利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

46 条记录 (耗时 0.023 秒)

    IMPRINT LITHOGRAPHY APPARATUS
    1.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS 有权

    公开(公告)号：US20110008483A1

    公开(公告)日：2011-01-13

    申请号：US12821806

    申请日：2010-06-23

    申请人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

    发明人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

    IPC分类号： B29C59/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

    摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.

    摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置和结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。

    IMPRINT LITHOGRAPHY APPARATUS
    3.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS 有权

    公开(公告)号：US20110003023A1

    公开(公告)日：2011-01-06

    申请号：US12821749

    申请日：2010-06-23

    申请人： Johannes Petrus Martinus Bernardus VERMEULEN ,  Andre Bernardus Jeunink ,  Yvonne Wendela Kruijt-Stegeman

    发明人： Johannes Petrus Martinus Bernardus VERMEULEN ,  Andre Bernardus Jeunink ,  Yvonne Wendela Kruijt-Stegeman

    IPC分类号： B29C59/00

    CPC分类号： B29C67/0051 ,  B29C64/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S425/81

    摘要： An imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.

    摘要翻译： 公开了压印光刻设备。 该设备包括配置成移动压印模板布置的电磁洛伦兹致动器装置，所述电磁洛伦兹致动器装置包括：磁体阵列; 以及导体阵列，每个导体被配置为承载电流，所述磁体阵列中的一个或所述导体阵列可移动并连接到所述压印模板装置，并且所述磁体阵列或所述导体阵列中的另一个延伸 至少部分地围绕或形成衬底保持器的一部分; 磁体阵列和导体阵列一起处于有利于以六个自由度移动磁体阵列或导体阵列中的可移动的一个的构造，使得印模模板布置也可以在六度 自由。

    IMPRINT LITHOGRAPHY APPARATUS AND METHOD
    4.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS AND METHOD 有权
    IMPRINT LITHOGRAPHY APPARATUS和方法

    公开(公告)号：US20100096774A1

    公开(公告)日：2010-04-22

    申请号：US12580097

    申请日：2009-10-15

    申请人： Yvonne Wendela KRUIJT-STEGEMAN ,  Andre Bernardus Jeunink ,  Johannes Petrus Martinus Bernardus Vermeulen

    发明人： Yvonne Wendela KRUIJT-STEGEMAN ,  Andre Bernardus Jeunink ,  Johannes Petrus Martinus Bernardus Vermeulen

    IPC分类号： B28B11/10 ,  B28B17/00

    CPC分类号： G03F7/0002 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70766 ,  G03F7/70783

    摘要： An imprint lithography apparatus and manufacturing method can lead to mechanical stress being formed in a substrate to which an imprint pattern is being applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a part of the substrate, which is strained. An apparatus and method is disclosed which allows for stress relaxation in the substrate prior to further patterning to reduce, minimize or prevent such misalignment from residual strain. This is achieved by locally unclamping a portion of substrate (including optionally the entire substrate) from a corresponding portion of substrate holder so that mechanical stress leading to local strain may relax prior to further patterning. To overcome residual frictional force between the substrate and substrate holder, the substrate and substrate holder may be physically separated prior to further patterning.

    摘要翻译： 压印光刻设备和制造方法可能导致在施加印记图案的基板中形成机械应力。 这可能导致衬底内的应变导致随后的图案与基片的一部分中的较早的图案的未对准，其被应变。 公开了一种装置和方法，其允许在进一步图案化之前在基板中施加应力松弛，以减少，最小化或防止这种从残余应变的偏移。 这通过从衬底保持器的对应部分局部松开衬底的一部分（包括可选地整个衬底）来实现，使得导致局部应变的机械应力在进一步构图之前可能松弛。 为了克服衬底和衬底保持器之间的残余摩擦力，衬底和衬底保持器可以在进一步构图之前物理分离。

    Imprint lithography method
    8.
    发明授权
    Imprint lithography method 有权
    印刷光刻法

    公开(公告)号：US09372396B2

    公开(公告)日：2016-06-21

    申请号：US12580097

    申请日：2009-10-15

    申请人： Yvonne Wendela Kruijt-Stegeman ,  Andre Bernardus Jeunink ,  Johannes Petrus Martinus Bernardus Vermeulen

    发明人： Yvonne Wendela Kruijt-Stegeman ,  Andre Bernardus Jeunink ,  Johannes Petrus Martinus Bernardus Vermeulen

    IPC分类号： G03F7/00 ,  G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  B29C59/02

    CPC分类号： G03F7/0002 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70766 ,  G03F7/70783

    摘要： An imprint lithography apparatus and manufacturing method can lead to mechanical stress being formed in a substrate to which an imprint pattern is being applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a part of the substrate, which is strained. An apparatus and method is disclosed which allows for stress relaxation in the substrate prior to further patterning to reduce, minimize or prevent such misalignment from residual strain. This is achieved by locally unclamping a portion of substrate (including optionally the entire substrate) from a corresponding portion of substrate holder so that mechanical stress leading to local strain may relax prior to further patterning. To overcome residual frictional force between the substrate and substrate holder, the substrate and substrate holder may be physically separated prior to further patterning.

    摘要翻译： 压印光刻设备和制造方法可能导致在施加印记图案的基板中形成机械应力。 这可能导致衬底内的应变导致随后的图案与基片的一部分中的较早的图案的未对准，其被应变。 公开了一种装置和方法，其允许在进一步图案化之前在基板中施加应力松弛，以减少，最小化或防止这种从残余应变的偏移。 这通过从衬底保持器的对应部分局部松开衬底的一部分（包括可选地整个衬底）来实现，使得导致局部应变的机械应力在进一步构图之前可能松弛。 为了克服衬底和衬底保持器之间的残余摩擦力，衬底和衬底保持器可以在进一步构图之前物理分离。

    Imprint lithography apparatus
    9.
    发明授权
    Imprint lithography apparatus 有权
    压印光刻设备

    公开(公告)号：US08685295B2

    公开(公告)日：2014-04-01

    申请号：US12821749

    申请日：2010-06-23

    申请人： Johannes Petrus Martinus Bernardus Vermeulen ,  Andre Bernardus Jeunink ,  Yvonne Wendela Kruijt-Stegeman

    发明人： Johannes Petrus Martinus Bernardus Vermeulen ,  Andre Bernardus Jeunink ,  Yvonne Wendela Kruijt-Stegeman

    IPC分类号： B29C35/08 ,  B29C59/16 ,  B29C67/00

    CPC分类号： B29C67/0051 ,  B29C64/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S425/81

    摘要： An imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.

    摘要翻译： 公开了压印光刻设备。 该设备包括配置成移动压印模板布置的电磁洛伦兹致动器装置，所述电磁洛伦兹致动器装置包括：磁体阵列; 以及导体阵列，每个导体被配置为承载电流，所述磁体阵列中的一个或所述导体阵列可移动并连接到所述压印模板装置，并且所述磁体阵列或所述导体阵列中的另一个延伸 至少部分地围绕或形成衬底保持器的一部分; 磁体阵列和导体阵列一起处于有利于以六个自由度移动磁体阵列或导体阵列中的可移动的一个的构造，使得印模模板布置也可以在六度 自由。