公开(公告)号：US4278893A

公开(公告)日：1981-07-14

申请号：US14359

申请日：1979-02-23

申请人： Yuzo Kato ,  Yasuo Ogino ,  Ryozo Hiraga ,  Hideki Yoshinari ,  Masao Tozuka ,  Ichiro Kano ,  Akiyoshi Suzuki

发明人： Yuzo Kato ,  Yasuo Ogino ,  Ryozo Hiraga ,  Hideki Yoshinari ,  Masao Tozuka ,  Ichiro Kano ,  Akiyoshi Suzuki

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68 ,  G01N21/86

CPC分类号： G03F9/70 ,  H01L21/681

摘要： An alignment apparatus by which two points on a first standard line on a first workpiece may be aligned in two regions having as the centers two standard points on a second standard line on a second workpiece optically opposed to the first workpiece and having predetermined areas. The two regions are diamond-shaped. By this, it is possible to reduce the alignment error of the first and second workpieces.

摘要翻译： 对准装置，其中在第一工件上的第一标准线上的两个点可以在与第一工件光学相对并具有预定区域的第二工件上的第二标准线上具有作为中心两个标准点的两个区域中对准。 这两个地区是菱形的。 由此，可以减小第一和第二工件的对准误差。

公开(公告)号：US4315201A

公开(公告)日：1982-02-09

申请号：US884534

申请日：1978-03-08

申请人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Totsuka ,  Yuzo Kato ,  Yasuo Ogino

发明人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Totsuka ,  Yuzo Kato ,  Yasuo Ogino

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68 ,  G05B1/06

CPC分类号： G03F9/70

摘要： An alignment apparatus for mask and wafer each having alignment marks provided in a narrow strip like area between circuit patterns is disclosed, which mask and wafer are used in manufacturing semiconductor circuit elements. In the apparatus, the mask and wafer are scanned to obtain scan signals by means of which the amount of relative deviation between the alignment marks on mask and wafer is detected. By means of the detected signal, an alignment is effected between the mask and wafer in the apparatus. For this type of alignment apparatus, there is a problem that since the alignment marks are provided in the narrow strip like area, no coincidence between the scanning position and the strip area is attainable with pre-alignment accuracy. Improvement in the alignment apparatus according to the invention lies in that a reading of alignment marks is initiated after the coincidence is photoelectrically detected.

摘要翻译： 公开了一种用于掩模和晶片的对准装置，每个具有设置在电路图案之间的窄带状区域中的对准标记，该掩模和晶片用于制造半导体电路元件。 在该装置中，对掩模和晶片进行扫描以获得扫描信号，通过该扫描信号检测掩模和晶片上的对准标记之间的相对偏离量。 通过检测到的信号，在设备中的掩模和晶片之间进行对准。 对于这种对准装置，存在这样的问题，即由于将对准标记设置在窄条状区域中，所以在预定位精度下不能使扫描位置和条带区域之间重合。 根据本发明的对准装置的改进在于，在光电检测一致之后开始对准标记的读取。

公开(公告)号：US4301363A

公开(公告)日：1981-11-17

申请号：US70986

申请日：1979-08-30

申请人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Hideki Yoshinari

发明人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Hideki Yoshinari

IPC分类号： G02B7/00 ,  B23Q15/24 ,  G03F9/00 ,  H01L21/027 ,  G01N21/86

CPC分类号： G03F9/7069 ,  B23Q15/24

摘要： An alignment device of a type, wherein an alignment pattern provided on a mask for fabrication of a semiconductor circuit element and an alignment pattern provided on a wafer are photoelectrically read in a dark field by a flying spot scanning system or a flying image scanning system to detect a relative positional relationship between the mask and the wafer, and a desired positional relationship is obtained by moving at least one of the mask and wafer on the basis of a detected signal. The novel feature of this alignment device resides in that the size of a line forming the alignment pattern along the scanning line is twice or more as large as the size of the scanning spot.

摘要翻译： 一种类型的对准装置，其中设置在用于制造半导体电路元件的掩模上的对准图案和设置在晶片上的对准图案通过飞点扫描系统或飞行图像扫描系统在暗场中被光电读取， 检测掩模和晶片之间的相对位置关系，并且通过基于检测到的信号移动掩模和晶片中的至少一个来获得期望的位置关系。 该对准装置的新颖特征在于沿着扫描线形成对准图案的线的尺寸是扫描点的尺寸的两倍或更多倍。

公开(公告)号：US3988066A

公开(公告)日：1976-10-26

申请号：US537323

申请日：1974-12-30

申请人： Akiyoshi Suzuki ,  Ichiro Kano

发明人： Akiyoshi Suzuki ,  Ichiro Kano

IPC分类号： G03F7/20 ,  G03B27/02 ,  G02B27/00

CPC分类号： G03F7/70583

摘要： In the apparatus, an image of a mask is printed on a light-sensitive layer while minimizing the debasing influences due to the diffraction occurring on the layer surface as well as due to the standing wave occurring in the layer. This apparatus includes an arrangement such that the rays coming from a light source are collimated and then directed to a fly's eye lens assembly, and the exit rays from this assembly are again collimated to illuminate the mask. The luminous fluxes of parallel rays impinging upon the mask at various angles of incidence remove the influences of diffraction on the image of the mask. Also this apparatus includes a filter removably inserted in the optical path between the light source and the assembly to remove the influence of the standing wave.

摘要翻译： 在该装置中，将掩模的图像印刷在感光层上，同时最小化由于在层表面上发生的衍射引起的下降影响以及由于在该层中发生的驻波。 该装置包括使得来自光源的光线被准直并且然后被引导到蝇眼透镜组件的布置，并且来自该组件的出射光线再次被准直以照亮掩模。 以不同的入射角照射在掩模上的平行光线的光通量消除了衍射对掩模图像的影响。 该装置还包括可移除地插入在光源和组件之间的光路中的过滤器，以消除驻波的影响。

公开(公告)号：US07573563B2

公开(公告)日：2009-08-11

申请号：US11366356

申请日：2006-03-01

申请人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/7085 ,  G01J4/04 ,  G03F7/70058 ,  G03F7/70566 ,  G03F7/70591

摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.

摘要翻译： 曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元 与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测 通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。

公开(公告)号：US20070252968A1

公开(公告)日：2007-11-01

申请号：US11742042

申请日：2007-04-30

申请人： Akinori Ohkubo ,  Akiyoshi Suzuki

发明人： Akinori Ohkubo ,  Akiyoshi Suzuki

IPC分类号： G03B27/54

CPC分类号： G03F7/70208 ,  G03F7/70141 ,  G03F7/70191

摘要： An exposure apparatus that exposes a pattern of an original onto a substrate includes a condenser optical system configured to split light from a light source into plural rays, to condense the plural rays at different positions on the original, and to make a central part of each of the plural rays that illuminate the original darker than a periphery at the Fourier transform plane with respect to the original, and a projection optical system configured to project the pattern of the original onto the substrate.

摘要翻译： 将原稿的图案曝光到基板上的曝光装置包括：聚光器系统，被配置为将来自光源的光分离成多根，将多根光线在原稿的不同位置进行冷凝，并且使各个 所述多个光线相对于所述原稿在所述傅里叶变换平面处照亮所述原件比所述周边更暗;以及投影光学系统，其被配置为将所述原稿的图案投影到所述基板上。

公开(公告)号：US07196773B2

公开(公告)日：2007-03-27

申请号：US10538230

申请日：2004-09-10

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G02B27/0961 ,  G02B5/32 ,  G02B27/0905 ,  G02B27/0927 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70566

摘要： An illumination optical system for illuminating an illuminated surface using light from a light source includes a first diffraction optical element upon which the light from the light source is incident, and a second diffraction optical element upon which the light from the light source is incident, wherein the light from the first diffraction optical element forms a first part of an illumination distribution on a predetermined surface that substantially has a Fourier transform relationship with the illuminated surface, and the light from the second diffraction optical element forms a second part of the illumination distribution.

摘要翻译： 使用来自光源的光照射照明面的照明光学系统包括：来自光源的光入射的第一衍射光学元件和来自光源的光入射的第二衍射光学元件，其中， 来自第一衍射光学元件的光在与被照射面基本上具有傅立叶变换关系的预定表面上形成照明分布的第一部分，并且来自第二衍射光学元件的光形成照明分布的第二部分。

公开(公告)号：US06681844B1

公开(公告)日：2004-01-27

申请号：US09806503

申请日：2001-04-13

申请人： Naoyuki Inoue ,  Toshio Matsubara ,  Tomoyoshi Irie ,  Akiyoshi Suzuki ,  Tomoyuki Uchimura

发明人： Naoyuki Inoue ,  Toshio Matsubara ,  Tomoyoshi Irie ,  Akiyoshi Suzuki ,  Tomoyuki Uchimura

IPC分类号： F28D900

CPC分类号： F28F3/046 ,  F25B33/00 ,  F25B37/00 ,  F25B39/00 ,  F28D5/02 ,  F28D9/0043 ,  F28D2021/007 ,  F28D2021/0071 ,  F28F3/042 ,  F28F3/044 ,  F28F3/083 ,  F28F9/0275 ,  F28F2250/104

摘要： The present invention relates to a plate type heat exchanger having a heat exchange element composed of two plates for exchanging heat between a fluid flowing inside the heat exchange element and a fluid flowing outside the heat exchange element. In the plate type heat exchanger, the two plates (1) have a plurality of depressions (8), and the depressions are brought into contact with and bonded to each other. Peripheral portions of the plates are sealed to form a space in which a fluid flows and constitute a heat exchange element (2) having opening portions (5, 6) at both ends thereof. The heat exchange elements (2) are piled on and bonded to each other so that the opening portions (5, 6) communicate with each other.

摘要翻译： 本发明涉及一种板式热交换器，其具有热交换元件，该热交换元件由在热交换元件内部流动的流体与流过热交换元件的流体之间进行热交换的两个板构成。 在板式热交换器中，两个板（1）具有多个凹部（8），并且使凹部彼此接触并接合。 板的外围部分被密封以形成流体流动的空间，并且构成在其两端具有开口部分（5,6）的热交换元件（2）。 热交换元件（2）彼此堆叠并彼此结合，使得开口部（5,6）彼此连通。

公开(公告)号：US06534242B2

公开(公告)日：2003-03-18

申请号：US09783600

申请日：2001-02-15

申请人： Mitsuro Sugita ,  Akiyoshi Suzuki ,  Miyoko Kawashima ,  Kenji Saitoh ,  Yuichi Iwasaki

发明人： Mitsuro Sugita ,  Akiyoshi Suzuki ,  Miyoko Kawashima ,  Kenji Saitoh ,  Yuichi Iwasaki

IPC分类号： G03C500

CPC分类号： G03F7/2022 ,  G03F7/7045 ,  G03F7/70466

摘要： An exposure method for transferring a device pattern to a resist, wherein the device pattern includes a first element and a second element having a linewidth narrower than the first element. The method includes a first exposure step for exposing the resist by use of an interference fringe, produced by interference of two light beams, through an exposure amount substantially not greater than a threshold of the resist, and a second exposure step for exposing the resist with a light pattern related to the first and second elements. A light component, of the light pattern, related to the first element bears an exposure amount greater than the threshold, a light component, of the light pattern, related to the second element bears an exposure amount not greater than the threshold and is to be combined with light in a portion of the interference fringe, and a sum of the exposure amount of the light component related to the second element and an exposure amount provided by the light in the portion of the interference fringe is greater than the threshold.

摘要翻译： 一种用于将器件图案转印到抗蚀剂的曝光方法，其中所述器件图案包括第一元件和具有比所述第一元件窄的线宽的第二元件。 该方法包括第一曝光步骤，用于通过使用由两个光束的干涉产生的干涉条纹曝光抗蚀剂，所述干涉条纹通过基本上不大于抗蚀剂阈值的曝光量，以及第二曝光步骤，用于将抗蚀剂与 与第一和第二元素相关的光图案。 与第一元件相关的光图案的光分量具有大于阈值的曝光量，与第二元件相关的光图案的光分量具有不大于阈值的曝光量，并且为 与干涉条纹的一部分中的光结合，并且与第二元素相关的光分量的曝光量与干涉条纹部分中的光提供的曝光量之和大于阈值。

公开(公告)号：US06441886B2

公开(公告)日：2002-08-27

申请号：US09414437

申请日：1999-10-07

申请人： Akiyoshi Suzuki ,  Yoshiyuki Sekine

发明人： Akiyoshi Suzuki ,  Yoshiyuki Sekine

IPC分类号： G03B2772

CPC分类号： G03F7/70091 ,  G03B27/54

摘要： An illumination optical system for use in an exposure apparatus for projecting a pattern of a mask onto a substrate. The illumination system includes a first beam shape changing optical system for transforming a light, supplied from a light source, into a slit-like light of an oblong shape, and a second beam shape changing optical system for transforming the slit-like light of oblong shape into a slit-like light of an arcuate shape, the second beam shape changing optical system having a prism element. The mask is illuminated with the slit-like light of arcuate shape.

摘要翻译： 一种用于曝光装置的照明光学系统，用于将掩模的图案投影到基底上。 照明系统包括用于将从光源提供的光转换成长方形的狭缝状光的第一光束形状变化光学系统和用于变换长方形狭缝状光的第二光束形状变化光学系统 形成为弧形的狭缝状的光，第二光束形状变化光学系统具有棱镜元件。 面罩用弧形的狭缝状光照亮。