摘要:
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
摘要:
There is described a signing film wherein provided on a background of the signing film is a decorative printing which forms a security feature and which fluoresces when viewed under UV light. So that the decorative printing which fluoresces under UV light is not to be perceived when viewing the surface of the signing film at different viewing angles in ambient light, it is proposed that the background of the signing film has at least two background layers and between them the decorative printing comprising a lacquer which contains a high-viscosity binding agent and is mixed with pigments which fluoresce under UV light, so that after the printing operation and the drying operation it is of a small layer thickness as a consequence of the high viscosity.
摘要:
The invention mainly intends to provide a resist material that is high in the sensitivity to light and an electron beam and enables to form a clear and fine pattern with less exposure. In order to achieve the object, the invention provides a resist material comprising a metal compound, wherein a metal element constituting the metal compound is a 14th group or 15th group metal element and the metal compound is a stoichiometrically incomplete compound.
摘要:
Photoresists of the invention contain an added acid reaction component together with one or more resins and a photoactive component. Preferred photoresists of the invention can provide processes substrates such as microelectronic wafers with desired iso-dense bias values. Particularly preferred photoresists of the invention are chemically-amplified positive-acting resists and contain an ester-based solvent such as ethyl lactate or propylene glycol methyl ether acetate in addition to the acid reaction component.
摘要:
Substrates for imageable elements are disclosed. The substrates comprise, in order, an aluminum or aluminum alloy support, a silicate layer, and a layer of interlayer material. The interlayer material is a co-polymer that comprise (1) phosphonic acid groups and/or phosphate groups and (2) acid groups and/or groups that comprise ethylene glycol or polyethylene glycol side chains. Imageable elements that comprise an imageable layer over the interlayer material are useful as lithographic printing plate precursors.
摘要:
The present disclosure discloses a color former phase. According to one exemplary embodiment discussed herein, an exemplary color former phase includes at least one color former, a radiation absorber, and an acrylic resin, in which the color former, the radiation absorber, and the acrylic resin form an amorphous solid.
摘要:
A thermal donor element having a dye layer on an extruded substrate, wherein the extruded substrate includes a polyester-containing material and a slip agent, but does not contain silica particles, is disclosed.
摘要:
An exemplary method for manufacturing photoresist includes the steps of: adding a metal salt into an aqueous solution, whereby the aqueous solution contains metallic ions (211); adding a sulfide containing sulfur ions (231) into the aqueous solution; adding a polymerizable surfactant (220) into the aqueous solution thereby forming metallic ion reverse micelles (210) and sulfur ion reverse micelles (230); reacting the metallic ion reverse micelles and the sulfur ion reverse micelles to create monomeric sulfureted metal nanoparticle reverse micelles (240); aggregating the monomeric sulfureted metal nanoparticle reverse micelles to polymeric macromolecular nanoparticles; and doping the polymeric macromolecules nanoparticles into a base material in order to obtain the photoresist having sulfureted metal nanoparticles. A diameter of the nanoparticles is in the range from 1×10−9 meters to 1×10−7 meters.
摘要:
The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 μm and optionally laminate a protective film onto the photocurable composition layer to obtain a dry film resist; whereby the photocurable resin is formed from a homogeneous mixture comprising (a) from 20–90 wt % of an alkaline soluble binder oligomer or polymer; (b) from 5 to 60 wt % of one or more photopolymerizable monomers which are compatible with the oligomers and polymers of component (a); (c) from 0.01 to 20% by weight of one or more photoinitiators; (d) from 0 to 20% by weight of additives and/or assistants; and (e) from 0.1 to 10% by weight of a leuco triphenylmethane dye of the formula (I), wherein R1 is a residue selected from (II), R2 is C1–C12 alkyl or phenyl which may be mono-, di- or tri-substituted by C1–C6 alkyl, trifluoromethyl, C1-6 alkoxy, C1-6 alkylthio, halogen and nitro; R3 is hydrogen or C1–C12 alkyl; R4 to R9 independently of one another are hydrogen or C1–C12 alkyl; X is O, S, NH or N—C1–C12-alkyl; (a) to (e) being 100% by weight. The above composition is useful to avoid unfavourable colour generation during the heat lamination
摘要翻译:本发明涉及一种制备干膜抗蚀剂的方法,该方法是将光固化性树脂组合物形成在厚度为1〜50μm的载体膜上,任选地将保护膜层叠在光固化性组合物层上,得到干膜抗蚀剂; 由此可光固化树脂由包含(a)20-90重量%的碱溶性粘合剂低聚物或聚合物的均匀混合物形成; (b)5至60重量%的与组分(a)的低聚物和聚合物相容的一种或多种可光聚合单体; (c)0.01至20重量%的一种或多种光引发剂; (d)0至20重量%的添加剂和/或助剂; 和(e)0.1至10重量%的式(I)的无色三苯甲烷染料,其中R 1是选自(II),R 2 O / 是C 1 -C 12烷基或可以被C 1 -C 1亚烷基取代的苯基, C 1-6烷基,三氟甲基,C 1-6烷氧基,C 1-6烷基硫基,卤素和硝基; R 3是氢或C 1 -C 12烷基; R 3是氢或C 1 -C 12烷基; R 9与R 9彼此独立地是氢或C 1 -C 12烷基; X是O,S,NH或N-C 1 -C 12 - 烷基; (a)至(e)为100重量%。 上述组合物可用于在热层压期间避免不利的颜色产生
摘要:
A sheet with anti-counterfeit functions for making counterfeiting highly difficult in the case where authentication information is recorded using the properties of cholesteric liquid crystal is provided. A cholesteric liquid crystal layer 110 having a selective reflected wavelength band in at least the visible light region is provided in such a manner that this cholesteric liquid crystal layer 110 is a single layer of which thickness is approximately uniform, and an authentication region 112 of which selective reflected wavelength band is different is provided in at least one place. Preferably, an adhesive layer 130 is provided on one side of the cholesteric liquid crystal layer 110. Preferably, a base 120 is provided between the cholesteric liquid crystal layer 110 and the adhesive layer 130. Preferably, a light absorbing layer 140 is provided on adhesive layer 130 of the cholesteric liquid crystal layer 110.