公开(公告)号：US07173693B2

公开(公告)日：2007-02-06

申请号：US11042173

申请日：2005-01-26

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Yukio Kembo

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Yukio Kembo

IPC分类号： G01N21/00 ,  G06K9/00

CPC分类号： G01N21/956 ,  G01N21/9501

摘要： A method for inspecting a specimen includes obtaining an image of a specimen through a first optical system, displaying the obtained image of the specimen on a display screen; dividing the displayed image of the specimen into plural regions and setting defect detection sensitivity for each of the plural divided regions, transferring the specimen from the first optical system to a second optical system, obtaining an image of the specimen through the second optical system, detecting defects on the specimen by processing the image obtained through the second optical system using the defect detection sensitivity set for a respective region, and displaying information of the detected defects on the display screen.

摘要翻译： 用于检查样本的方法包括通过第一光学系统获得样本的图像，将获得的样本图像显示在显示屏上; 将样本的显示图像分割成多个区域，并且对多个分割区域中的每一个分割区域设置缺陷检测灵敏度，将样本从第一光学系统传送到第二光学系统，通过第二光学系统获得样本的图像，检测 通过使用针对各个区域设置的缺陷检测灵敏度处理通过第二光学系统获得的图像，并在显示屏幕上显示检测到的缺陷的信息，来检查样本上的缺陷。

公开(公告)号：US20050128472A1

公开(公告)日：2005-06-16

申请号：US11042173

申请日：2005-01-26

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Yukio Kembo

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Yukio Kembo

IPC分类号： G01B11/30 ,  G01N21/95 ,  G01N21/956 ,  G01N23/205 ,  H01L21/66 ,  G01N21/88

CPC分类号： G01N21/956 ,  G01N21/9501

摘要： A method for inspecting a specimen includes obtaining an image of a specimen through a first optical system, displaying the obtained image of the specimen on a display screen; dividing the displayed image of the specimen into plural regions and setting defect detection sensitivity for each of the plural divided regions, transferring the specimen from the first optical system to a second optical system, obtaining an image of the specimen through the second optical system, detecting defects on the specimen by processing the image obtained through the second optical system using the defect detection sensitivity set for a respective region, and displaying information of the detected defects on the display screen.

摘要翻译： 用于检查样本的方法包括通过第一光学系统获得样本的图像，将获得的样本图像显示在显示屏上; 将样本的显示图像分割成多个区域，并且对多个分割区域中的每一个分割区域设置缺陷检测灵敏度，将样本从第一光学系统传送到第二光学系统，通过第二光学系统获得样本的图像，检测 通过使用针对各个区域设置的缺陷检测灵敏度处理通过第二光学系统获得的图像，以及在显示屏幕上显示检测到的缺陷的信息，来检查样本上的缺陷。

公开(公告)号：US06850320B2

公开(公告)日：2005-02-01

申请号：US09906678

申请日：2001-07-18

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Yukio Kembo

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Yukio Kembo

IPC分类号： G01B11/30 ,  G01N21/95 ,  G01N21/956 ,  G01N23/205 ,  H01L21/66 ,  G01N21/00 ,  G06K9/00

CPC分类号： G01N21/956 ,  G01N21/9501

摘要： The present invention provides a highly sensitive inspection technology that prevents false detections. The present invention includes means for detecting an image of an entire chip. Using this image, inspection regions are defined based on criticality. Detection sensitivities can be set for each of these inspection sensitivities. Alternatively, false detections can be eliminated in post-inspection processing by recording characteristic values used to evaluate defects, e.g., concentration differences, in the inspection results. Furthermore, by providing a system that allows sharing of inspection conditions and the like needed by multiple inspection devices, the time required for determining inspection conditions can be shortened and stability and reliability can be monitored.

摘要翻译： 本发明提供了一种防止错误检测的高灵敏度检测技术。 本发明包括用于检测整个芯片的图像的装置。 使用该图像，基于关键性定义检查区域。 可以对这些检测灵敏度设置检测灵敏度。 或者，通过在检查结果中记录用于评估缺陷的特征值，例如浓度差异，可以在检查后处理中消除错误检测。 此外，通过提供允许多个检查装置所需的检查条件等的共享的系统，可以缩短确定检查条件所需的时间，并且可以监视稳定性和可靠性。

公开(公告)号：US08228494B2

公开(公告)日：2012-07-24

申请号：US13198170

申请日：2011-08-04

申请人： Yukihiro Shibata ,  Shunji Maeda

发明人： Yukihiro Shibata ,  Shunji Maeda

IPC分类号： G01N21/00

CPC分类号： G01N21/94 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/9513

摘要： A defect inspection apparatus includes an illumination optical system, a detection optical system which includes a reflecting objective lens, and wavelength separation optics for conducting wavelength separation, and after the wavelength separation, branching the scattered light into at least a first detection optical path and a second detection optical path. The detection optical system further includes, on the first detection optical path, a first sensor, and on the second detection optical path, a second sensor. A signal processor is provided which, in accordance with at least one of a first signal obtained from the first sensor and a second signal obtained from the second sensor, discriminates defects or defect candidates present on a surface of a sample.

摘要翻译： 缺陷检查装置包括照明光学系统，包括反射物镜的检测光学系统和用于进行波长分离的波长分离光学器件，并且在波长分离之后，将散射光分支成至少第一检测光路和 第二检测光路。 检测光学系统还在第一检测光路上包括第一传感器，并且在第二检测光路上还包括第二传感器。 提供了一种信号处理器，其根据从第一传感器获得的第一信号和从第二传感器获得的第二信号中的至少一个识别存在于样品表面上的缺陷或缺陷候选物。

公开(公告)号：US20080144023A1

公开(公告)日：2008-06-19

申请号：US11936115

申请日：2007-11-07

申请人： Yukihiro Shibata ,  Shunji Maeda

发明人： Yukihiro Shibata ,  Shunji Maeda

IPC分类号： G01N21/88

CPC分类号： G01N21/94 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/9513

摘要： This invention is a defect inspection apparatus having a reflecting objective lens free from chromatic aberration, or an achromatic catadioptric lens, and a dioptric objective lens, and thus constructed to suppress changes in brightness due to multi-wavelength illumination (i.e., illumination with the irradiation light having a plurality of wavelength bands), to provide a clearer view of defects present on a sample, by means of selective wavelength detection in order to improve sensitivity, and to allow one spatial image on the sample to be acquired as different kinds of optical images.

摘要翻译： 本发明是一种具有无色差的反射物镜或无色反射折射透镜和折射物镜的缺陷检查装置，因此能够抑制多波长照明引起的亮度变化（即照射照射 具有多个波长带的光），以通过选择性波长检测提供样品上存在的缺陷的清晰度，以便提高灵敏度，并且允许获取样品上的一个空间图像作为不同种类的光学 图片。

公开(公告)号：US07372561B2

公开(公告)日：2008-05-13

申请号：US11139594

申请日：2005-05-31

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Takafumi Okabe ,  Yoichi Takahara

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Takafumi Okabe ,  Yoichi Takahara

IPC分类号： G01N21/00

CPC分类号： H01L21/67253 ,  G01N21/95607 ,  G01N2021/4792 ,  H01L21/67028 ,  H01L21/67057

摘要： The present invention relates to a high-sensitivity defect inspection method, apparatus, and system adapted for the fine-structuring of patterns; wherein, in addition to a cleaning tank which chemically cleans a sample and rinses the sample, a defect inspection apparatus having a liquid-immersion element by which the interspace between the sample and the objective lens of an optical system is filled with a liquid, and a drying tank which dries the sample, the invention uses liquid-immersion transfer means from said cleaning tank through said liquid-immersion means of said defect inspection apparatus to said drying tank so that the sample is transferred in a liquid-immersed state from said cleaning tank to said liquid-immersion means.

摘要翻译： 本发明涉及一种适用于精细构图的高灵敏度缺陷检查方法，装置和系统， 其特征在于，除了对样品进行化学清洗并冲洗样品的清洗槽以外，还具有具有液体浸渍元件的缺陷检查装置，通过该液浸元件将样品与光学系统的物镜之间的间隙填充液体， 干燥箱，干燥箱，将所述清洗槽的浸液转移装置通过所述缺陷检查装置的浸液装置使用于所述干燥箱，使样品以浸液状态从所述清洗 罐到所说的液浸装置。

公开(公告)号：US20070121106A1

公开(公告)日：2007-05-31

申请号：US11583892

申请日：2006-10-20

申请人： Yukihiro Shibata ,  Shunji Maeda

发明人： Yukihiro Shibata ,  Shunji Maeda

IPC分类号： G01N21/88

CPC分类号： G01N21/8806 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/8825 ,  G01N2021/8887 ,  G06T7/001 ,  G06T2207/30148

摘要： The present invention provides a variety of optical functions so as to be applicable to various kinds of objects to be inspected. For each of the optical functions, the invention accumulates contrasts (brightness differences), etc. of defects to be detected (DOI) and false defects not to be detected (nuisance), and efficiently selects parameters advantageous for inspection with high sensitivity and low nuisance ratio. A wavelength band, an illumination scheme, and filtering parameters can be selected for an optical system.

摘要翻译： 本发明提供各种光学功能，以适用于各种被检查物体。 对于每个光学功能，本发明积累了要检测的缺陷（DOI）和不被检测的假缺陷（烦扰）的对比度（亮度差）等，并且有效地选择了具有高灵敏度和低噪声的检查有利的参数 比。 可以为光学系统选择波长带，照明方案和滤波参数。

公开(公告)号：US20060238760A1

公开(公告)日：2006-10-26

申请号：US11475667

申请日：2006-06-26

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

IPC分类号： G01J4/00

CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

摘要： A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

摘要翻译： 公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置，并且使得半导体器件的细线图案之间的对比度差异更大。 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

公开(公告)号：US20050264802A1

公开(公告)日：2005-12-01

申请号：US11139594

申请日：2005-05-31

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Takafumi Okabe ,  Yoichi Takahara

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Takafumi Okabe ,  Yoichi Takahara

IPC分类号： G01N21/88 ,  G01N21/956 ,  H01L21/00 ,  H01L21/66

CPC分类号： H01L21/67253 ,  G01N21/95607 ,  G01N2021/4792 ,  H01L21/67028 ,  H01L21/67057

摘要： The present invention relates to a high-sensitivity defect inspection method, apparatus, and system adapted for the fine-structuring of patterns; wherein, in addition to a cleaning tank which chemically cleans a sample and rinses the sample, a defect inspection apparatus having a liquid-immersion element by which the interspace between the sample and the objective lens of an optical system is filled with a liquid, and a drying tank which dries the sample, the invention uses liquid-immersion transfer means from said cleaning tank through said liquid-immersion means of said defect inspection apparatus to said drying tank so that the sample is transferred in a liquid-immersed state from said cleaning tank to said liquid-immersion means.

摘要翻译： 本发明涉及一种适用于精细构图的高灵敏度缺陷检查方法，装置和系统， 其特征在于，除了对样品进行化学清洗并冲洗样品的清洗槽以外，还具有具有液体浸渍元件的缺陷检查装置，通过该液浸元件将样品与光学系统的物镜之间的间隙填充液体， 干燥箱，干燥箱，将所述清洗槽的浸液转移装置通过所述缺陷检查装置的浸液装置使用于所述干燥箱，使样品以浸液状态从所述清洗 罐到所说的液浸装置。

公开(公告)号：US20050110988A1

公开(公告)日：2005-05-26

申请号：US10981721

申请日：2004-11-05

申请人： Hidetoshi Nishiyama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Shunji Maeda

发明人： Hidetoshi Nishiyama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Shunji Maeda

IPC分类号： G01N21/956 ,  G01N21/88

CPC分类号： G01N21/95684

摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.

摘要翻译： 公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。 从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和 相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。 该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及 那么由信号处理单元检测到缺陷。