摘要:
A charge pump includes a first node configured to receive a first voltage and a second node coupled to the first node through a first transistor. The second node is configured to output a voltage having a greater voltage magnitude than the first voltage. A first capacitor is coupled to a third node, and a fourth node is configured to receive a first clock signal. The third node is disposed between a drain of the first transistor and the fourth node. A leaky circuit device is coupled in parallel with the first capacitor for draining charges of a first polarity away from the second node.
摘要:
Integrated circuits such as memory arrays are coupled to a bi-directional charge pump that includes an input circuit and output circuit, and one or more pump stages coupled between the input circuit and the output circuit of the bi-directional charge pump. The output circuit includes a diode having an input and output and a transistor connected to the output of the diode and a ground potential. The input of the diode is electrically connected to the pump stages in a configuration that allows the charge pump to apply a positive or negative voltage to the memory array or other load.
摘要:
A charge pump includes a first node configured to receive a first voltage and a second node coupled to the first node through a first transistor. The second node is configured to output a voltage having a greater voltage magnitude than the first voltage. A first capacitor is coupled to a third node, and a fourth node is configured to receive a first clock signal. The third node is disposed between a drain of the first transistor and the fourth node. A leaky circuit device is coupled in parallel with the first capacitor for draining charges of a first polarity away from the second node.
摘要:
A FLASH memory cell includes a control gate over a floating gate over a substrate. A wall line and an erase gate each is disposed adjacent to a respective sidewall of the control gate. A first source/drain (S/D) region is disposed in the substrate and adjacent to a sidewall of the wall line. A second S/D region is disposed in the substrate and adjacent to the sidewall of the floating gate. A method of operating the FLASH memory cell includes applying a first voltage level to the control gate. A second voltage level is applied to the word line. The second voltage level is lower than the first voltage level. A third voltage level is applied to the first S/D region. A fourth voltage level is applied to the second S/D region. The fourth voltage level is higher than the third voltage level. The erase gate is electrically floating.
摘要:
A charge pump has at least one charge pump stage. Each charge pump stage includes at least one NMOS device. The at least one NMOS device has a deep N-well (DNW), and is coupled to at least one capacitor, an input node, and an output node. The input node is arranged to receive an input signal. The at least one capacitor is arranged to store electrical charges. The charge pump stage is configured to supply the electrical charges to the output node, and the DNW is arranged to float for a positive pump operation.
摘要:
A memory circuit includes a first group of memory arrays including a first memory array coupled with a first input/output (IO) interface and a second memory array coupled with a second IO interface. A second group of memory arrays include a third memory array coupled with a third IO interface and a fourth memory array coupled with a fourth TO interface. A plurality of redundancy bit lines include at least one first redundancy bit line that is configured for selectively repairing the first group of memory arrays, and at least one second redundancy bit line that is configured for selectively repairing the second group of memory arrays.
摘要:
A voltage regulator comprises resistor elements that mitigate variations in a program voltage (VPROG). In particular, the resistors allow copies of the voltage regulator to be fabricated more consistently across a semiconductor substrate. As such, variations in respective program voltages applied to different bitlines of a memory arrangement are mitigated. This mitigates yield loss as more devices perform as desired, thus necessitating fewer discards.
摘要:
An apparatus for measuring effects of isolation processes (280) on an oxide layer (286) in a memory device (255) is described. In one embodiment, the apparatus comprises a structure (110) comprised of an array (110c) of memory devices (255). A testing unit (120) is coupled with the structure (110). The testing unit (120) is for performing various electrical tests on the array (110c) of memory devices (255). The testing unit (120) is also for providing data regarding each memory device (255) in the array (110c) of memory devices (255). An analyzer (120) is coupled with the structure (110) for analyzing results of the various electrical tests. This determines the condition of the oxide layer (286) of each memory device (255) in the array of memory devices (110c).
摘要:
A method of generating a lifetime projection for semiconductor devices is disclosed. The disclosed method includes collecting lifetime information from a plurality of semiconductor devices at more than one stress condition. The method also includes determining the median lifetime for semiconductor devices at each of the stress conditions. Further, the method includes calculating a lifetime at each stress condition at which a predetermined percentage of the devices will exceed and extrapolating the lifetime for devices used at operating conditions.
摘要:
A method of determining the active region width (10) of an active region (4) by measuring the respective gate currents (Ig,100, Ig,100′, Ig,100″) of respective composite capacitance structures (100, 100′, 100″), respectively comprising at least one capacitor element (16, 17, 18; 16′, 17′, 18″; 16″, 17″, 18″) having respective predetermined widths (Wi) for fabricating a flash memory semiconductor device, and a device thereby fabricated. The present method also comprises plotting the respective gate currents (Ig,100, Ig,100 ′, Ig,100″) as a quasi-linear function (IW) of the respective predetermined widths (Wi), extrapolating a calibration term (WI=0) from the quasi-linear function (IW), and subtracting the calibration term (WIg=0) from the respective predetermined widths (Wi) to define and constrain the active region width (10) for facilitating device fabrication.