摘要:
There are provided a novel curable polyester, a cured product thereof, and a process for preparing the same, as well as a resist composition and a jet Printing ink composition comprising the curable polyester, curing methods and uses thereof. The curable polyester of the present invention has a polyester skeleton as a main chain and also has an oxetanyl group at the molecular end. The curable polyester of the present invention is excellent in curability and has excellent flexibility, adhesion and mechanical strength, and also exhibits high safety to the human. The resist composition containing a novel curable polyester having an oxetanyl group at the molecular end of the present invention is suitable for a solder resist for forming a pattern with high accuracy or an interlayer insulation film because neither bleeding after screen printing nor sagging upon heat curing occurs, and the jet printing ink composition containing a novel curable polyester having an oxetanyl group at the molecular end of the present invention is suitable for a solder resist or an interlayer insulation film, which is excellent in line width retention of a thin line pattern because neither bleeding nor sagging upon heat curing occurs.
摘要:
The invention relates to a thermosetting composition comprising (A) a compound having at least one oxetanyl group in the molecule, (B) a compound having at least two carboxyl groups in the molecule, and (C) an imidazolium salt, curing method thereof and products cured thereby. Cured products prepared from the composition of the invention is excellent in electrical isolation, flexibility, adhesiveness and mechanical strength.
摘要:
The present invention relates to an oxetane compound containing a (meth)acryloyl group represented by formula (1) having a high copolymerizability with compounds containing a (meth)acryloyl group, and to a production method of an oxetane compound containing a (meth)acryloyl group which is characterized by reacting an isocyanate compound having a (meth)acryloyl group represented by formula (5) with an oxetane compound containing a hydroxyl group represented by formula (6). (In the formula, R1 represents a hydrogen atom or a methyl group, A represents —OR2— or a bond, R2 represents a divalent hydrocarbon group which may contain an oxygen atom in the main chain, R3 represents a linear or branched alkylene group having 1 to 6 carbon atoms, and R4 represents a linear or branched alkyl group having 1 to 6 carbon atoms.)
摘要:
The present invention relates to an oxetane compound containing a (meth)acryloyl group represented by formula (1) having a high copolymerizability with compounds containing a (meth)acryloyl group, and to a production method of an oxetane compound containing a (meth)acryloyl group which is characterized by reacting an isocyanate compound having a (meth)acryloyl group represented by formula (5) with an oxetane compound containing a hydroxyl group represented by formula (6). (In the formula, R1 represents a hydrogen atom or a methyl group, A represents —OR2— or a bond, R2 represents a divalent hydrocarbon group which may contain an oxygen atom in the main chain, R3 represents a linear or branched alkylene group having 1 to 6 carbon atoms, and R4 represents a linear or branched alkyl group having 1 to 6 carbon atoms.)
摘要:
The present invention is directed to a compound serving as both a flame retardant and a curing agent (a crosslinking agent) for curable resin, a method for producing the compound, a flame-retardant curable resin composition containing the compound, and a cured product and a laminate sheet having flame retardancy produced through curing the cured resin composition. The compound has a benzoxazine structure and a phosphine oxide structure in a molecule thereof.
摘要:
The present invention provides a novel hexaarylbiimidazole compound of the following formula (1): wherein each R1 represents a halogen, and each R2 represents an optionally substituted C1-4 alkyl group. The hexaarylbiimidazole compound of the present invention is useful as photoradical generators in photopolymerizable compositions used as resists and is characterized by low sublimating thermal decomposition products. The photopolymerizable compositions may be suitably used as resists or as color filters for color liquid crystal display elements, cameras and the like.
摘要:
A photocurable paint composition for road markings is disclosed, comprising (A) a compound having an ethylenically unsaturated group, (B) a filler, (C) a cationic dye represented by formula (1): D+&Circlesolid;A1− (1) (wherein D+ represents a cation having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm, and A1− represents an optional anion), (D) a quaternary organic borate-type sensitizer represented by formula (2): (wherein R1, R2, R3 and R4 each independently represents an alkyl group, an aryl group, an aralkyl group, an alkenyl group, an alkynyl group, a silyl group, a heterocyclic group or a halogen atom, and Z+ represents an optional cation) and (E) an ultraviolet radical polymerization initiator capable of generating a radical upon absorption of light at a wavelength of 400 nm or less, or additionally comprising (F) glass beads.
摘要:
The present invention relates to a method for producing an amino group-containing phosphate compound, by which the compound can be easily synthesized through a one-step reaction. The method for producing an amino group-containing phosphate compound comprises reacting an aminophenol compound represented by the general formula (1) with a dichlorophosphoric acid compound represented by the general formula (2): (where X1, X2, X3, X4 and X5 each represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms) in the presence of an inorganic basic compound in an aprotic organic solvent, to obtain a amino group-containing phosphate compound represented by the following general formula (3) where X1, X2, X3, X4 and X5 are defined in the same way as in the general formula (2).
摘要:
The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
摘要:
The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.