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    Polymerizable ester compounds
    2.
    发明授权
    Polymerizable ester compounds 有权
    可聚合的酯化合物

    公开(公告)号：US07276623B2

    公开(公告)日：2007-10-02

    申请号：US11440107

    申请日：2006-05-25

    申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

    发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

    IPC分类号： C07C69/00 ,  G03C1/00

    CPC分类号： G03F7/0397 ,  G03F7/0046

    摘要： Ester compounds having formula (1) wherein R1 is fluorine or C1-C10 fluoroalkyl, R2 is C1-C10 alkylene or fluoroalkylene, and R3 is an acid labile group are novel. They can be polymerized into polymers which are used to formulate resist compositions, which are processed by the lithography involving ArF exposure, offering many advantages including improved resolution and transparency, minimal line edge roughness, improved etch resistance, and especially minimal surface roughness after etching.

    摘要翻译： 式（1）其中R 1是氟或C 1 -C 10氟烷基的酯化合物，其中R 1是氢或C 1 -C 10 - 是C 1 -C 10亚烷基或氟代亚烷基，R 3是酸不稳定基团是新的。 它们可以聚合成用于配制抗蚀剂组合物的聚合物，其通过涉及ArF曝光的光刻加工，提供许多优点，包括改进的分辨率和透明度，最小的线边缘粗糙度，改善的耐蚀刻性，以及蚀刻后特别是最小的表面粗糙度。

    Novel polymerizable ester compounds
    4.
    发明申请
    Novel polymerizable ester compounds 有权
    新型可聚合酯化合物

    公开(公告)号：US20060269870A1

    公开(公告)日：2006-11-30

    申请号：US11440107

    申请日：2006-05-25

    申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

    发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0397 ,  G03F7/0046

    摘要： Ester compounds having formula (1) wherein R1 is fluorine or C1-C10 fluoroalkyl, R2 is C1-C10 alkylene or fluoroalkylene, and R3 is an acid labile group are novel. They can be polymerized into polymers which are used to formulate resist compositions, which are processed by the lithography involving ArF exposure, offering many advantages including improved resolution and transparency, minimal line edge roughness, improved etch resistance, and especially minimal surface roughness after etching.

    摘要翻译： 式（1）其中R 1是氟或C 1 -C 10氟烷基的酯化合物，其中R 1是氢或C 1 -C 10 - 是C 1 -C 10亚烷基或氟代亚烷基，R 3是酸不稳定基团是新的。 它们可以聚合成用于配制抗蚀剂组合物的聚合物，其通过涉及ArF曝光的光刻加工，提供许多优点，包括改进的分辨率和透明度，最小的线边缘粗糙度，改善的耐蚀刻性，以及蚀刻后特别是最小的表面粗糙度。

    Ester compound, polymer, resist composition, and patterning process
    7.
    发明授权
    Ester compound, polymer, resist composition, and patterning process 有权
    酯化合物，聚合物，抗蚀剂组合物和图案化工艺

    公开(公告)号：US07666967B2

    公开(公告)日：2010-02-23

    申请号：US11606069

    申请日：2006-11-30

    申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

    发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

    IPC分类号： C08F214/18

    CPC分类号： C07D307/93 ,  C07D409/12 ,  G03F7/0046 ,  G03F7/0397

    摘要： A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1 is F or C1-C6 fluoroalkyl, R2 is H or C1-C8 alkyl, R3 is O or C1-C6 alkylene, R4 and R5 each are H or C1-C10 alkyl or fluoroalkyl, and R6 is H or an acid labile group. The resist composition, when processed by ArF lithography, has advantages including improved resolution, transparency, minimal line edge roughness, and etch resistance. The resist composition exhibits better performance when processed by ArF immersion lithography with liquid interposed between a projection lens and a wafer.

    摘要翻译： 使用包含通过聚合式（1）的酯化合物获得的重复单元（2）的聚合物来形成抗蚀剂组合物。 R 1是F或C 1 -C 6氟代烷基，R 2是H或C 1 -C 8烷基，R 3是O或C 1 -C 6亚烷基，R 4和R 5各自是H或C 1 -C 10烷基或氟代烷基，R 6是H或酸不稳定基团 。 当通过ArF光刻处理时，抗蚀剂组合物具有改进的分辨率，透明度，最小的线边缘粗糙度和耐蚀刻性的优点。 当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时，抗蚀剂组合物表现出更好的性能。