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    Minimizing resist poisoning in the manufacture of semiconductor devices
    1.
    发明申请
    Minimizing resist poisoning in the manufacture of semiconductor devices 有权

    公开(公告)号：US20080020580A1

    公开(公告)日：2008-01-24

    申请号：US11828217

    申请日：2007-07-25

    申请人： Zhijian Lu ,  Thomas Wolf ,  Scott Jessen

    发明人： Zhijian Lu ,  Thomas Wolf ,  Scott Jessen

    IPC分类号： H01L21/04

    CPC分类号： H01L21/76808 ,  H01L21/31144

    摘要： The present invention provides a method for manufacturing an interconnect and a method for manufacturing an integrated circuit including the interconnect. The method of manufacturing an interconnect, among other steps, includes forming a via (160) in a substrate (130) and then forming a base getter material (210) in the via (160). The method further includes forming a photoresist layer (410) over the base getter material (210), the photoresist layer (410) having an opening (420) therein positioned over the via (160), and etching a trench (510) into the substrate (130) using the opening (420) in the photoresist layer (410).

    Minimizing resist poisoning in the manufacture of semiconductor devices
    2.
    发明申请
    Minimizing resist poisoning in the manufacture of semiconductor devices 有权
    最大限度地减少半导体器件制造中的抗蚀剂中毒

    公开(公告)号：US20060110901A1

    公开(公告)日：2006-05-25

    申请号：US10993791

    申请日：2004-11-19

    申请人： Zhijian Lu ,  Thomas Wolf ,  Scott Jessen

    发明人： Zhijian Lu ,  Thomas Wolf ,  Scott Jessen

    IPC分类号： H01L21/44

    CPC分类号： H01L21/76808 ,  H01L21/31144

    摘要： The present invention provides a method for manufacturing an interconnect and a method for manufacturing an integrated circuit including the interconnect. The method of manufacturing an interconnect, among other steps, includes forming a via (160) in a substrate (130) and then forming a base getter material (210) in the via (160). The method further includes forming a photoresist layer (410) over the base getter material (210), the photoresist layer (410) having an opening (420) therein positioned over the via (160), and etching a trench (510) into the substrate (130) using the opening (420) in the photoresist layer (410).

    摘要翻译： 本发明提供了一种用于制造互连的方法和用于制造包括该互连的集成电路的方法。 制造互连的方法以及其它步骤包括在衬底（130）中形成通孔（160），然后在通路（160）中形成基底吸气材料（210）。 该方法还包括在基底吸气材料（210）上形成光致抗蚀剂层（410），光致抗蚀剂层（410）在其上具有位于通孔（160）上方的开口（420），并且将沟槽（510）蚀刻到 使用光致抗蚀剂层（410）中的开口（420）的衬底（130）。

    Diffusers and methods of manufacture
    3.
    发明授权
    Diffusers and methods of manufacture 有权
    扩散器和制造方法

    公开(公告)号：US07842376B2

    公开(公告)日：2010-11-30

    申请号：US11439437

    申请日：2006-05-24

    申请人： Zhijian Lu

    发明人： Zhijian Lu

    IPC分类号： B32B3/00 ,  F21V7/04

    CPC分类号： G02B5/0278 ,  G02B5/0221 ,  G02B5/0242 ,  G02B5/0268 ,  G02B7/02 ,  G02B27/62 ,  Y10T428/24496 ,  Y10T428/24612 ,  Y10T428/31891

    摘要： Diffusers including of a plurality of protruded structures with each structure containing multiple rugged facets are disclosed. The diffuser may be fabricated by coating a mixture of materials on a carrier film, the mixture of materials including at least a first material that polymerizes upon irradiation and at least a second material that is incompatible with the first material in polymerized form, then selectively irradiating the mixture of materials to polymerize a portion of the mixture of materials to form polymerized structures, and finally removing that part of the mixture of materials not forming part of the structures. A transparent material may be coated over the structures. The overcoat material may further contain scattering elements such as glass beads or polymeric particles.

    摘要翻译： 公开了包括多个突出结构的扩散器，每个结构包含多个坚固小面。 扩散器可以通过在载体膜上涂覆材料的混合物来制造，所述材料的混合物至少包括在照射时聚合的第一材料和至少第二种与聚合形式的第一材料不相容的材料，然后选择性地照射 聚合材料混合物的一部分以形成聚合结构的材料的混合物，最后除去不形成结构部分的材料混合物的那部分。 可以在结构上涂覆透明材料。 外涂层材料可以进一步包含散射元件，例如玻璃珠或聚合物颗粒。

    Optical Diffusers, Photomasks and their Methods of Fabrication
    5.
    发明申请
    Optical Diffusers, Photomasks and their Methods of Fabrication 有权
    光扩散器，光掩模及其制作方法

    公开(公告)号：US20100112490A1

    公开(公告)日：2010-05-06

    申请号：US12623529

    申请日：2009-11-23

    申请人： Zhijian Lu

    发明人： Zhijian Lu

    IPC分类号： G03F7/20 ,  G02B5/02

    CPC分类号： G03F7/0007 ,  G02B1/12 ,  G02B5/0215 ,  G02B5/0221 ,  G02B5/0231 ,  G02B5/0268 ,  G02B5/0278 ,  G02B6/0051 ,  G02F1/133606 ,  G03F1/00

    摘要： A large mask with random apertures may be formed by forming a smaller mask (also called a cell mask) with a random pattern of transmissive apertures which is then repeatedly replicated to create the large mask. The random pattern may be created by perturbing the aperture locations by a small amount or the apertures may be randomly placed within the cell mask provided certain criteria are met. Alternatively, a large mask with a random pattern of transmissive apertures may be formed without using a cell mask. This large mask may be used to fabricate diffusers and other devices that do not suffer from the interference, diffraction and other optical effects common in devices having structures that are non-randomly patterned.

    摘要翻译： 可以通过用随机图案的透射孔形成更小的掩模（也称为细胞掩模）来形成具有随机孔径的大掩模，然后重复地复制以形成大掩模。 可以通过将孔径位置扰乱少量来产生随机图案，或者如果符合某些标准，孔可以随机地放置在细胞掩模内。 或者，可以在不使用细胞掩模的情况下形成具有透射孔的随机图案的大掩模。 这种大的掩模可用于制造不受干涉，衍射和在具有非随机图案化结构的器件中常见的其它光学效应的扩散器和其它器件。

    Optical diffusers, photomasks and their methods of fabrication
    6.
    发明申请
    Optical diffusers, photomasks and their methods of fabrication 失效
    光扩散器，光掩模及其制造方法

    公开(公告)号：US20080020291A1

    公开(公告)日：2008-01-24

    申请号：US11489715

    申请日：2006-07-20

    申请人： Zhijian Lu

    发明人： Zhijian Lu

    IPC分类号： G03C5/00 ,  G03F1/00

    CPC分类号： G03F7/0007 ,  G02B1/12 ,  G02B5/0215 ,  G02B5/0221 ,  G02B5/0231 ,  G02B5/0268 ,  G02B5/0278 ,  G02B6/0051 ,  G02F1/133606 ,  G03F1/00

    摘要： A large mask with random apertures may be formed by forming a smaller mask (also called a cell mask) with a random pattern of transmissive apertures which is then repeatedly replicated to create the large mask. The random pattern may be created by perturbing the aperture locations by a small amount or the apertures may be randomly placed within the cell mask provided certain criteria are met. Alternatively, a large mask with a random pattern of transmissive apertures may be formed without using a cell mask. This large mask may be used to fabricate diffusers and other devices that do not suffer from the interference, diffraction and other optical effects common in devices having structures that are non-randomly patterned.

    摘要翻译： 可以通过用随机图案的透射孔形成更小的掩模（也称为细胞掩模）来形成具有随机孔径的大掩模，然后重复地复制以形成大掩模。 可以通过将孔径位置扰乱少量来产生随机图案，或者如果符合某些标准，孔可以随机地放置在细胞掩模内。 或者，可以在不使用细胞掩模的情况下形成具有透射孔的随机图案的大掩模。 这种大的掩模可用于制造不受干涉，衍射和在具有非随机图案化结构的器件中常见的其它光学效应的扩散器和其它器件。

    Diffusers and methods of manufacture
    7.
    发明申请
    Diffusers and methods of manufacture 有权
    扩散器和制造方法

    公开(公告)号：US20070275215A1

    公开(公告)日：2007-11-29

    申请号：US11439437

    申请日：2006-05-24

    申请人： Zhijian Lu

    发明人： Zhijian Lu

    IPC分类号： B32B3/00

    CPC分类号： G02B5/0278 ,  G02B5/0221 ,  G02B5/0242 ,  G02B5/0268 ,  G02B7/02 ,  G02B27/62 ,  Y10T428/24496 ,  Y10T428/24612 ,  Y10T428/31891

    摘要： Diffusers including of a plurality of protruded structures with each structure containing multiple rugged facets are disclosed. The diffuser may be fabricated by coating a mixture of materials on a carrier film, the mixture of materials including at least a first material that polymerizes upon irradiation and at least a second material that is incompatible with the first material in polymerized form, then selectively irradiating the mixture of materials to polymerize a portion of the mixture of materials to form polymerized structures, and finally removing that part of the mixture of materials not forming part of the structures. A transparent material may be coated over the structures. The overcoat material may further contain scattering elements such as glass beads or polymeric particles

    摘要翻译： 公开了包括多个突出结构的扩散器，每个结构包含多个坚固小面。 扩散器可以通过在载体膜上涂覆材料的混合物来制造，所述材料的混合物至少包括在照射时聚合的第一材料和至少第二种与聚合形式的第一材料不相容的材料，然后选择性地照射 聚合材料混合物的一部分以形成聚合结构的材料的混合物，最后除去不形成结构部分的材料混合物的那部分。 可以在结构上涂覆透明材料。 外涂层材料可以进一步包含散射元件，例如玻璃珠或聚合物颗粒

    Bradykinin antagonist pseudopeptide derivatives of substituted 4-keto-1,3,8-triazaspiro[4.5]decan-3-alkanoic acids
    10.
    发明授权
    Bradykinin antagonist pseudopeptide derivatives of substituted 4-keto-1,3,8-triazaspiro[4.5]decan-3-alkanoic acids 失效
    取代的4-酮基-1,3,8-三氮杂螺[4.5]癸烷-3-链烷酸的缓激肽拮抗剂假肽衍生物

    公开(公告)号：US5610142A

    公开(公告)日：1997-03-11

    申请号：US416524

    申请日：1995-04-03

    申请人： Babu J. Mavunkel ,  Zhijian Lu ,  Donald J. Kyle

    发明人： Babu J. Mavunkel ,  Zhijian Lu ,  Donald J. Kyle

    IPC分类号： A61K38/00 ,  C07K7/18 ,  A61K38/08

    CPC分类号： C07K7/18 ,  A61K38/00

    摘要： Novel compounds with as few as three natural amino acids that incorporate a substituted 4-keto-1,3,8-triazaspiro[4.5]decan-3-alkanoyl bridge in place of selected fragments of peptidic bradykinin receptor antagonists are pseudopeptides with potent bradykinin receptor antagonist actions. These pseudopeptides and their pharmaceutical compositions are of benefit in treating conditions and diseases of mammals, including humans, in which an excess of bradykinin or a related kinin is produced endogenously or is received exogenously, for example via insect bite.

    摘要翻译： 具有少至三个天然氨基酸的新型化合物，其掺入取代的4-酮基-1,3,8-三氮杂螺[4.5]癸烷-3-烷酰基桥代替肽缓激肽受体拮抗剂的选定片段是具有有效的缓激肽受体的假肽 拮抗作用。 这些假肽及其药物组合物在治疗哺乳动物（包括人）的条件和疾病方面是有益的，其中过量的缓激肽或相关的激肽是内源产生的或外源性地接受，例如通过昆虫咬。