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    IMPRINT LITHOGRAPHY APPARATUS AND METHOD
    1.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS AND METHOD 有权
    IMPRINT LITHOGRAPHY APPARATUS和方法

    公开(公告)号：US20100096774A1

    公开(公告)日：2010-04-22

    申请号：US12580097

    申请日：2009-10-15

    申请人： Yvonne Wendela KRUIJT-STEGEMAN ,  Andre Bernardus Jeunink ,  Johannes Petrus Martinus Bernardus Vermeulen

    发明人： Yvonne Wendela KRUIJT-STEGEMAN ,  Andre Bernardus Jeunink ,  Johannes Petrus Martinus Bernardus Vermeulen

    IPC分类号： B28B11/10 ,  B28B17/00

    CPC分类号： G03F7/0002 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70766 ,  G03F7/70783

    摘要： An imprint lithography apparatus and manufacturing method can lead to mechanical stress being formed in a substrate to which an imprint pattern is being applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a part of the substrate, which is strained. An apparatus and method is disclosed which allows for stress relaxation in the substrate prior to further patterning to reduce, minimize or prevent such misalignment from residual strain. This is achieved by locally unclamping a portion of substrate (including optionally the entire substrate) from a corresponding portion of substrate holder so that mechanical stress leading to local strain may relax prior to further patterning. To overcome residual frictional force between the substrate and substrate holder, the substrate and substrate holder may be physically separated prior to further patterning.

    摘要翻译： 压印光刻设备和制造方法可能导致在施加印记图案的基板中形成机械应力。 这可能导致衬底内的应变导致随后的图案与基片的一部分中的较早的图案的未对准，其被应变。 公开了一种装置和方法，其允许在进一步图案化之前在基板中施加应力松弛，以减少，最小化或防止这种从残余应变的偏移。 这通过从衬底保持器的对应部分局部松开衬底的一部分（包括可选地整个衬底）来实现，使得导致局部应变的机械应力在进一步构图之前可能松弛。 为了克服衬底和衬底保持器之间的残余摩擦力，衬底和衬底保持器可以在进一步构图之前物理分离。

    IMPRINT LITHOGRAPHY
    3.
    发明申请
    IMPRINT LITHOGRAPHY 有权

    公开(公告)号：US20110095455A1

    公开(公告)日：2011-04-28

    申请号：US12912586

    申请日：2010-10-26

    申请人： Yvonne Wendela KRUIJT-STEGEMAN ,  Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink

    发明人： Yvonne Wendela KRUIJT-STEGEMAN ,  Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink

    IPC分类号： B29C59/02

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7076

    摘要： An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.

    摘要翻译： 压印光刻模板设置有对准标记，其中对准标记由具有不同于压印光刻模板的折射率的折射率的介电材料形成，所述电介质材料具有使得其提供相位的厚度 通过电介质材料的取向辐射与未通过电介质材料的对准辐射之间的差异。