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公开(公告)号:US11871978B2
公开(公告)日:2024-01-16
申请号:US15956895
申请日:2018-04-19
Applicant: BOISE STATE UNIVERSITY
Inventor: Jim Browning , Ken Cornell
IPC: A61B18/04 , H05H1/24 , H05H1/02 , H05H1/48 , H05H1/46 , B60G7/02 , B60T1/06 , A61N1/40 , A61L2/14 , A61B90/00 , A61B18/00 , B60B27/02 , B62D7/18 , A61B34/30 , A61B17/00
CPC classification number: A61B18/042 , B60G7/02 , B60T1/06 , H05H1/02 , H05H1/2406 , H05H1/46 , H05H1/48 , A61B34/30 , A61B2017/00057 , A61B2018/00291 , A61B2018/00452 , A61B2018/00583 , A61B2018/00642 , A61B2018/00738 , A61B2090/373 , A61B2090/3735 , A61B2090/395 , A61B2090/3933 , A61B2218/007 , A61L2/14 , A61N1/40 , B60B27/02 , B60G2204/418 , B60G2206/50 , B62D7/18 , H05H1/466 , H05H1/475 , H05H2245/34
Abstract: The disclosure relates to the medical device field. In particular, the disclosure relates to a dynamically controlled plasma scalpel in combination with an imaging system to selectively remove biofilm while minimizing damage to healthy tissue. Systems and apparatuses according to the disclosure include: (1) dynamically controlled plasma scalpel, (2) biofilm imaging system, (3) computer control system, (4) three-dimensional scalpel positioning stage, and (5) biofilm detritus removal system.
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公开(公告)号:US20230354502A1
公开(公告)日:2023-11-02
申请号:US18340437
申请日:2023-06-23
Applicant: Lam Research Corporation
Inventor: Maolin Long , Yuhou Wang , Ricky Marsh , Alex Paterson
CPC classification number: H05H1/46 , H03F3/2173 , H01J37/32174 , H01J37/32183 , H05H2242/24 , H05H2242/10 , H05H1/4652 , H05H1/466
Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.
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公开(公告)号:US20240189012A1
公开(公告)日:2024-06-13
申请号:US18223924
申请日:2023-07-19
Applicant: Thomas J. SHEPERAK
Inventor: Thomas J. SHEPERAK
CPC classification number: A61B18/042 , A61L2/007 , A61N1/44 , A61N5/10 , G21K1/093 , H05H1/46 , H05H1/4645 , A61N2005/1089 , H05H1/466 , H05H2240/20 , H05H2242/26 , H05H2245/34
Abstract: A method of generating an output gas, comprising plasmatizing an input gas with RF power propagating from a tip of an electrode to form an annular plasma sheath constrained by a tube with said RF power propagating within said annular plasma sheath; and forming said output gas as said annular plasma sheath propagates away from said tip of said electrode.
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公开(公告)号:US11896283B2
公开(公告)日:2024-02-13
申请号:US17935401
申请日:2022-09-26
Applicant: INSIGHTFUL INSTRUMENTS, INC.
Inventor: Michael W. Wiltberger , Phillip Gooding , Dan E. Andersen
CPC classification number: A61B18/042 , A61B2018/0019 , A61B2018/00601 , A61B2018/144 , A61F9/0079 , A61F9/00781 , H05H1/466 , H05H2245/32
Abstract: An elongate electrode is configured to flex and generate plasma to incise tissue. An electrical energy source operatively coupled to the electrode is configured to provide electrical energy to the electrode to generate the plasma. A tensioning element is operatively coupled to the elongate electrode. The tensioning element can be configured to provide tension to the elongate electrode to allow the elongate electrode to flex in response to the elongate electrode engaging the tissue and generating the plasma. The tensioning element operatively coupled to the flexible elongate electrode may allow for the use of a small diameter electrode, such as a 5 μm to 20 μm diameter electrode, which can allow narrow incisions to be formed with decreased tissue damage. In some embodiments, the tensioning of the electrode allows the electrode to more accurately incise tissue by decreasing variations in the position of the electrode along the incision path.
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公开(公告)号:US11885315B2
公开(公告)日:2024-01-30
申请号:US17620455
申请日:2020-06-17
Applicant: THRUSTME
Inventor: Stanislav Dudin , Dmytro Rafalskyi
CPC classification number: F03H1/0081 , H05H1/466 , H05H1/4652 , B64G1/405 , H05H2242/20
Abstract: Disclosed is a radio-frequency plasma generating system including a radio-frequency generator and a plasma source, the radio-frequency generator being inductively or capacitively coupled to the plasma source through a resonant electric circuit, the radio-frequency generator being adapted to receive direct current power from a direct current power supply and for generating radio-frequency power at a frequency f, the radio-frequency power including a reactive radio-frequency power oscillating in the resonant electric circuit and an active radio-frequency power absorbed by the plasma. The radio-frequency plasma generating system includes a unit for measuring an efficiency of conversion E of direct-current power to active radio-frequency power absorbed by the plasma and a unit for adjusting the frequency f as a function of the measured efficiency of conversion E to maintain the efficiency of conversion E in a predetermined range within a RF plasma operational range.
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公开(公告)号:US20230142620A1
公开(公告)日:2023-05-11
申请号:US18048613
申请日:2022-10-21
Applicant: InfraSalience Ltd.
Inventor: Roger Caldwell
CPC classification number: C25B1/27 , C25B15/087 , C25B15/02 , C25B9/70 , C25B9/17 , H05H1/466 , C25B15/083
Abstract: The techniques described herein relate to methods for the synthesis of ammonia from nitrogen and hydrogen, the methods including use of plasma, such as a microjet plasma, in a first reaction chamber to generate a vibrationally exited nitrogen atom or nitrogen containing molecule, optionally wherein the excited nitrogen atom or molecule is reacted with hydrogen in an aqueous medium, optionally wherein the medium is then recycled to remove soluble products. A system for carrying out such methods is also provided.
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公开(公告)号:US12083237B2
公开(公告)日:2024-09-10
申请号:US17053918
申请日:2019-05-08
Applicant: NOVAGREEN TECHNOLOGIES LTD.
Inventor: Amnon Lam , Eliezer Fuchs
CPC classification number: A61L2/14 , H01J37/32 , H05H1/466 , A61L2202/11 , A61L2202/122 , A61L2202/16
Abstract: Device and method suitable for disinfecting herbs in small quantities, e.g. for home use, using plasma, are disclosed. The device comprises a sealable vessel dimensioned and configured to contain herbs in chunks, in granular form such as particles or in powder, in a treatment region of the sealable vessel. The device further comprises a power source configured to generate electromagnetic (EM) power sufficient for plasma generation in a plasma generation region of the sealable vessel. The sealable vessel is optionally detachable from the device. A portable sealable vessel configured to store and transport herbs, the herbs being microbially sealed therein, is also disclosed. The portable sealable vessel may be positioned in a slot of the device so as to generate plasma in the portable sealable vessel and disinfect the herbs. A multi-slot device is also disclosed, enabling plasma disinfection of herbs in a multitude of distinct sealable vessels.
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公开(公告)号:US12048910B2
公开(公告)日:2024-07-30
申请号:US17258881
申请日:2019-07-11
Inventor: Qi Hua Fan , Martin E. Toomajian , Thomas Schuelke
CPC classification number: B01J19/088 , B01J19/006 , B01J20/20 , B01J20/3416 , C01B32/366 , H05H1/466 , B01J2219/0894
Abstract: A vertically oriented plasma reactor is provided. In another aspect, a plasma reactor includes a vertically elongated vacuum chamber, a wall internally projecting within a middle section of the housing, magnets, electrodes and a radio frequency source. A further aspect employs a workpiece-entry port and an opposite workpiece material-exit port, with one located adjacent a top end and the other adjacent a bottom end of a vertically elongated reactor housing or vacuum chamber. Yet another aspect employs a moving or falling-bed plasma reactor for use in activating biochar material.
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公开(公告)号:US20230413413A1
公开(公告)日:2023-12-21
申请号:US18306786
申请日:2023-04-25
Applicant: Plasmology4, Inc.
Inventor: Gregory A. Watson
CPC classification number: H05H1/46 , A61L2/0011 , A61N1/44 , H05H2240/20 , H05H2277/10 , H05H1/466 , H05H1/4652 , H05H1/4697
Abstract: A method for generating atmospheric pressure cold plasma inside a hand-held unit discharges cold plasma with simultaneously different rf wavelengths and their harmonics. The unit includes an rf tuning network that is powered by a low-voltage power supply connected to a series of high-voltage coils and capacitors. The rf energy signal is transferred to a primary containment chamber and dispersed through an electrode plate network of various sizes and thicknesses to create multiple frequencies. Helium gas is introduced into the first primary containment chamber, where electron separation is initiated. The energized gas flows into a secondary magnetic compression chamber, where a balanced frequency network grid with capacitance creates the final electron separation, which is inverted magnetically and exits through an orifice with a nozzle. The cold plasma thus generated has been shown to be capable of accelerating a healing process in flesh wounds on animal laboratory specimens.
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公开(公告)号:US11793103B2
公开(公告)日:2023-10-24
申请号:US16571244
申请日:2019-09-16
Applicant: Applied Quantum Engeries, LLC
Inventor: Benjamin Wolfe , George Paskalov , Rick Jarvis , Jerzy P. Puchacz
CPC classification number: A01C1/08 , A01C1/00 , A61L2/14 , H01J37/32 , H05H1/46 , A23B9/02 , A23B9/025 , A23B9/18 , A61L2202/16 , H05H1/466 , H05H2242/26
Abstract: Methods and apparatuses to activate, modify, and sanitize the surfaces of granular, powdered, or seed material placed in a continuous flow of a low-temperature, reduced-pressure gas plasma. Said plasma may be created with radio-frequency power, using capacitive-inductive, or a combination of both types of discharge. The plasma is generated at pressures in the 0.01 to 10 Torr range. RF frequency ranges from 0.2 to 220 MHz, and correspond to a plasma density between about ne×108-ne×1012 or 0.001 to 0.4 W/cm3. Inserts and electrodes may be temperature controlled to control process conditions. RF discharge may be pulsed or modulated by different frequency in order to stimulate energy exchange between gas plasma and process material. The apparatuses may be grounded, biased and mechanically activated (e.g., vibration, rotation, etc.).
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