摘要:
A CMOS image sensor and a manufacturing method thereof are disclosed, by which the sensitivity characteristics of the photodiode and the operation characteristics of the MOS transistor are improved and easy and low-cost manufacturing is realized. The CMOS image sensor comprises a photodiode having a light reception surface covered by a multi-layered antireflection film which is formed by alternately depositing two or more kinds of insulating films whose refractive indexes are different; and at least one MOS transistor having diffusion layers which respectively function as source and drain areas, wherein a silicide layer is formed on each diffusion layer. The photodiode and the MOS transistor are provided on a common substrate and are electrically connected with each other.
摘要:
A frame shutter type device provides a separated well in which the storage node is located. The storage node is also shielded by a light shield to prevent photoelectric conversion.
摘要:
An image-sensing semiconductor device has, in addition to a plurality of photodiodes, a dummy photodiode. The dummy photodiode is fed with a bias repeatedly with a predetermined period, and the plurality of photodiodes are fed with a bias sequentially with a predetermined cycle. The differences between the individual output signals of the plurality of photodiodes and the output signal of the dummy photodiode are calculated sequentially by a differential amplifier.
摘要:
A planar image detector for electromagnetic radiation has radiation-sensitive pixel elements arranged in a matrix that has a surface with active pixels for imaging and a surface with correction pixels, not exposed to the radiation for generating correction signals, and with contact surfaces next to the surfaces with the pixels. The surface with the correction pixels is arranged in a different plane from the surface with the active pixels and at one of the sides of the image detector with the contact surfaces of the active pixels.
摘要:
A solid-state image sensor comprises a semiconductor substrate, a photoelectric conversion portion formed above the semiconductor substrate, and noise cancelers each formed, adjacent to the photoelectric conversion portion, on the semiconductor substrate through an insulating film, for removing noise of a signal read from the photoelectric conversion portion, wherein the semiconductor substrate has a conductive type opposite to a conductive type of a charge of the signal, and has a first region where concentration of impurities for determining the conductive type is high and a second region where concentration of the impurities on the first region is low.
摘要:
A solid-state image sensor comprises a semiconductor substrate, a photoelectric conversion portion formed above the semiconductor substrate, and noise cancelers each formed, adjacent to the photoelectric conversion portion, on the semiconductor substrate through an insulating film, for removing noise of a signal read from the photoelectric conversion portion, wherein the semiconductor substrate has a conductive type opposite to a conductive type of a charge of the signal, and has a first region where concentration of impurities for determining the conductive type is high and a second region where concentration of the impurities on the first region is low.
摘要:
Reduced size CMOS active pixel circuit uses special transistors with their gates and sources connected together. This transistor is placed at the top of the pixel.
摘要:
A CMOS sensor. The CMOS sensor comprises a substrate, a gate electrode formed on the substrate, a source/drain region formed in the substrate on one side of the gate electrode, and a sensor region formed in the substrate on another side of the gate electrode. The impurity in the source/drain region is arsenic. The source/drain further comprises a lightly doped drain region. The sensor region comprises a first doped region and a second doped region which together have a dentoid profile. The impurity in the first doped region and the second doped region is phosphorus.
摘要:
A CMOS area array sensor with reduced fixed pattern noise. Device threshold voltage variations are minimied using a Sequential Correlated Double Sampling technique in a column circuitry.
摘要:
A method and apparatus of operating a dual gate TFT electromagnetic radiation imaging device wherein the electrical conditions on each pixel are compared after exposure to radiation and during measurement. The pixel charge electrode is preset to a predetermined voltage level prior to radiation exposure so that the pixel may be operated beyond its linear operating range.