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1.发明申请ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME 审中-公开丙酰胺或辐射敏感性树脂组合物及其形成图案的方法公开(公告)号：US20130095429A1
公开(公告)日：2013-04-18
申请号：US13807508
申请日：2011-07-07
CPC分类号： G03F7/004 , C08F12/20 , C08F12/22 , C08F12/32 , C08F212/14 , C08F212/32 , G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/20 , G03F7/2041
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition that simultaneously achieves excellent developability and excellent immersion-liquid tracking properties, and a method of forming a pattern using the same. The composition contains a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formula (I) below.
摘要翻译： 本发明提供一种同时具有优异的显影性和优良的浸液追踪性的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。 该组合物含有至少含有氟原子或硅原子的树脂（B），该树脂（B）含有下述通式（I）的重复单元。
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2.发明申请公开(公告)号：US20110136062A1
公开(公告)日：2011-06-09
申请号：US13059441
申请日：2009-09-29
CPC分类号： C08F20/28 , C08F20/26 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： A positive photosensitive composition, includes: (A) a resin having a repeating unit represented by formula (1) as defined in the specification and a repeating unit represented by formula (2) as defined in the specification and being capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and a solvent, and a pattern forming method uses the positive photosensitive composition.
摘要翻译： 正型感光性组合物包括：（A）具有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且能够提高 通过酸的作用在碱性显影剂中的树脂（A）; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; 和溶剂，并且图案形成方法使用正性感光性组合物。
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3.发明授权公开(公告)号：US08932794B2
公开(公告)日：2015-01-13
申请号：US13059441
申请日：2009-09-29
CPC分类号： C08F20/28 , C08F20/26 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： A positive photosensitive composition, includes: (A) a resin having a repeating unit represented by formula (1) as defined in the specification and a repeating unit represented by formula (2) as defined in the specification and being capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and a solvent, and a pattern forming method uses the positive photosensitive composition.
摘要翻译： 正型感光性组合物包括：（A）具有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且能够提高 通过酸的作用在碱性显影剂中的树脂（A）; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; 和溶剂，并且图案形成方法使用正性感光性组合物。
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公开(公告)号：US08671750B2
公开(公告)日：2014-03-18
申请号：US12988166
申请日：2009-04-14
申请人： Toshiaki Fukuhara
发明人： Toshiaki Fukuhara
IPC分类号： G01F23/30
CPC分类号： G01F23/38
摘要： The present invention is to prevent a drop in the detection accuracy caused by wear of the central shaft of a frame where a magnet holder and the magnet are fitted to each other in the course of prolonged use. A contactless liquid level sensor includes: a magnet holder which includes a resin holder body having an inner circumferential surface for defining a fitting hole and a magnet accommodated inside the holder body along the inner circumferential surface; a resin frame including a frame body, a central shaft protruding from the frame body, and a magnetic-electric converter accommodated inside the central shaft; a float arm including one end fixed to the magnet holder and the other end attached to a float vertically moving in accordance with a liquid level; and a metallic rotary support including a hollow cylindrical part arranged between the inner circumferential surface of the holder body and an outer circumferential surface of the central shaft. When the magnet holder rotates about the central shaft in accordance with the liquid level, a magnetic flux density passing through the magnetic-electric converter is varied thereby detecting a variation in the liquid level.
摘要翻译： 本发明是为了防止在长时间使用中磁体保持架和磁体彼此嵌合的框架的中心轴的磨损引起的检测精度的下降。 非接触式液位传感器包括：磁体保持器，其包括具有用于限定嵌合孔的内周面的树脂保持体和沿着内周面容纳在保持体内的磁体; 树脂框架，包括框架体，从框架体突出的中心轴和容纳在中心轴内的磁电转换器; 浮子臂，其一端固定到磁体保持器，另一端连接到根据液面垂直移动的浮子; 以及金属旋转支撑体，其包括布置在保持器本体的内周表面和中心轴的外周表面之间的中空圆柱形部分。 当磁体保持器根据液面围绕中心轴旋转时，通过磁 - 电转换器的磁通密度变化，从而检测液位的变化。
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公开(公告)号：US08209905B2
公开(公告)日：2012-07-03
申请号：US11242725
申请日：2005-10-03
IPC分类号： A01G9/02
摘要： A greening system us disclosed for enabling plants/vegetation to grow only with natural rainfall, without any particular irrigation facilities, enabling a full-blown garden to be constructed on building rooftops, minimizing the applicable loads on the building, and free from the risk of leakage. Planting container 1 comprises box 2 with stickers 3 to carry perforated partition panel 4. The lower half of the container is constituted as water storage 5, and drain holes 6 are opened on sides of the container. Soil layer 7 placed on partition panel 4 is formed of light woody soil-based on charcoal 9 and humus timber chips for absorbing moisture transported from the water 8 stored in water storage 5 by evaporation or difference in humidity, to have a large water capacity letting less water evaporate into the air. Charcoal 9 absorbs water from the air inside the lower half of the container to water the plants. Water storage 5 assures an amount of water necessary for plants to grow.
摘要翻译： 我们公开的一个绿化系统，使得植物/植被仅在自然降雨的情况下才能生长，没有任何特定的灌溉设施，可以在建筑屋顶上建造一个完整的花园，最大限度地减少建筑物的适用负荷， 泄漏。 种植容器1包括具有贴纸3的盒子2，以携带穿孔隔板4.容器的下半部分构成储水器5，排出孔6在容器的侧面开口。 放置在分隔板4上的土壤层7由基于木炭9的轻木质土壤和腐殖质木材碎片形成，用于吸收通过蒸发或湿度差异从储存在储水器5中的水8输送的水分，以具有大的水容量 少量的水蒸发到空气中。 木炭9从容器下半部分的空气中吸收水分，以对植物进行浇水。 水储存5确保植物生长所需的水量。
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公开(公告)号：US07635554B2
公开(公告)日：2009-12-22
申请号：US12058222
申请日：2008-03-28
申请人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
发明人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/0757 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： A positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid: (B) a compound generating an acid upon irradiation with actinic light or radiation; (C) a hydrophobic resin insoluble in an alkali developer and having at least either one of a fluorine atom and a silicon atom; and (D) a solvent, wherein in the formula (I), Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two of Ry1 to Ry3 may be coupled to form a ring structure, and Z represents a divalent linking group.
摘要翻译： 正型光敏组合物包括：（A）具有由式（I）表示的可酸分解重复单元并通过酸作用增加其在碱显影剂中的溶解度的树脂：（B）在光化反应下产生酸的化合物 光或辐射; （C）不溶于碱性显影剂并且具有氟原子和硅原子中的至少一个的疏水性树脂; 和（D）溶剂，其中在式（I）中，Xa1表示氢原子，烷基，氰基或卤素原子，Ry1〜Ry3各自独立地表示烷基或环烷基，至少 Ry1〜Ry3中的两个可以被偶联以形成环结构，Z表示二价连接基团。
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公开(公告)号：US07166418B2
公开(公告)日：2007-01-23
申请号：US10932316
申请日：2004-09-02
申请人： Shinji Kishimura , Masayuki Endo , Masaru Sasago , Mitsuru Ueda , Hirokazu Imori , Toshiaki Fukuhara
发明人： Shinji Kishimura , Masayuki Endo , Masaru Sasago , Mitsuru Ueda , Hirokazu Imori , Toshiaki Fukuhara
IPC分类号： G03F7/30
CPC分类号： C08F220/18 , C08F212/02 , C08F228/02 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/111
摘要： A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; and R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group, a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid.
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公开(公告)号：US20050074693A1
公开(公告)日：2005-04-07
申请号：US10954373
申请日：2004-10-01
申请人： Shinji Kishimura , Masayuki Endo , Masaru Sasago , Mitsuru Ueda , Hirokazu Imori , Toshiaki Fukuhara
发明人： Shinji Kishimura , Masayuki Endo , Masaru Sasago , Mitsuru Ueda , Hirokazu Imori , Toshiaki Fukuhara
CPC分类号： G03F7/0046 , C08F12/20 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 5 and a second unit represented by a general formula of the following Chemical Formula 6: wherein R1, R2, R3, R7, R8 and R9 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5, R6 and R11 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; R12 is a fluorine atom, or a straight-chain fluoridated alkyl group or a branched or cyclic fluoridated alkyl group with a carbon number not less than 1 and not more than 20; 0
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公开(公告)号：US20130288184A1
公开(公告)日：2013-10-31
申请号：US13603042
申请日：2012-09-04
申请人： Toshiaki Fukuhara
发明人： Toshiaki Fukuhara
IPC分类号： G03F7/20
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/322
摘要： Provided is a pattern forming method making it possible to obtain a pattern with less scums and watermark defects. The pattern forming method includes the steps of forming a film from an actinic-ray- or radiation-sensitive resin composition includes a resin (A) that exhibits an increased solubility in an alkali developer when acted on by an acid, a compound (B) that generates an acid when exposed to actinic rays or radiation, and a resin (C) containing at least one of a fluorine atom and a silicon atom, exposing the film to light, and developing the exposed film using a tetramethylammonium hydroxide solution whose concentration is less than 2.38 mass %.
摘要翻译： 提供了一种图案形成方法，使得可以获得具有较少的浮渣和水印缺陷的图案。 图案形成方法包括以下步骤：由光化学射线或辐射敏感性树脂组合物形成膜，其包括在用酸作用时在碱显影剂中表现出增加的溶解度的树脂（A），化合物（B） 当暴露于光化射线或辐射时产生酸，以及含有至少一个氟原子和硅原子的树脂（C），将膜暴露于光下，并使用浓度为四甲基氢氧化铵溶液使曝光的膜显影 小于2.38质量％。
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公开(公告)号：US08343708B2
公开(公告)日：2013-01-01
申请号：US13228836
申请日：2011-09-09
申请人： Toshiaki Fukuhara , Hiromi Kanda , Shinichi Kanna
发明人： Toshiaki Fukuhara , Hiromi Kanda , Shinichi Kanna
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/0757 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A positive photosensitive composition includes: (A) a resin that has an acid decomposable repeating unit of formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound that generates an acid upon irradiation; (C) a resin that has: a fluorine atom and/or a silicon atom; and a group selected from groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility of the resin (C) in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents hydrogen, alkyl, cyano or halogen, Ry1 to Ry3 each independently represents alkyl or cycloalkyl, and at least two of Ry1 to Ry3 may be coupled to form a ring, and Z represents a divalent linking group.
摘要翻译： 正型光敏组合物包括：（A）具有式（I）的酸可分解重复单元并通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）照射时产生酸的化合物; （C）具有氟原子和/或硅原子的树脂; 和选自（x）〜（z）组的基团; 和（D）溶剂：（x）碱溶性基团，（y）通过碱显影剂的作用分解并增加树脂（C）在碱性显影剂中的溶解度的基团，和（z） 通过酸的作用分解，其中，Xa1表示氢，烷基，氰基或卤素，Ry1至Ry3各自独立地表示烷基或环烷基，并且Ry1至Ry3中的至少两个可以偶合形成环，Z表示二价 连接组。
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