Method for producing silicon carbide from waste circuit board cracking residue

    公开(公告)号:US20220315430A1

    公开(公告)日:2022-10-06

    申请号:US17843934

    申请日:2022-06-17

    发明人: Yufeng WU Haoran Yuan

    IPC分类号: C01B32/984 C22B7/00

    摘要: The invention discloses a method for producing silicon carbide from waste circuit board cracking residue, belongs to the field of comprehensive utilization of waste circuit board cracking products, and particularly relates to a method for high-valued utilization of non-metal components in waste circuit board cracking residue. The method mainly comprises the following steps: rolling and crushing, vibration sorting, ultrafine pulverization and electro-separation, quantitative batching, microwave sintering and discharging and grading. Compared with the prior art, rolling crushing is adopted to replace traditional shearing crushing, microwave sintering is adopted to replace a traditional Acheson smelting furnace, the effects of being easy to operate, saving energy and reducing consumption are achieved, the production efficiency is greatly improved, and the production cost is reduced. A brand-new method for obtaining high-purity silicon carbide by partially replacing anthracite and quartz sand with cracked coke and silicon dioxide in waste circuit board light plates or epoxy resin cracking residues is adopted, and high-value utilization of waste resources is achieved. The method has the characteristics of simple and feasible process, low manufacturing cost and wide adaptability, and is beneficial to improving the economic benefit and social benefit of enterprise production.

    Method of producing an electrode material for a battery electrode

    公开(公告)号:US11165056B2

    公开(公告)日:2021-11-02

    申请号:US15527463

    申请日:2015-11-09

    摘要: The present invention relates to a method for producing an electrode material for a battery electrode, in particular for a lithium-ion battery, wherein said electrode material comprises nanostructured silicon carbide, comprising the steps of: a) providing a mixture including a silicon source, a carbon source and a dopant, wherein at least the silicon source and the carbon source are present in common in particles of a solid granulate; b) treating the mixture provided in step a) at a temperature in the range from ≥1400° C. to ≤2000° C., in particular in a range from ≥1650° C. to ≤1850° C., wherein step b) is carried out in a reactor that has a depositing surface the temperature of which relative to at least one other inner reactor surface is reduced. In summary, a method described above enables to combine a simple and cost-efficient production with a high cycle stability.