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公开(公告)号:US20180327324A1
公开(公告)日:2018-11-15
申请号:US16040785
申请日:2018-07-20
发明人: Ta-Ching HSIAO , Wen-Po TU , Chu-Pi JENG , Mu-Hsi SUNG
IPC分类号: C04B35/573 , C04B35/626 , C04B35/628 , C01B32/956 , C30B35/00 , C30B23/00 , C30B29/36
CPC分类号: C04B35/573 , C01B32/956 , C04B35/6267 , C04B35/62675 , C04B35/6268 , C04B35/62839 , C04B35/62897 , C04B2235/3418 , C04B2235/3826 , C04B2235/422 , C04B2235/424 , C04B2235/428 , C04B2235/441 , C04B2235/48 , C04B2235/5427 , C04B2235/5436 , C04B2235/656 , C04B2235/6567 , C04B2235/6584 , C30B23/00 , C30B29/36 , C30B35/007
摘要: A method for manufacturing micropowder is provided, which includes (a) mixing a silicon precursor and a carbon precursor to form a mixture, and heating and keeping the mixture at 1600° C. to 1800° C. under a vacuum and non-oxygen condition for 120 to 180 minutes to form a silicon carbide powder; and (b) heating and keeping the silicon carbide powder at 1900° C. to 2100° C. under non-oxygen condition for 5 to 15 minutes, and then cooling and keeping the silicon carbide powder at 1800° C. to 2000° C. under the non-oxygen condition for 5 to 15 minutes to form micropowder, wherein the micropowder includes a silicon carbide core covered by a carbon film.
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公开(公告)号:US20210275965A1
公开(公告)日:2021-09-09
申请号:US17327131
申请日:2021-05-21
发明人: Ta-Ching HSIAO , Chu-Pi JENG , Kuo-Lun HUANG , Mu-Hsi SUNG , Keng-Yang CHEN , Li-Duan TSAI
摘要: A method for removing boron is provided, which includes (a) mixing a carbon source material and a silicon source material in a chamber to form a solid state mixture, (b) heating the solid state mixture to a temperature of 1000° C. to 1600° C., and adjusting the pressure of the chamber to 1 torr to 100 torr. The method also includes (c) conducting a gas mixture of a first carrier gas and water vapor into the chamber to remove boron from the solid state mixture, and (d) conducting a second carrier gas into the chamber.
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公开(公告)号:US20210139330A1
公开(公告)日:2021-05-13
申请号:US16729065
申请日:2019-12-27
发明人: Ta-Ching HSIAO , Chu-Pi JENG , Mu-Hsi SUNG , Kuo-Lun HUANG
IPC分类号: C01B32/05 , C01B32/963 , C01B32/97
摘要: A method of purifying silicon carbide powder includes: providing a container with a surface coated by a nitrogen-removal metal layer, wherein the nitrogen-removal metal layer is tantalum, niobium, tungsten, or a combination thereof; putting a silicon carbide powder into the container to contact the nitrogen-removal metal layer; and heating the silicon carbide powder under an inert gas at a pressure of 400 torr to 760 torr at 1700° C. to 2300° C. for 2 to 10 hours, thereby reducing the nitrogen content of the silicon carbide powder.
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公开(公告)号:US20190176085A1
公开(公告)日:2019-06-13
申请号:US15854375
申请日:2017-12-26
发明人: Ta-Ching HSIAO , Chu-Pi JENG , Kuo-Lun HUANG , Mu-Hsi SUNG , Keng-Yang CHEN , Li-Duan TSAI
IPC分类号: B01D53/46 , C01B35/02 , C01B32/984
摘要: A method for removing boron is provided, which includes (a) mixing a carbon source material and a silicon source material in a chamber to form a solid state mixture, (b) heating the solid state mixture to a temperature of 1000° C. to 1600° C., and adjusting the pressure of the chamber to 1 torr to 100 torr. The method also includes (c) conducting a gas mixture of a first carrier gas and water vapor into the chamber to remove boron from the solid state mixture, and (d) conducting a second carrier gas into the chamber.
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公开(公告)号:US20180134625A1
公开(公告)日:2018-05-17
申请号:US15386749
申请日:2016-12-21
发明人: Ta-Ching HSIAO , Wen-Po TU , Chu-Pi JENG , Mu-Hsi SUNG
IPC分类号: C04B35/573 , C04B35/628 , C04B35/626
CPC分类号: C04B35/573 , C01B31/36 , C01B32/956 , C04B35/6267 , C04B35/62839 , C04B2235/5436 , C04B2235/656 , C04B2235/6567 , C04B2235/6584 , C30B23/00 , C30B29/36 , C30B35/007
摘要: A method for manufacturing micropowder is provided, which includes (a) mixing a silicon precursor and a carbon precursor to form a mixture, and heating and keeping the mixture at 1600° C. to 1800° C. under a vacuum and non-oxygen condition for 120 to 180 minutes to form a silicon carbide powder; and (b) heating and keeping the silicon carbide powder at 1900° C. to 2100° C. under non-oxygen condition for 5 to 15 minutes, and then cooling and keeping the silicon carbide powder at 1800° C. to 2000° C. under the non-oxygen condition for 5 to 15 minutes to form micropowder, wherein the micropowder includes a silicon carbide core covered by a carbon film.
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