther from the near-field light generating surface than is the first end face portion, and is greater than the first end face portion in width in the track width direction. The first end face portion and the near-field light generating surface are equal in width.

公开(公告)号：US09659588B2

公开(公告)日：2017-05-23

申请号：US14825020

申请日：2015-08-12

申请人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Hironori Araki ,  Seiichiro Tomita ,  Hideo Mamiya

发明人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Hironori Araki ,  Seiichiro Tomita ,  Hideo Mamiya

IPC分类号： G11B5/127 ,  G11B5/48 ,  G11B5/31 ,  G11B5/187 ,  G11B5/11 ,  G11B5/00 ,  G11B5/60 ,  G11B5/012

CPC分类号： G11B5/4866 ,  G11B5/012 ,  G11B5/11 ,  G11B5/127 ,  G11B5/1278 ,  G11B5/187 ,  G11B5/313 ,  G11B5/3133 ,  G11B5/314 ,  G11B5/3163 ,  G11B5/60 ,  G11B5/6088 ,  G11B2005/0021

摘要： A main pole has a front end face including a first end face portion and a second end face portion. A plasmon generator has a near-field light generating surface. A surrounding layer has a first surrounding layer end face and a second surrounding layer end face located on opposite sides of the first end face portion in the track width direction. A gap film has a first gap film end face and a second gap film end face located on opposite sides of the near-field light generating surface in the track width direction. Each of the first and second gap film end faces includes a portion located between the first and second surrounding layer end faces, but does not include any portion interposed between the first surrounding layer end face and the first end face portion or between the second surrounding layer end face and the first end face portion.

公开(公告)号：US09472230B1

公开(公告)日：2016-10-18

申请号：US14691127

申请日：2015-04-20

申请人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Hideo Mamiya ,  Hironori Araki ,  Seiichiro Tomita

发明人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Hideo Mamiya ,  Hironori Araki ,  Seiichiro Tomita

IPC分类号： G11B11/00 ,  G11B7/1387 ,  G11B7/22 ,  G11B5/012 ,  G11B5/00 ,  G11B5/60 ,  G11B5/31 ,  G11B11/105

CPC分类号： G11B5/012 ,  G11B5/187 ,  G11B5/3116 ,  G11B5/314 ,  G11B5/6088 ,  G11B11/10532 ,  G11B11/10543 ,  G11B2005/0021

摘要： A plasmon generator includes a main body, and a front protrusion protruding from the main body. The front protrusion has a proximal portion which is a boundary with the main body, and a near-field light generating surface located in the medium facing surface of a magnetic head. The main body has a first inclined surface and a second inclined surface each facing toward the medium facing surface. The first inclined surface and the second inclined surface are at a distance from each other and aligned in the track width direction. The proximal portion of the front protrusion is located between the first inclined surface and the second inclined surface.

摘要翻译： 等离子体发生器包括主体和从主体突出的前突起。 前突起具有与主体边界的近侧部分和位于磁头的介质面向表面中的近场光产生表面。 主体具有第一倾斜表面和第二倾斜表面，每个倾斜表面面向介质相对表面。 第一倾斜面和第二倾斜面彼此间隔一定距离并且在轨道宽度方向上对齐。 前突起的近端部分位于第一倾斜表面和第二倾斜表面之间。

公开(公告)号：US09761253B1

公开(公告)日：2017-09-12

申请号：US15282503

申请日：2016-09-30

申请人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Hideo Mamiya ,  Shigeki Tanemura ,  Seiichiro Tomita ,  Hironori Araki

发明人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Hideo Mamiya ,  Shigeki Tanemura ,  Seiichiro Tomita ,  Hironori Araki

IPC分类号： G11B5/31 ,  G11B5/48 ,  G11B5/00

CPC分类号： G11B5/314 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/4866 ,  G11B5/6088 ,  G11B2005/0021

摘要： A main pole has a front end face including a first to a third end face portion. A plasmon generator has a near-field-light-generating surface. A surrounding layer has a first surrounding layer end face and a second surrounding layer end face. A gap film has a first gap film end face and a second gap film end face located on opposite sides of the near-field-light-generating surface in the track width direction. The first and second end face portions are interposed between the first and second surrounding layer end faces. The second end face portion is greater in width than the first end face portion. The third end face portion is greater in width than the second end face portion.

公开(公告)号：US09754614B1

公开(公告)日：2017-09-05

申请号：US15244556

申请日：2016-08-23

申请人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Yukinori Ikegawa ,  Shigeki Tanemura ,  Hideo Mamiya ,  Seiichiro Tomita

发明人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Yukinori Ikegawa ,  Shigeki Tanemura ,  Hideo Mamiya ,  Seiichiro Tomita

IPC分类号： G11B5/02 ,  G11B11/00 ,  G11B5/39 ,  G02B5/00 ,  G02B6/122 ,  G11B5/48 ,  G11B5/00

CPC分类号： G02B6/1226 ,  G11B5/3133 ,  G11B5/314 ,  G11B5/6088 ,  G11B2005/0021

摘要： A plasmon generator includes: a first portion formed of a first metal material and including a front end face configured to generate near-field light; a second portion formed of a second metal material and located at a distance from the front end face; and a heat sink layer formed of a third metal material, located at a distance from the front end face and interposed between the first portion and the second portion. The second metal material is lower in Vickers hardness and higher in thermal conductivity than the first metal material. The third metal material has a thermal conductivity higher than that of each of the first and second metal materials, and has a Vickers hardness lower than that of the first metal material and higher than that of the second metal material.

公开(公告)号：US09640202B2

公开(公告)日：2017-05-02

申请号：US13856109

申请日：2013-04-03

申请人： Shigeki Tanemura ,  Yoshitaka Sasaki ,  Hiroyuki Ito ,  Yukinori Ikegawa ,  Hironori Araki ,  Seiichiro Tomita

发明人： Shigeki Tanemura ,  Yoshitaka Sasaki ,  Hiroyuki Ito ,  Yukinori Ikegawa ,  Hironori Araki ,  Seiichiro Tomita

IPC分类号： G11B5/00 ,  G11B5/31 ,  G11B5/60 ,  G11B5/84

CPC分类号： G11B5/3163 ,  G11B5/314 ,  G11B5/6088 ,  G11B5/84 ,  G11B2005/0021 ,  Y10T29/49032

摘要： A method of manufacturing a plasmon generator includes the steps of: forming an initial film made of a metal polycrystal and including a pre-plasmon-generator portion that later becomes the plasmon generator; heating the initial film with heating light so that a plurality of crystal grains constituting the metal polycrystal grow at least in the pre-plasmon-generator portion; stopping the heating of the initial film; and forming the plasmon generator by processing the initial film after the step of stopping the heating. The step of forming the plasmon generator includes the step of providing the pre-plasmon-generator portion with a front end face that generates near-field light.

公开(公告)号：US08711663B1

公开(公告)日：2014-04-29

申请号：US13777488

申请日：2013-02-26

申请人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Hironori Araki ,  Seiichiro Tomita ,  Ryuji Fujii

发明人： Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Hironori Araki ,  Seiichiro Tomita ,  Ryuji Fujii

IPC分类号： G11B11/00

CPC分类号： G11B5/314 ,  G11B5/6088 ,  G11B2005/0021

摘要： A plasmon generator has a front end face located in a medium facing surface of a magnetic head. The plasmon generator includes a first layer formed of a first metal material, a second layer formed of a second metal material, and a third layer formed of a third metal material. Each of the second and third layers has an end portion constituting part of the front end face. The first layer does not have any portion constituting part of the front end face. The first and second metal materials are higher in electrical conductivity than the third metal material. The third metal material is higher in Vickers hardness than the first and second metal materials. The first layer has a plasmon exciting part.

摘要翻译： 等离子体发生器具有位于磁头的介质面向表面中的前端面。 等离子体发生器包括由第一金属材料形成的第一层，由第二金属材料形成的第二层和由第三金属材料形成的第三层。 第二层和第三层中的每一层具有构成前端面的一部分的端部。 第一层没有构成前端面的一部分的任何部分。 第一和第二金属材料的电导率高于第三金属材料。 第三种金属材料的维氏硬度高于第一和第二种金属材料。 第一层具有等离子体激元部分。

公开(公告)号：US10062402B1

公开(公告)日：2018-08-28

申请号：US15830818

申请日：2017-12-04

申请人： Hironori Araki ,  Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Seiichiro Tomita ,  Masakazu Okada

发明人： Hironori Araki ,  Yoshitaka Sasaki ,  Hiroyuki Ito ,  Shigeki Tanemura ,  Seiichiro Tomita ,  Masakazu Okada

IPC分类号： G11B7/135 ,  G11B5/60 ,  G11B5/31 ,  H01P3/16 ,  G11B5/127 ,  H01P1/17 ,  G11B5/00

CPC分类号： G11B5/6088 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/314 ,  G11B2005/0021 ,  H01P1/174 ,  H01P3/16

摘要： A manufacturing method for a waveguide includes forming a core including a first layer and a second layer. The first layer has a top surface including a first region with which a bottom surface of the second layer is in contact, and a second region with which the bottom surface of the second layer is not in contact. Forming the core includes the steps of: forming an initial first layer; forming an etching stopper layer on the second region of the initial first layer; forming an initial second layer on the initial first layer and the etching stopper layer; etching the initial second layer and the initial first layer so as to make the initial first layer into the first layer; and etching the initial second layer until the etching stopper layer is exposed, so as to make the initial second layer into the second layer.

公开(公告)号：US08691102B1

公开(公告)日：2014-04-08

申请号：US13731754

申请日：2012-12-31

申请人： Hironori Araki ,  Yoshitaka Sasaki ,  Hiroyuki Ito ,  Yukinori Ikegawa ,  Seiichiro Tomita ,  Shigeki Tanemura

发明人： Hironori Araki ,  Yoshitaka Sasaki ,  Hiroyuki Ito ,  Yukinori Ikegawa ,  Seiichiro Tomita ,  Shigeki Tanemura

IPC分类号： C03C15/00

CPC分类号： G11B5/314 ,  G11B5/3163 ,  G11B5/6088 ,  G11B2005/0021

摘要： A method of manufacturing a plasmon generator includes the steps of: forming an etching mask on a dielectric layer; forming an accommodation part by etching the dielectric layer using the etching mask; and forming the plasmon generator to be accommodated in the accommodation part. The step of forming the etching mask includes the steps of: forming a patterned layer on an etching mask material layer, the patterned layer having a first opening that has a sidewall; forming a structure by forming an adhesion film on the sidewall, the structure having a second opening smaller than the first opening; and etching a portion of the etching mask material layer exposed from the second opening.

摘要翻译： 一种制造等离子体发生器的方法包括以下步骤：在电介质层上形成蚀刻掩模; 通过使用蚀刻掩模蚀刻电介质层来形成容纳部分; 以及形成要容纳在容纳部分中的等离子体发生器。 形成蚀刻掩模的步骤包括以下步骤：在蚀刻掩模材料层上形成图案化层，所述图案化层具有具有侧壁的第一开口; 通过在侧壁上形成粘合膜来形成结构，该结构具有比第一开口小的第二开口; 并蚀刻从第二开口露出的蚀刻掩模材料层的一部分。

公开(公告)号：US09958769B1

公开(公告)日：2018-05-01

申请号：US15387066

申请日：2016-12-21

申请人： Hironori Araki ,  Yoshitaka Sasaki ,  Hiroyuki Ito ,  Seiichiro Tomita ,  Shigeki Tanemura ,  Yukinori Ikegawa

发明人： Hironori Araki ,  Yoshitaka Sasaki ,  Hiroyuki Ito ,  Seiichiro Tomita ,  Shigeki Tanemura ,  Yukinori Ikegawa

IPC分类号： G03F1/38 ,  G03F7/09 ,  G11B5/31 ,  G11B5/00

CPC分类号： G03F1/38 ,  G03F7/094 ,  G11B5/3169 ,  G11B2005/0021

摘要： A plasmon generator including a wide portion and a narrow portion is manufactured by etching an initial plasmon generator using an etching mask. The etching mask includes a first mask layer for defining the shape of one of the narrow portion and the wide portion, and a second mask layer for defining the shape of the other of the narrow portion and the wide portion. The etching mask is formed by forming a first hard mask, a second initial mask layer and a second hard mask in this order on a first initial mask layer, and etching the first and second initial mask layers by using the first and second hard masks.