公开(公告)号：US20230285927A1

公开(公告)日：2023-09-14

申请号：US18020002

申请日：2021-08-04

申请人： NANOPLAZZ TECHNOLOGIES LTD.

发明人： Dmitry MEDVEDEV ,  Mikhail MARIN ,  Evgeny GORELIK ,  Boris MISLAVSKY ,  Roman ILIEV

IPC分类号： B01J19/08 ,  H05H1/24 ,  H02M7/5387 ,  C01B32/40 ,  C01B3/34 ,  C01B3/24 ,  C01B3/04 ,  C01B17/04 ,  C01C1/04 ,  C07C2/80

CPC分类号： B01J19/088 ,  H05H1/24 ,  H02M7/5387 ,  C01B32/40 ,  C01B3/342 ,  C01B3/24 ,  C01B3/047 ,  C01B17/0495 ,  C01C1/0494 ,  C07C2/80 ,  H05H2245/10 ,  H05H2242/22 ,  B01J2219/0896 ,  B01J2219/0869 ,  B01J2219/0809 ,  B01J2219/083 ,  B01J2219/0875 ,  C01B2203/0222 ,  C01B2203/0272 ,  C01B2203/1241

摘要： The present disclosure is related to the field of chemistry and provides methods and devices for stimulation of endothermic reactions in gas phase with high activation barriers by nanosecond pulsed electrical discharge. It can be used for, e.g., CO2 functionalization of methane, H2S dissociation, hydrogen and syngas production, for processing ammonia synthesis and dissociation, etc. Some embodiments include methods and devices associated with the stimulation of plasma chemical reactions with nanosecond pulse electric discharge in the presence of gas flow.

公开(公告)号：US12058801B2

公开(公告)日：2024-08-06

申请号：US18538270

申请日：2023-12-13

申请人： PLASMA SURGICAL, INC.

发明人： Nikolay Suslov

IPC分类号： H05H1/46 ,  H05H1/02 ,  H05H1/54

CPC分类号： H05H1/46 ,  H05H1/02 ,  H05H1/54 ,  H05H2242/22

摘要： Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.

公开(公告)号：US20230232522A1

公开(公告)日：2023-07-20

申请号：US18098820

申请日：2023-01-19

申请人： Ken Gen Energy, LLC

发明人： Robert H. Burgener, II ,  Shane L. Luke ,  Troy Berneck Atkin

IPC分类号： H05H1/48 ,  H05H1/46

CPC分类号： H05H1/48 ,  H05H1/4645 ,  H05H2242/22 ,  H05H2242/24

摘要： Energy is generated from pulsed electric power sources applied to a gas medium that includes hydrogen. A sealed reactor chamber contains hydrogen. A plasma power supply, such as a DC, AC, or RF power supply, generates a plasma inside the chamber. The pulse energy generator systems use pulsed electric power for the conversion of molecular hydrogen into atomic hydrogen. An inner surface of the reactor chamber is coated with a catalyst to facilitate the reformation of molecular hydrogen from atomic hydrogen under conditions that release excess energy. The catalyst may include tungsten, nickel, titanium, platinum, palladium, and mixtures thereof. A plasma pulse controller connected to the plasma power supply turns the power supply on and off to generate plasma pulses inside the reactor chamber. A pulse time duration may range from 1 nanosecond to 1 millisecond and a dead time between pulses may range from 20 milliseconds to 0.3 seconds.

公开(公告)号：US20230225041A1

公开(公告)日：2023-07-13

申请号：US18114023

申请日：2023-02-24

申请人： PLASMA SURGICAL INVESTMENTS LIMITED

发明人： Nikolay SUSLOV

IPC分类号： H05H1/46 ,  H05H1/54 ,  H05H1/02

CPC分类号： H05H1/46 ,  H05H1/54 ,  H05H1/02 ,  H05H2242/22

摘要： Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.

公开(公告)号：US20240316494A1

公开(公告)日：2024-09-26

申请号：US18578877

申请日：2022-07-08

申请人： DAPHNE TECHNOLOGY SA

发明人： Juan Mario Michan ,  William Jamieson Ramsay ,  Dominik Neumayr

IPC分类号： B01D53/32 ,  F01N3/08 ,  H05H1/24

CPC分类号： B01D53/32 ,  F01N3/0892 ,  H05H1/2406 ,  B01D2257/504 ,  B01D2258/01 ,  B01D2258/02 ,  B01D2258/06 ,  B01D2259/818 ,  H05H2242/22 ,  H05H2245/17

摘要： There is provided a dielectric barrier electrical discharge apparatus and corresponding system and method. The apparatus comprises: at least two electrodes arranged in use to provide at least one anode and at least one cathode, the at least two electrodes being separated to allow a fluid to be present between the electrodes in use, and at least one of the electrodes has a dielectric portion connected to at least part of said electrode; a sub-macroscopic structure connected to at least one of the at least two electrodes and/or to the dielectric portion; and a drive circuit connected to each of the at least two electrodes and arranged in use to establish an electric field between the electrodes, wherein in response to the presence of the electric field between the electrodes, the sub-macroscopic structure is arranged to field-emit electrons and electrical discharge is establishable between the dielectric portion and one of the at least two electrodes, and the drive circuit is further arranged to provide real power to the fluid in use.

公开(公告)号：US12075551B2

公开(公告)日：2024-08-27

申请号：US17783576

申请日：2020-12-17

申请人： TDK Electronics AG

发明人： Alexander Melischnig ,  Markus Puff ,  Robert Krumphals ,  Amnon Lam ,  Eliezer Fuchs ,  Betsalel Rechav

IPC分类号： H05H1/24

CPC分类号： H05H1/2481 ,  H05H2242/22

摘要： A method of operating a piezoelectric plasma generator including applying an input signal to a piezoelectric transformer of the piezoelectric plasma generator. An absolute value of a peak amplitude of the input signal is periodically reduced and increased to a level smaller and larger than an ignition voltage of the plasma generator, such that plasma generation periodically collapses.

公开(公告)号：US20240282494A1

公开(公告)日：2024-08-22

申请号：US18248329

申请日：2022-07-06

申请人： SYNCHROTRON SOLEIL

发明人： Olivier MARCOUILLE ,  Arnaud MARY ,  Marie-Emmanuelle COUPRIE ,  Keihan TAVAKOLI

IPC分类号： H05H13/04 ,  H01F7/02

CPC分类号： H05H13/04 ,  H01F7/021 ,  H01F7/0221 ,  H05H2242/22

摘要： A two-period inverter, including a series of permanent magnets with a spatial periodicity of λ0 or (2n+1)λ0 or 2nλ0 along a longitudinal axis Y and first moving apparatus arranged to modify along the axis Y, with respect to a reference position along the axis Y, the relative position of the first and second series, which move as one, with respect to the position of the third and fourth series, which move as one, by a distance (2n+1)λ0/2 or (2n−1)λ0/2, so that the inverter is placed in an offset position along the axis Y is discussed.

公开(公告)号：US20230208130A1

公开(公告)日：2023-06-29

申请号：US17998572

申请日：2021-05-12

申请人： Neutron Therapeutics Inc.

发明人： Tyler R. Wills ,  William H. Park

IPC分类号： H02H7/00 ,  H05H5/04

CPC分类号： H02H7/003 ,  H05H5/04 ,  H05H2242/22

摘要： An over-voltage protection system for an accelerator can include: a plurality of DC power supplies configured to provide a plurality of voltage levels up to a desired voltage level; and an acceleration tube electrically connected to the plurality of DC power supplies and configured to accelerate a charged particle. The acceleration tube can include a plurality of stages. Each stage can include a plurality of electrodes and a plurality of varistors configured to discharge energy in response to an overvoltage event. One electrode of the plurality of electrodes can be electrically coupled to a voltage level of the plurality of voltage levels. The plurality of electrodes and the plurality of varistors can be electrically coupled to each other and arranged in an alternating fashion.

公开(公告)号：US20240147599A1

公开(公告)日：2024-05-02

申请号：US18538270

申请日：2023-12-13

申请人： PLASMA SURGICAL, INC.

发明人： Nikolay SUSLOV

IPC分类号： H05H1/46 ,  H05H1/02 ,  H05H1/54

CPC分类号： H05H1/46 ,  H05H1/02 ,  H05H1/54 ,  H05H2242/22

摘要： Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.

公开(公告)号：US11882643B2

公开(公告)日：2024-01-23

申请号：US18114023

申请日：2023-02-24

申请人： Plasma Surgical, Inc.

发明人： Nikolay Suslov

IPC分类号： H05H1/46 ,  H05H1/02 ,  H05H1/54

CPC分类号： H05H1/46 ,  H05H1/02 ,  H05H1/54 ,  H05H2242/22

摘要： Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.