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1.发明授权Surface dielectric barrier discharge plasma unit and a method of generating a surface plasma 有权表面电介质势垒放电等离子体单元和产生表面等离子体的方法公开(公告)号：US09131595B2
公开(公告)日：2015-09-08
申请号：US12521473
申请日：2007-12-28
CPC分类号： H05H1/2406 , H05H2001/245
摘要： The invention relates to a surface dielectric barrier discharge plasma unit. The unit comprises a solid dielectric structure provided with an interior space wherein an interior electrode is arranged. Further, the unit comprises a further electrode for generating in concert with the interior electrode a surface dielectric barrier discharge plasma. The unit is also provided with a gas flow path along a surface of the structure.
摘要翻译： 本发明涉及一种表面电介质势垒放电等离子体单元。 该单元包括设置有内部空间的固体电介质结构，其中布置有内部电极。 此外，该单元包括用于与内部电极一起产生表面电介质势垒放电等离子体的另一电极。 该单元还设置有沿着结构的表面的气体流动路径。
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公开(公告)号：US20110287193A1
公开(公告)日：2011-11-24
申请号：US13125789
申请日：2009-10-22
IPC分类号： C23C16/509 , H05H1/24
CPC分类号： H01J37/3244 , B05D1/62 , C23C16/50 , C23C16/545 , D06M10/025 , H01J37/32348 , H05H1/2406 , H05H2001/2418 , H05H2001/2437
摘要： The invention relates to an apparatus for treating an object using a plasma process. The apparatus comprises a supporting structure for supporting the object, and an electrode structure for generating the plasma process. Further, the apparatus comprises multiple gas flow paths for separately flowing materials towards the object. In addition, downstream sections of at least two gas flow paths of the multiple gas flow paths substantially coincide.
摘要翻译： 本发明涉及一种使用等离子体工艺处理物体的装置。 该装置包括用于支撑物体的支撑结构和用于产生等离子体处理的电极结构。 此外，该装置包括用于将材料分开地朝向物体流动的多个气体流动路径。 此外，多个气体流动路径的至少两个气体流动路径的下游部分基本上重合。
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3.发明申请A SURFACE DIELECTRIC BARRIER DISCHARGE PLASMA UNIT AND A METHOD OF GENERATING A SURFACE PLASMA 有权表面电介质放电等离子体单元和产生表面等离子体的方法公开(公告)号：US20100175987A1
公开(公告)日：2010-07-15
申请号：US12521473
申请日：2007-12-28
CPC分类号： H05H1/2406 , H05H2001/245
摘要： The invention relates to a surface dielectric barrier discharge plasma unit. The unit comprises a solid dielectric structure provided with an interior space wherein an interior electrode is arranged. Further, the unit comprises a further electrode for generating in concert with the interior electrode a surface dielectric barrier discharge plasma. The unit is also provided with a gas flow path along a surface of the structure.
摘要翻译： 本发明涉及一种表面电介质势垒放电等离子体单元。 该单元包括设置有内部空间的固体电介质结构，其中布置有内部电极。 此外，该单元包括用于与内部电极一起产生表面电介质势垒放电等离子体的另一电极。 该单元还设置有沿着结构的表面的气体流动路径。
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公开(公告)号：US10793999B2
公开(公告)日：2020-10-06
申请号：US13608586
申请日：2012-09-10
申请人： Marcel Simor , Ales Fiala
发明人： Marcel Simor , Ales Fiala
IPC分类号： H05H1/24 , C23C16/50 , H01J37/32 , C23C16/54 , D06M10/10 , D06M14/18 , D06M10/02 , D06M11/36 , D06M11/83 , B05D1/00 , D06M23/08
摘要： An apparatus for depositing a polymer layer containing nanomaterial on a substrate material includes a carrier for carrying the substrate material; a transport structure for providing a polymerization material near a surface of the substrate material and conducting a gas flow near the surface of the substrate material with the gas flow comprising a nanomaterial; and a plasma chamber wherein a plasma electrode structure is arranged for depositing the polymer layer containing nanomaterial on the surface of the substrate material by applying a plasma polymerization process.
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5.发明申请Method for Depositing a Polymer Layer Containing Nanomaterial on a Substrate Material and Apparatus 有权在基板材料和装置上沉积含纳米材料的聚合物层的方法公开(公告)号：US20080199629A1
公开(公告)日：2008-08-21
申请号：US11994431
申请日：2006-07-07
申请人： Marcel Simor , Ales Fiala
发明人： Marcel Simor , Ales Fiala
CPC分类号： D06M10/10 , B05D1/62 , D06M10/025 , D06M11/36 , D06M11/83 , D06M14/18 , D06M23/08 , H05H1/2406 , H05H2001/2412
摘要： The invention relates to a method for depositing a polymer layer containing nanoparticles on a substrate material. The method comprises the steps of providing the substrate material, providing a polymerization material near a surface of the substrate material, conducting a gas flow near the surface of the substrate material, the gas flow comprising a nanomaterial, and depositing the polymer layer at the surface of the substrate material by applying a plasma polymerization process.
摘要翻译： 本发明涉及一种在衬底材料上沉积含有纳米颗粒的聚合物层的方法。 该方法包括以下步骤：提供衬底材料，在衬底材料的表面附近提供聚合材料，在衬底材料的表面附近传导气流，所述气流包括纳米材料，并将聚合物层沉积在表面 的基质材料。
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6.发明授权Method for depositing a polymer layer containing nanomaterial on a substrate material and apparatus 有权在衬底材料和装置上沉积含纳米材料的聚合物层的方法公开(公告)号：US08337957B2
公开(公告)日：2012-12-25
申请号：US11994431
申请日：2006-07-07
申请人： Marcel Simor , Ales Fiala
发明人： Marcel Simor , Ales Fiala
CPC分类号： D06M10/10 , B05D1/62 , D06M10/025 , D06M11/36 , D06M11/83 , D06M14/18 , D06M23/08 , H05H1/2406 , H05H2001/2412
摘要： The invention relates to a method for depositing a polymer layer containing nanoparticles on a substrate material. The method comprises the steps of providing the substrate material, providing a polymerization material near a surface of the substrate material, conducting a gas flow near the surface of the substrate material, the gas flow comprising a nanomaterial, and depositing the polymer layer at the surface of the substrate material by applying a plasma polymerization process.
摘要翻译： 本发明涉及一种在衬底材料上沉积含有纳米颗粒的聚合物层的方法。 该方法包括以下步骤：提供衬底材料，在衬底材料的表面附近提供聚合材料，在衬底材料的表面附近传导气流，所述气流包括纳米材料，并将聚合物层沉积在表面 的基质材料。
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公开(公告)号：US20110308457A1
公开(公告)日：2011-12-22
申请号：US13142557
申请日：2009-12-29
IPC分类号： C23C16/50
CPC分类号： H05H1/2406 , H05H2001/2412 , H05H2001/485
摘要： The invention relates to an apparatus for treating an object using a plasma process. The apparatus comprises a plasma reactor including a metal cylinder covered by a dielectric layer. Further, the apparatus comprises an electrode structure arranged radially outside the metal cylinder for generating the plasma process. The apparatus also comprises a supporting structure for locating the object to be treated at a pre-defined distance from the plasma reactor.
摘要翻译： 本发明涉及一种使用等离子体工艺处理物体的装置。 该装置包括等离子体反应器，其包括被电介质层覆盖的金属圆柱体。 此外，该装置包括在金属圆筒的径向外侧布置的用于产生等离子体工艺的电极结构。 该设备还包括用于以等离子体反应器预定距离定位被处理物体的支撑结构。
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公开(公告)号：US09883974B2
公开(公告)日：2018-02-06
申请号：US13518666
申请日：2010-12-28
CPC分类号： A61F13/00063 , A61F13/00995 , A61F13/069 , A61F2013/00157 , A61F2013/00217 , A61F2013/00238 , A61F2013/00519 , A61F2013/0091 , A61F2013/00931 , A61L15/46 , A61L2300/404 , D06M10/025 , D06M16/00
摘要： A process for preparing a disinfecting wound dressing for the protection of wounds, such as burn wounds, ulcers and cuts, the process comprising the steps of providing a yarn-based substrate, subjecting a surface of the substrate to a plasma environment, thereby providing non-leaching and biocidal features to the substrate surface by exposing the substrate surface to an antimicrobial active compound reaction.
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公开(公告)号：US09205595B2
公开(公告)日：2015-12-08
申请号：US12522891
申请日：2008-01-10
申请人： Marcel Simor , Ales Fiala
发明人： Marcel Simor , Ales Fiala
CPC分类号： B05D1/62 , B29C59/142 , B29C2059/145 , C08J7/18 , D06M14/18 , D06M14/26 , H05H1/2406 , H05H2001/2412 , H05H2001/2431
摘要： The invention relates to a method for treating an elongated object using a plasma process. The method comprises the steps of providing an elongated object in a planar electrode structure, and applying potential differences between electrodes of an electrode structure to generate the plasma process. Further, the method comprises at least partially surrounding the elongated object by a unitary section of the guiding structure, the electrode structure being associated with the unitary section.
摘要翻译： 本发明涉及使用等离子体处理处理细长物体的方法。 该方法包括以下步骤：在平面电极结构中提供细长物体，并施加电极结构的电极之间的电位差以产生等离子体处理。 此外，该方法包括通过引导结构的整体部分至少部分地围绕细长物体，电极结构与整体部分相关联。
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公开(公告)号：US20130046260A1
公开(公告)日：2013-02-21
申请号：US13518666
申请日：2010-12-28
CPC分类号： A61F13/00063 , A61F13/00995 , A61F13/069 , A61F2013/00157 , A61F2013/00217 , A61F2013/00238 , A61F2013/00519 , A61F2013/0091 , A61F2013/00931 , A61L15/46 , A61L2300/404 , D06M10/025 , D06M16/00
摘要： The invention relates to a process for preparing a disinfecting wound dressing for the protection of wounds, such as burn wounds, ulcers and cuts. The process comprises the steps of providing a yarn-based substrate, subjecting a surface of the substrate to a plasma environment, thereby providing non-leaching and biocidal features to the substrate surface by exposing the substrate surface to an antimicrobial active compound reaction.
摘要翻译： 本发明涉及一种制备用于保护伤口（例如烧伤，溃疡和切口）的消毒伤口敷料的方法。 该方法包括以下步骤：提供纱线基底，使基底的表面经受等离子体环境，从而通过将基底表面暴露于抗微生物活性化合物反应而向基底表面提供非浸出和杀生物特征。
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