Physical properties of thermal barrier coatings using electron beam-physical vapor deposition
    2.
    发明授权
    Physical properties of thermal barrier coatings using electron beam-physical vapor deposition 失效
    使用电子束 - 物理气相沉积的热障涂层的物理性质

    公开(公告)号:US06620465B2

    公开(公告)日:2003-09-16

    申请号:US09296632

    申请日:1999-04-23

    IPC分类号: C23C1430

    摘要: An improved method for applying a ceramic material, such as a thermal barrier coating to an article. A method for applying a ceramic material as a coating to a substrate article in which the thermal conductivity of the ceramic material is reduced or lowered is provided. The thermal conductivity of a coating applied by a physical vapor deposition (PVD) method is dependent upon its distance from the source(s) of material used for the coating. The thermal conductivity of the applied coating is altered by adjusting the position of the article undergoing the PVD process by increasing the distances of the article or workpiece from the ingot or source of ceramic material to provide a coating of lower thermal conductivity. In accordance with the present invention, the article to be coated is positioned at a distance required to achieve at least a 10% reduction in the thermal conductivity of the applied coating.

    摘要翻译: 一种用于将陶瓷材料(例如热障涂层)施加到制品上的改进方法。 提供了一种将陶瓷材料作为涂层施加到其中陶瓷材料的导热性降低或降低的基底制品的方法。 通过物理气相沉积(PVD)方法施加的涂层的导热性取决于其与用于涂层的材料源的距离。 通过增加制品或工件与铸块或陶瓷材料源的距离,通过调节经历PVD工艺的制品的位置来改变所涂覆的涂层的热导率,以提供较低热导率的涂层。 根据本发明,待涂覆的制品定位在实现涂覆涂层的热导率降低至少10%所需的距离处。

    Coating device and method for coating a component with a thermal barrier coating
    3.
    发明授权
    Coating device and method for coating a component with a thermal barrier coating 失效
    涂覆装置和涂覆具有热障涂层的部件的方法

    公开(公告)号:US06210744B1

    公开(公告)日:2001-04-03

    申请号:US09201725

    申请日:1998-11-30

    IPC分类号: C23C1430

    摘要: A method for coating a component with a thermal barrier coating, includes placing the component in a coating chamber and maintaining the component at a component temperature. A vacuum is established in the coating chamber. The process parameters vacuum pressure and component temperature are controlled together, at least during the coating process with a deposition of material forming the thermal barrier coating. The control takes place in such a way that the parameters are in a respective set-point value range and the thermal barrier coating grows with a columnar structure on the component. A coating device is also provided.

    摘要翻译: 用于涂覆具有热障涂层的组分的方法包括将组分置于涂布室中并将组分保持在组分温度。 在涂层室中建立真空。 工艺参数真空压力和组分温度一起控制,至少在涂层过程中,沉积形成热障涂层的材料。 控制以这样的方式进行,使得参数处于相应的设定值范围内,并且热障涂层以部件上的柱状结构生长。 还提供涂覆装置。

    Method of forming a thermal barrier coating system
    5.
    发明授权
    Method of forming a thermal barrier coating system 有权
    形成热障涂层系统的方法

    公开(公告)号:US06447854B1

    公开(公告)日:2002-09-10

    申请号:US09621422

    申请日:2000-07-21

    IPC分类号: C23C1430

    CPC分类号: C23C14/083 C23C14/566

    摘要: A method for producing a thermal barrier coating system on an article that will be subjected to a hostile environment. The thermal barrier coating system is composed of a metallic bond coat and a ceramic thermal barrier coating having a columnar grain structure. The method generally entails forming the bond coat on the surface of a component, and then grit blasting the bond coat with an abrasive media having a particle size of greater than 80 mesh. The component is then supported within a coating chamber containing at least two ingots of the desired ceramic material. An absolute pressure of greater than 0.014 mbar is established within the chamber containing oxygen and an inert gas. Thereafter, the ceramic ingots are vaporized with an electron beam such that the vapor deposits on the surface of the component to form a layer of the ceramic material on the surface.

    摘要翻译: 一种在受到恶劣环境的制品上制备热障涂层系统的方法。 热障涂层系统由金属粘合涂层和具有柱状晶粒结构的陶瓷热障涂层组成。 该方法通常需要在部件的表面上形成粘合涂层,然后用具有大于80目的粒度的研磨介质喷砂粘结涂层。 然后将该组分支撑在包含至少两个所需陶瓷材料锭的涂覆室内。 在含有氧气和惰性气体的室内建立大于0.014毫巴的绝对压力。 此后,陶瓷锭用电子束蒸发,使得蒸汽沉积在部件的表面上以在表面上形成陶瓷材料层。

    Laser irradiation induced non-skid surface layer formation on substrate
    6.
    发明授权
    Laser irradiation induced non-skid surface layer formation on substrate 有权
    激光照射引起基板上的无滑动表面层形成

    公开(公告)号:US06344246B1

    公开(公告)日:2002-02-05

    申请号:US09567537

    申请日:2000-05-10

    IPC分类号: C23C1430

    CPC分类号: C23C24/10 C23C26/02

    摘要: Robotic cladding of an underlying substrate with a composite metallic surface layer on a prepatterned interface with the substrate, is performed by a laser induced surface improvement process whereby a particulate ceramic additive introduced into a matrix mixture forms the surface layer with a permanent non-skid property bonded by intermixing of molten portions of such matrix mixture and the substrate at the interface, enhanced by prepatterning of such interface.

    摘要翻译: 通过激光诱导表面改性方法进行具有复合金属表面层的底层基底的机器人包层,其中所述复合金属表面层与所述基底的预制图案界面相接触,由此引入基质混合物中的颗粒状陶瓷添加剂形成具有永久防滑性能的表面层 通过这种界面的预制图来增强这种基质混合物的熔融部分和界面处的基底的混合。

    Apparatus and method for electron beam evaporation
    7.
    发明授权
    Apparatus and method for electron beam evaporation 失效
    电子束蒸发的装置和方法

    公开(公告)号:US06495216B2

    公开(公告)日:2002-12-17

    申请号:US08876887

    申请日:1997-06-16

    IPC分类号: C23C1430

    CPC分类号: H01J37/3053 H01J2237/3132

    摘要: Disclosed is an electron beam evaporator for installation in a vacuum apparatus which provides for variable positioning during or between applications of a coating. The apparatus has a carrier plate which is a flat hollow body, the top cover plate of which supports the evaporator. The hollow body is disposed over the bore in the tank such that it can be turned about the main axis of the bore. The component assemblies of the electron beam evaporator are vacuum-tight on the cover plate and the connecting lines are carried through the interior of the hollow body to the component assemblies.

    摘要翻译: 公开了一种用于安装在真空装置中的电子束蒸发器,其提供涂层期间或涂层之间的可变定位。 该装置具有承载板,其是平坦的中空体,其顶盖板支撑蒸发器。 中空体设置在罐中的孔上方,使得其能够围绕孔的主轴线转动。 电子束蒸发器的部件组件在盖板上是真空密封的,并且连接线穿过中空体的内部被运送到部件组件。

    Method for improving the performance of oxidizable ceramic materials in oxidizing environments
    8.
    发明授权
    Method for improving the performance of oxidizable ceramic materials in oxidizing environments 失效
    在氧化环境中提高可氧化陶瓷材料性能的方法

    公开(公告)号:US06485791B1

    公开(公告)日:2002-11-26

    申请号:US09544041

    申请日:2000-04-06

    IPC分类号: C23C1430

    摘要: Improved adhesion of thermal barrier coatings to nonmetallic substrates using a dense layer of ceramic on an underlying nonmetallic substrate that includes at least one oxidizable component. The improved adhesion occurs because the application of the dense ceramic layer forms a diffusion barrier for oxygen. This diffusion barrier prevents the oxidizable component of the substrate from decomposing. The present invention applies ceramic by a process that deposits a relatively thick and dense ceramic layer on the underlying substrate. The formation of the dense layer of ceramic avoids the problem of void formation associated with ceramic formation by most prior art thermal decomposition processes. The formation of voids has been associated with premature spalling of thermal barrier layers and other protective layers applied to substrates.

    摘要翻译: 使用包含至少一种可氧化组分的下层非金属基底上的致密陶瓷层来改善热障涂层对非金属基底的粘合性。 由于应用致密的陶瓷层形成氧的扩散阻挡层,所以发生改善的粘附。 该扩散阻挡层防止基底的可氧化成分分解。 本发明通过在下面的衬底上沉积相对厚且致密的陶瓷层的方法来应用陶瓷。 通过大多数现有技术的热分解过程,陶瓷致密层的形成避免了与陶瓷形成相关的空隙形成的问题。 空隙的形成已经与施加到基底上的热障层和其它保护层的过早剥落有关。

    Method of deposition of thin films of amorphous and crystalline microstructures based on ultrafast pulsed laser deposition
    9.
    发明授权
    Method of deposition of thin films of amorphous and crystalline microstructures based on ultrafast pulsed laser deposition 有权
    基于超快脉冲激光沉积法沉积非晶态和结晶微结构薄膜的方法

    公开(公告)号:US06312768B1

    公开(公告)日:2001-11-06

    申请号:US09508346

    申请日:2000-06-21

    IPC分类号: C23C1430

    摘要: Powerful nanosecond-range lasers using low repetition rate pulsed laser deposition produce numerous macroscopic size particles and droplets, which embed in thin film coatings. This problem has been addressed by lowering the pulse energy, keeping the laser intensity optional for evaporation, so that significant numbers of the macroscopic particles and droplets are no longer present in the evaporated plume. The result is deposition of evaporated plume on a substrate to form thin film of very high surface quality. Preferably, the laser pulses have a repetition rate to produce a continuous flow of evaporated material at the substrate. Pulse-range is typically picosecond and femtosecond and repetition rate kilohertz to hundreds of megahertz. The process may be carried out in the presence of a buffer gas, which may be inert or reactive, and the increased vapour density and therefore the collision frequency between evaporated atoms leads to the formation of nanostructured materials of increasing interest, because of their peculiar structural, electronic and mechanical properties. One of these is carbon nanotubes, which is a new form of carbon belonging to the fullerene (C60) family. Carbon nanotubes are seamless, single or multishell co-axial cylindrical tubules with or without dome caps at the extremities. Typically diameters range from 1 nm to 50 nm with a length >1 &mgr;m. The electronic structure may be either metallic or semiconducting without any change in the chemical bonding or adding of dopant. In addition, the materials have application to a wide range of established thin film applications.

    摘要翻译: 使用低重复率脉冲激光沉积的强大的纳秒范围激光器产生许多宏观尺寸的颗粒和液滴,其嵌入薄膜涂层中。 通过降低脉冲能量,保持激光强度可选择蒸发来解决这个问题,从而在蒸发的羽流中不再存在大量的宏观颗粒和液滴。 结果是将蒸发的羽毛沉积在基底上以形成非常高的表面质量的薄膜。 优选地,激光脉冲具有重复率,以在衬底处产生蒸发材料的连续流动。 脉冲范围通常是皮秒和飞秒,重复频率千赫兹到数百兆赫兹。 该方法可以在缓冲气体存在下进行,缓冲气体可以是惰性的或反应性的,并且增加的蒸气密度,因此蒸发的原子之间的碰撞频率导致形成越来越受关注的纳米结构材料,因为它们具有特殊的结构 ,电子和机械性能。 其中之一是碳纳米管,碳纳米管是属于富勒烯(C60)族的新型碳。 碳纳米管是在四肢具有或不具有圆顶盖的无缝的单壳同轴圆柱形小管。 通常,直径范围为1nm至50nm,长度> 1um。 电子结构可以是金属或半导体的,而化学键合或掺杂剂的添加没有任何变化。 此外,这些材料已经应用于广泛的已建立的薄膜应用。

    Process for the application of a transparent metal oxide layer on a film
    10.
    发明授权
    Process for the application of a transparent metal oxide layer on a film 失效
    在薄膜上施加透明金属氧化物层的方法

    公开(公告)号:US06296895B1

    公开(公告)日:2001-10-02

    申请号:US08434073

    申请日:1995-05-01

    IPC分类号: C23C1430

    摘要: A pure metal is vaporized in a receiver, and a quantity of oxygen slightly substoichiometric for the oxide is introduced. To determine the thickness of the layer deposited on the film and to control the vaporization rate, optical sensors are installed in an area where the layer, because of the presence of unoxidized metal, has sufficient absorption for optical measurement. After the determination of the transparency by the sensors, the layer is subjected to a secondary oxidation process.

    摘要翻译: 纯金属在接收器中蒸发,并且引入一定量的氧化物亚化学计量的氧气。 为了确定沉积在膜上的层的厚度并控制蒸发速率,光学传感器安装在由于存在非氧化金属而具有足够的光学测量吸收的层的区域中。 在通过传感器确定透明度之后,对该层进行二次氧化处理。