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1.
公开(公告)号:US20240343996A1
公开(公告)日:2024-10-17
申请号:US18633061
申请日:2024-04-11
申请人: ECOLAB USA INC.
CPC分类号: C11D1/722 , C11D3/0073 , C11D3/08 , C11D3/10 , C11D3/2086 , C11D3/33 , C11D3/3761 , C11D17/0073
摘要: Solid cleaning compositions having optimal dissolution rate of about 1 gram over 1-10 minutes and stability are disclosed. Solid cleaning compositions contain alcohol alkoxylate surfactants with EO of 6 or less and PO of 2 or greater, an alkalinity source(s), a builder, and optional additional functional ingredients are disclosed. Methods of providing concentrate and/or use solutions of the solid cleaning compositions and methods of use thereof are also provided.
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公开(公告)号:US20240306643A1
公开(公告)日:2024-09-19
申请号:US18605976
申请日:2024-03-15
申请人: ECOLAB USA INC.
发明人: Victor Fuk-Pong Man , Gang Pu , Mark Schomers
IPC分类号: A01N59/00 , A01N25/12 , A01P1/00 , A61L2/18 , A61L101/02 , C11D1/72 , C11D3/04 , C11D3/20 , C11D3/33 , C11D3/48
CPC分类号: A01N59/00 , A01N25/12 , A61L2/18 , C11D1/72 , C11D3/044 , C11D3/2044 , C11D3/33 , C11D3/48 , A01P1/00 , A61L2101/02
摘要: Solid compositions having a caustic source and polyol with a caustic:water weight ratio in the solid composition between 60:40 to less than about 70:30 are provided. Methods of making the solid compositions using a concentrated alkali metal hydroxide beneficially reduces or eliminates the use of solid caustic beads commonly used to make solid caustic compositions for use in cleaning, sanitizing, and disinfecting.
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公开(公告)号:US20240286992A1
公开(公告)日:2024-08-29
申请号:US18572737
申请日:2022-06-13
申请人: INNOSPEC LIMITED
发明人: Matthew Robert GILES
IPC分类号: C07C229/24 , C11D3/20 , C11D3/33 , C11D11/00
CPC分类号: C07C229/24 , C11D3/2082 , C11D3/33 , C11D11/0082
摘要: An adduct of ethylenediamine disuccinic acid or a salt thereof and a further polycarboxylic acid or a salt thereof wherein the further polycarboxylic acid is selected from citric acid, polyaspartic acid, tartaric acid, malonic acid, maleic acid, carboxymethyl inulin, oxalic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, malic acid and fumaric acid; and wherein said adduct is in the form of a free flowing particulate solid; wherein EDDS is present in the adduct in a molar excess compared with the further polycarboxylic acid.
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4.
公开(公告)号:US20240263897A1
公开(公告)日:2024-08-08
申请号:US18564041
申请日:2022-01-14
IPC分类号: F28G15/00 , C11D1/22 , C11D1/83 , C11D3/06 , C11D3/20 , C11D3/33 , C11D3/36 , C11D3/39 , F28G9/00
CPC分类号: F28G15/003 , C11D1/22 , C11D1/83 , C11D3/06 , C11D3/2065 , C11D3/33 , C11D3/364 , C11D3/3942 , F28G9/00 , C11D2111/20
摘要: A method is used for cleaning heat exchanger systems. The method is performed at a computer system having one or more processors and memory storing one or more programs configured for execution by the one or more processors. The method determines component percentages of a cleaning solution based, at least in part, on operational parameters of a heat exchanger system. The operational parameters include chemical composition of fluids passing through the heat exchanger system and operating temperatures of the fluids passing through the heat exchanger system. The component percentages of the cleaning solution include: (1) hydrogen peroxide. 2-90 wt. %: (2) a complexing agent. 3-30 wt. %: (3) water-soluble calixarene. 0.01-10 wt. %; and (4) water. The complexing agent includes a polybasic organic acid or a sodium salt thereof, or a derivative of phosphorous acid.
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5.
公开(公告)号:US20240209284A1
公开(公告)日:2024-06-27
申请号:US18533556
申请日:2023-12-08
申请人: FUJIFILM Corporation
发明人: Naotsugu MURO , Tadashi Inaba , Tetsuya Kamimura
CPC分类号: C11D1/22 , C11D3/2082 , C11D3/2086 , C11D3/33 , C11D3/361 , C11D3/364 , H01L21/02074
摘要: The present invention provides a cleaning composition having excellent storage stability, a cleaning method of a semiconductor substrate, and a manufacturing method of a semiconductor element. The cleaning composition of the present invention contains a polycarboxylic acid, a chelating agent, a sulfonic acid having an alkyl group having 9 to 18 carbon atoms, and water, in which a mass ratio of the polycarboxylic acid to the chelating agent is 10 to 200, a mass ratio of the polycarboxylic acid to the sulfonic acid is 70 to 1,000, a pH is 0.10 to 4.00, and an electrical conductivity is 0.08 to 11.00 mS/cm.
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6.
公开(公告)号:US11939556B2
公开(公告)日:2024-03-26
申请号:US17216104
申请日:2021-03-29
摘要: An aqueous cleaning composition, which may be suitable for use in cleaning hard surfaces, is described. The aqueous cleaning composition includes an ionic liquid solvent, an amino alcohol, and a substantial amount of water. The cleaning compositions may also include a disinfecting quaternary surfactant, a nonionic surfactant, such as an ethoxylated alcohol and/or alkyl polyglycoside, and/or a chelating agent, such as an aminopolycarboxylate chelating agent.
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公开(公告)号:US11898123B2
公开(公告)日:2024-02-13
申请号:US17458671
申请日:2021-08-27
发明人: Emil A. Kneer , Thomas Dory , Atsushi Mizutani
CPC分类号: C11D3/33 , C11D3/0047 , C11D3/0073 , C11D3/28 , C11D3/3409 , C11D3/43 , C11D11/0047
摘要: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 3) at least one corrosion inhibitor, the corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one sulfonic acid; and 5) water.
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8.
公开(公告)号:US11891586B2
公开(公告)日:2024-02-06
申请号:US17656512
申请日:2022-03-25
申请人: ECOLAB USA INC.
发明人: Amanda Bakken , Mark D. Levitt , Avila Abelseth
CPC分类号: C11D1/22 , C11D3/2065 , C11D3/33 , C11D3/43
摘要: The present disclosure relates to multi-purpose cleaning compositions, methods of manufacturing the multi-purpose cleaning compositions, and methods of using the multi-purpose cleaning compositions to clean a surface. Beneficially the multi-purpose cleaning compositions are capable of removing soil and providing antimicrobial activity. The compositions are especially useful on hard surfaces and are preferably low streaking.
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公开(公告)号:US20230416658A1
公开(公告)日:2023-12-28
申请号:US18211863
申请日:2023-06-20
发明人: Ronald Hage , Yfranka Roelofsen , Judith Preuschen , Rolf Ludwig , Paul Kaufmann
CPC分类号: C11D17/06 , C11D11/0023 , C11D11/0082 , C11D3/2079 , C11D3/349 , C11D3/222 , C11D3/33 , C11D3/3753 , C11D3/3951 , C11D3/3953
摘要: The present invention concerns a composition comprising Mn(II) acetate, a protonated salt of a cyclic triamine, a polysaccharide absorbent, and a water-soluble polymer, e.g. polyvinylalcohol. The invention also concerns a method of making such compositions, preferably in the form of a granule, and bleaching formulations comprising the salt and a peroxy compound or precursor thereof. The protonated ligand salt and Mn(II) acetate containing composition and formulations comprising it, are suitable for use in catalysing oxidation, for example as a component of a laundry or dishwasher bleaching composition. The invention further relates to cleaning agents comprising the compositions described herein.
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10.
公开(公告)号:US20230399587A1
公开(公告)日:2023-12-14
申请号:US18250134
申请日:2021-10-22
发明人: Dennis Eisert , Bastian Wulff , Matthias Springer
CPC分类号: C11D3/361 , C11D11/0029 , C11D3/364 , C11D3/365 , C11D3/221 , C11D3/33 , C11D3/3719
摘要: Liquid cleaning agent concentrate comprising: a. at least one phosphonate, b. a first complexing agent selected from aminopolycarboxylic acids, hydroxycarboxylic acids, hydroxypolycarboxylic acids and their salts, and c. at least one enzyme, preferably proteolytic enzyme, a pH of the liquid cleaning agent concentrate being 9 or >9. The invention also relates to a ready-to-use solution; to uses thereof for cleaning and/or disinfecting objects and to cleaning methods.
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