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10 条记录 (耗时 0.017 秒)

    Method and arrangement for the regulation of the layer thickness of a coating material on a web moved in its longitudinal direction
    1.
    发明申请
    Method and arrangement for the regulation of the layer thickness of a coating material on a web moved in its longitudinal direction 审中-公开
    用于调节沿其纵向方向移动的幅材上的涂层材料的层厚度的方法和布置

    公开(公告)号：US20050238795A1

    公开(公告)日：2005-10-27

    申请号：US10855984

    申请日：2004-05-26

    申请人： Hans-Georg Lotz ,  Peter Sauer ,  Gerhard Steiniger ,  Gerd Hoffmann ,  Rainer Ludwig

    发明人： Hans-Georg Lotz ,  Peter Sauer ,  Gerhard Steiniger ,  Gerd Hoffmann ,  Rainer Ludwig

    IPC分类号： C23C14/54 ,  B05B15/68 ,  B05D1/00 ,  C23C14/30 ,  C23C14/56 ,  D06H3/00 ,  G01B11/06

    CPC分类号： C23C14/562 ,  C23C14/547 ,  G01B11/0625 ,  G01B11/0683

    摘要： The invention relates to a method and an arrangement for regulating the layer thickness of a coating material on a web moved in its longitudinal direction. The thickness of the layer is measured at several sites over the width of the web and a coating installation is regulated, such that the thickness of the layer is constant over the width of the web. The thickness regulation can be attained by means of intensity variations of electron beams, which vaporize a coating material. But it is also possible that several evaporator crucibles distributed over the width of the web are heated individually, such that a uniform coating results over the width of the web. With the aid of an additional transmission measuring instrument the composition of the coating material can also be regulated, such that it is constant over the width of the web.

    摘要翻译： 本发明涉及一种用于调节沿其纵向移动的幅材上的涂层材料层厚度的方法和装置。 在幅材的宽度上的多个位置处测量层的厚度，并且调节涂层装置，使得该层的厚度在幅材的宽度上是恒定的。 厚度调节可以通过电子束的强度变化来实现，电子束使涂层材料蒸发。 但是也可能分散地加热分布在幅材宽度上的几个蒸发器坩埚，使得在幅材的宽度上产生均匀的涂层。 借助于附加的传输测量仪器，也可以调节涂层材料的组成，使得其在幅材的宽度上是恒定的。

    Process for the application of a transparent metal oxide layer on a film
    3.
    发明授权
    Process for the application of a transparent metal oxide layer on a film 失效
    在薄膜上施加透明金属氧化物层的方法

    公开(公告)号：US06296895B1

    公开(公告)日：2001-10-02

    申请号：US08434073

    申请日：1995-05-01

    申请人： Gerhard Steiniger ,  Rainer Ludwig ,  Gerd Hoffmann

    发明人： Gerhard Steiniger ,  Rainer Ludwig ,  Gerd Hoffmann

    IPC分类号： C23C1430

    CPC分类号： C23C14/547 ,  C23C14/0021 ,  C23C14/562

    摘要： A pure metal is vaporized in a receiver, and a quantity of oxygen slightly substoichiometric for the oxide is introduced. To determine the thickness of the layer deposited on the film and to control the vaporization rate, optical sensors are installed in an area where the layer, because of the presence of unoxidized metal, has sufficient absorption for optical measurement. After the determination of the transparency by the sensors, the layer is subjected to a secondary oxidation process.

    摘要翻译： 纯金属在接收器中蒸发，并且引入一定量的氧化物亚化学计量的氧气。 为了确定沉积在膜上的层的厚度并控制蒸发速率，光学传感器安装在由于存在非氧化金属而具有足够的光学测量吸收的层的区域中。 在通过传感器确定透明度之后，对该层进行二次氧化处理。

    Magnetron sputtering cathode for vacuum coating apparatus
    7.
    发明授权
    Magnetron sputtering cathode for vacuum coating apparatus 失效
    用于真空镀膜设备的磁控溅射阴极

    公开(公告)号：US4746417A

    公开(公告)日：1988-05-24

    申请号：US896927

    申请日：1986-08-15

    申请人： Dagmar Ferenbach ,  Gerhard Steiniger ,  Jurgen Muller

    发明人： Dagmar Ferenbach ,  Gerhard Steiniger ,  Jurgen Muller

    IPC分类号： C23C14/36 ,  C23C14/35 ,  H01J37/34 ,  C23C14/34

    CPC分类号： H01J37/347 ,  C23C14/35 ,  H01J37/3408 ,  H01J37/3455

    摘要： A magnetron sputtering cathode for vacuum coating apparatus has a circular target plate and at least one magnet system disposed in back of it which forms at least one endless tunnel of magnetic lines of force over the target plate. In the marginal area of the target plate there is disposed a first magnet system for the production of a first magnetic tunnel substantially concentric with the axis of rotation, and between the axis of rotation and the first magnet system there is an off-center second magnet system which produces a second magnetic tunnel extending over only a sector of the target plate. When the two magnet systems are rotated together the elements of the surface of the target plate are exposed to the product of the time of stay times the intensity such that the target plate is ablated more uniformly in the middle area and more strongly at the margin, so that a substrate field placed opposite the target plate is uniformly coated.

    摘要翻译： 用于真空涂覆装置的磁控溅射阴极具有圆形目标板和设置在其背面的至少一个磁体系统，其在目标板上形成至少一个磁力线的环形隧道。 在目标板的边缘区域中设置有用于产生与旋转轴线基本上同心的第一磁隧道的第一磁体系统，并且在旋转轴线与第一磁体系统之间存在偏心的第二磁体 该系统产生仅在目标板的扇区上延伸的第二磁通道。 当两个磁体系统一起旋转时，目标板的表面的元件暴露于停留时间乘以强度的乘积，使得靶板在中间区域更均匀地被烧蚀并且在边缘处更强烈地被烧蚀， 使得与目标板相对放置的基板场均匀地涂覆。

    Evaporation method of forming transparent barrier film
    8.
    发明授权
    Evaporation method of forming transparent barrier film 失效
    形成透明阻挡膜的蒸发方法

    公开(公告)号：US5378506A

    公开(公告)日：1995-01-03

    申请号：US58132

    申请日：1993-05-10

    申请人： Nobuhiko Imai ,  Mamoru Sekiguchi ,  Mitsuru Kano ,  Thomas Krug ,  Gerhard Steiniger ,  Andreas Meier

    发明人： Nobuhiko Imai ,  Mamoru Sekiguchi ,  Mitsuru Kano ,  Thomas Krug ,  Gerhard Steiniger ,  Andreas Meier

    IPC分类号： C08J7/04 ,  B65D65/42 ,  C23C14/08 ,  C23C14/32 ,  C23C14/56 ,  C23C16/00

    CPC分类号： B65D65/42 ,  C23C14/081

    摘要： This invention relates to a source material for vapor deposition, which is useful for forming a magnesium oxide thin film by vacuum vapor deposition process, and to a method of forming a transparent barrier film by using the magnesium oxide source material. The source material is composed of a magnesium oxide having a bulk density of 2.5 g/ml or more. This magnesium oxide can be obtained by sintering or fusing magnesium oxide material. For producing a transparent barrier film having a gas barrier property, this magnesium oxide is vapor-deposited on a surface of a transparent plastic base film by means of vacuum vapor deposition. The volume shrinkage or cracking of the evaporation source material can be avoided, thereby stabilizing the evaporation and prolonging duration of the evaporation. Further, it is possible to utilize a high power of electron beam. Since the evaporation source material is substantially free from pore, the evacuation of gas from the evaporation apparatus can be finished within a short period of time, and the vacuum degree within the evaporation apparatus can be stabilized. Since there is no splash or scattering during the evaporation., a transparent barrier film which is uniform in thickness and free from pinhole can be obtained.

    摘要翻译： 本发明涉及一种用于气相沉积的源材料，其用于通过真空气相沉积法形成氧化镁薄膜，以及通过使用氧化镁源材料形成透明阻挡膜的方法。 源材料由堆积密度为2.5g / ml以上的氧化镁构成。 该氧化镁可以通过烧结或熔融氧化镁材料得到。 为了制造具有阻气性的透明阻挡膜，通过真空气相沉积将该氧化镁气相沉积在透明塑料基膜的表面上。 可以避免蒸发源材料的体积收缩或破裂，从而稳定蒸发并延长​​蒸发的持续时间。 此外，可以利用大功率的电子束。 由于蒸发源材料基本上没有孔，所以可以在短时间内完成从蒸发装置排出的气体，并且可以使蒸发装置内的真空度稳定。 由于在蒸发期间没有飞溅或散射，可以获得厚度均匀且无针孔的透明阻挡膜。

    Apparatus for coating a web on a rotating drum by plasma assisted vapor deposition
    9.
    发明授权
    Apparatus for coating a web on a rotating drum by plasma assisted vapor deposition 失效
    用于通过等离子体辅助气相沉积在卷筒上涂布卷材的装置

    公开(公告)号：US5993622A

    公开(公告)日：1999-11-30

    申请号：US740318

    申请日：1996-10-28

    申请人： Joachim Szczyrbowski ,  Gotz Teschner ,  Gerhard Steiniger

    发明人： Joachim Szczyrbowski ,  Gotz Teschner ,  Gerhard Steiniger

    IPC分类号： C23C14/22 ,  C23C14/02 ,  C23C14/56 ,  H01J37/34 ,  C23C14/34 ,  C23C16/00

    CPC分类号： H01J37/3277 ,  C23C14/02 ,  C23C14/024 ,  C23C14/562 ,  H01J37/3405

    摘要： A crucible (4) in a vacuum chamber (3) holds material to be evaporated, such as a metal or metal oxide or a mixture of a metal and a metal oxide, and a coating roll (6) guides a film web (8) a certain distance away from the material to be evaporated. A chamber (9, 10) is provided on each side of the coating roll (6) which carries the film web (8) past the crucible (4), a magnetron cathode (11, 12) connected to a medium-frequency source (19) being provided in each chamber. Each of the two chambers (9, 10) is connected by its own channel (13, 14) to a coating zone (20) directly between the coating roll (6) and the crucible (4), and each chamber (9, 10) is connected by a pressure line (21, 22) to a source (23, 24) of process gas.

    摘要翻译： 在真空室（3）中的坩埚（4）保持待蒸发的材料，例如金属或金属氧化物或金属和金属氧化物的混合物，并且涂布辊（6）引导膜幅（8） 距离要蒸发的材料一定距离。 在涂布辊（6）的每一侧上设有一个室（9,10），该涂布辊（6）承载膜片（8）经过坩埚（4）;磁控管阴极（11,12），连接到中频源 19）设置在每个室中。 两个室（9,10）中的每一个通过其自身的通道（13,14）连接到涂布辊（6）和坩埚（4）之间的涂覆区域（20），并且每个室（9,10 ）通过压力管线（21,22）连接到处理气体的源（23,24）。