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    Photo-electrical detecting apparatus
    1.
    发明授权
    Photo-electrical detecting apparatus 失效
    光电检测装置

    公开(公告)号：US4262208A

    公开(公告)日：1981-04-14

    申请号：US49980

    申请日：1979-06-19

    申请人： Akiyoshi Suzki ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Tozuka ,  Ryozo Hiraga ,  Yuzo Kato ,  Yasuo Ogino

    发明人： Akiyoshi Suzki ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Tozuka ,  Ryozo Hiraga ,  Yuzo Kato ,  Yasuo Ogino

    IPC分类号： G01B11/00 ,  G02B21/08 ,  G02B21/10 ,  G02B27/00 ,  G03F9/00 ,  H01L21/00 ,  H01L21/027 ,  H01L21/30 ,  G02B21/06

    CPC分类号： G03F9/7069 ,  G02B21/082 ,  G02B21/10

    摘要： This invention relates to a photo-electrical detecting apparatus for forming a dark-field image of an object on a one-dimensional image sensor and reading said image photo-electrically. The apparatus includes a telecentric objective lens, and a light source image is formed on the clear aperture plane of said lens, said image being in focus in a direction on said plane and out of focus in a perpendicular direction. A line- or band-shaped area of the object is illuminated by the light from said light source image. Thus a dark-field image of the object is formed on said one-dimensional image sensor by providing, on a plane equivalent to said aperture plane, a filter which intercepts the normal reflected light from said object and transmits the scattered light therefrom.

    摘要翻译： 本发明涉及一种用于在一维图像传感器上形成物体的暗视场图像和光电读取的光电检测装置。 该装置包括远心物镜，并且在所述透镜的透明孔径平面上形成光源图像，所述图像在所述平面上的方向上聚焦，并且在垂直方向上聚焦。 物体的线条或带状区域被来自所述光源图像的光照射。 因此，在所述一维图像传感器上，通过在与所述孔径平面相当的平面上设置一个截取来自所述物体的法线反射光并从其透射散射光的滤光器，形成所述物体的暗视场图像。

    Photoelectric detecting apparatus
    2.
    发明授权
    Photoelectric detecting apparatus 失效
    光电检测装置

    公开(公告)号：US4202627A

    公开(公告)日：1980-05-13

    申请号：US900856

    申请日：1978-04-28

    申请人： Akiyoshi Suzki ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Tozuka ,  Ryozo Hiraga ,  Yuzo Kato ,  Yasuo Ogino

    发明人： Akiyoshi Suzki ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Tozuka ,  Ryozo Hiraga ,  Yuzo Kato ,  Yasuo Ogino

    IPC分类号： G01B11/00 ,  G01B11/02 ,  G02B27/00 ,  G02B27/46 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F9/70 ,  G01B11/02

    摘要： An improved photoelectric detecting apparatus is disclosed in which a subject surface containing a pattern which diffracts light in a predetermined direction is scanned with spotlight and the diffracted light coming from the pattern is detected by means of photoelectric element so as to read out information of the pattern. The apparatus comprises a first photoelectric element for detecting the light diffracted in the predetermined direction, a second photoelectric element adapted for detecting light diffracted in directions other than the predetermined direction and an operational circuit for operating the signal derived from the first photoelectric element and that derived from the second one. Thus, when there is any diffractive matter such as flaw, dust and the like on the subject surface, diffracted light from the diffractive matter is detected by both the first and second photoelectric elements whereas diffracted light from the pattern is detected only by the first photoelectric element. By operating the outputs of the two photoelectric elements only the necessary information of the pattern can be read out.

    摘要翻译： 公开了一种改进的光电检测装置，其中包含以预定方向衍射光的图案的被摄体表面用聚光灯扫描，并且通过光电元件检测来自图案的衍射光，以便读出图案的信息 。 该装置包括用于检测沿预定方向衍射的光的第一光电元件，适用于检测沿除了预定方向以外的方向衍射的光的第二光电元件和用于操作从第一光电元件导出的信号的操作电路， 从第二个。 因此，当在物体表面上存在诸如缺陷，灰尘等的衍射物质时，来自衍射物质的衍射光由第一和第二光电元件都被检测，而来自图案的衍射光仅由第一光电 元件。 通过操作两个光电元件的输出，只能读出图案的必要信息。

    Alignment apparatus
    3.
    发明授权
    Alignment apparatus 失效
    校准装置

    公开(公告)号：US4275306A

    公开(公告)日：1981-06-23

    申请号：US16165

    申请日：1979-02-23

    申请人： Yuzo Kato ,  Yasuo Ogino ,  Ryozo Hiraga ,  Hideki Yoshinari ,  Masao Tozuka ,  Ichiro Kano

    发明人： Yuzo Kato ,  Yasuo Ogino ,  Ryozo Hiraga ,  Hideki Yoshinari ,  Masao Tozuka ,  Ichiro Kano

    IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68 ,  G01N21/86

    CPC分类号： G03F9/70 ,  H01L21/681

    摘要： An alignment apparatus in which alignment marks on a mask and a wafer for producing a semiconductor circuit element are photoelectrically read and the positional deviation between the two alignment marks is detected and one of the mask and the wafer is parallel-moved in accordance with the detected amount to align the mask and wafer into a predetermined positional relation. This apparatus has the function of correcting any interval error which may be present between the alignment marks.

    摘要翻译： 对其进行光电读取的掩模和用于制造半导体电路元件的晶片的对准标记，并且检测出两个对准标记之间的位置偏差，并根据检测到的掩模和晶片中的一个平行移动 将掩模和晶片对准到预定的位置关系。 该装置具有校正可能存在于对准标记之间的间隔误差的功能。