公开(公告)号：WO2022231862A1

公开(公告)日：2022-11-03

申请号：PCT/US2022/024832

申请日：2022-04-14

Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA

Inventor： GONEN, Tamir

IPC: H01J37/26 ,  H01J37/02 ,  H01J37/295 ,  H01J37/28 ,  H01J37/244

Abstract: An integrated microcrystal electron diffraction system and method are provided that include an electron source, a sample assembly configured to retain a sample, a camera assembly, and a control system. The control system pre-screens the sample on the sample assembly, collects image data of the sample via the camera assembly, and outputs microcrystal electron diffraction data based on the image data. Pre-screening includes capturing at least one pre-screen diffraction image of the sample; determining a position for the sample for imaging based on the at least one pre-screen diffraction image; and controlling the sample assembly to position the sample at the position. Collecting the image data includes generating an electron beam towards the sample at the position; rotating the sample assembly; and capturing, by the camera assembly, scatterings of the electron beam by the sample as diffraction images while the sample assembly is rotated.

公开(公告)号：WO2022058424A1

公开(公告)日：2022-03-24

申请号：PCT/EP2021/075476

申请日：2021-09-16

Applicant: CARL ZEISS SMT GMBH

Inventor： GUENTNER, Jan ,  RHINOW, Daniel ,  MARBACH, Hubertus ,  AUTH, Nicole

IPC: H01J37/02 ,  H01J37/09

Abstract: What is proposed is an apparatus (100) for analysing and/or processing a sample (10) with a particle beam (110), comprising:a providing unit (106) for providing the particle beam (110); a shielding element (202) for shielding an electric field (E) generated by charges (Q) accumulated on the sample (10), wherein the shielding element (202) has a through opening (206) for the particle beam (110) to pass through towards the sample (10); a detecting unit (112) configured to detect an actual position of the shielding element (202); and an adjusting unit (600) for adjusting the shielding element (202) from the actual position into a target position.

公开(公告)号：WO2021123075A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/086903

申请日：2020-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： FANG, Wei ,  ZHOU, Zhengwei ,  PU, Lingling

IPC: H01J37/02 ,  H01J37/26 ,  H01J37/317 ,  H01J2237/0435 ,  H01J2237/2817 ,  H01J2237/31774 ,  H01J37/3177

Abstract: A system and method for defect inspection using voltage contrast in a charged particle system are provided. Some embodiments of the system and method include positioning the stage at a first position to enable a first beam of the plurality of beams to scan a first surface area of the wafer at a first time to generate a first image associated with the first surface area; positioning the stage at a second position to enable a second beam of the plurality of beams to scan the first surface area at a second time to generate a second image associated with the first surface area; and comparing the first image with the second image to enable detecting whether a defect is identified in the first surface area of the wafer.

公开(公告)号：WO2020096724A1

公开(公告)日：2020-05-14

申请号：PCT/US2019/055418

申请日：2019-10-09

Applicant: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.

Inventor： ASADIZANJANI, Navid ,  WOODARD, Damon ,  FORTE, Domenic J. ,  WILSON, Ronald

IPC: G06K9/03 ,  G06K9/20 ,  G06K9/62 ,  G06T7/11 ,  G01N21/95 ,  H01J37/02

Abstract: A histogram-based method for auto segmentation of integrated circuit structures is disclosed. The method includes an auto-segmentation process/algorithm, which works on the histogram of the SEM image and does not try to model the noise sources or the features. The auto-segmentation process/algorithm extracts the number of peaks in the histogram from low magnification SEM images or SEM images not necessarily having high quality images, significantly simplifies the traditionally lengthy and expensive IC reverse engineering efforts. Hence, the size of the image does not affect the final segmentation. The auto-segmentation process/algorithm performs the steps of: extract a first histogram from the first SEM image; identifying boundaries of the plurality of structural elements in the IC based at least in part on an output of the first histogram; and auto-segmenting the first SEM image into the plurality of structural elements.

公开(公告)号：WO2020052943A1

公开(公告)日：2020-03-19

申请号：PCT/EP2019/072678

申请日：2019-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  YE, Ning ,  HUANG, Danjing ,  CHAN, Bin-Da

IPC: H01J37/22 ,  H01J37/02 ,  G01J1/42

Abstract: A system and a method for monitoring a beam (322) in an inspection system are provided. The system includes an image sensor (360) configured to collect a sequence of images of a beam spot of a beam formed on a surface (340), each image of the sequence of images having been collected at a different exposure time of the image sensor, and a controller (380) configured to combine the sequence of images to obtain a beam profile of the beam.

公开(公告)号：WO2018031174A2

公开(公告)日：2018-02-15

申请号：PCT/US2017/041740

申请日：2017-07-12

Applicant: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.

Inventor： ZHANG, Xiaoguang ,  LI, Xianqi ,  LI, An-Ping ,  ZHANG, Hao ,  CHEN, Yunmei

IPC: H01J37/02 ,  H04N5/222

Abstract: Disclosed here is a scanning probe microscope system and method for operating the same for producing scanning probe microscope images at fast scan rates and reducing oscillation artifacts. In some embodiments, an inverse consistent image registration method is used to align forward and backward scan traces for each line of the scanning microscope image. In some embodiments, the aligned forward and backward scan traces are combined using a weighting factor favoring the scan trace with higher smoothness. In some embodiments, the scanning probe microscope image is a potentiometry map and a method is provided to extract from the potentiometry map a conductivity map.

公开(公告)号：WO2017196934A1

公开(公告)日：2017-11-16

申请号：PCT/US2017/031894

申请日：2017-05-10

Applicant: ENTEGRIS, INC.

Inventor： CHAMBERS, Barry Lewis ,  TAOYUAN, Bling-Tsair Tien ,  SWEENEY, Joseph D. ,  TANG, Ying ,  BYL, Oleg ,  BISHOP, Steven E. ,  YEDAVE, Sharad N.

IPC: H01J37/02 ,  H01J37/317

CPC classification number: H01J37/3171 ,  C09D1/00 ,  C09D5/24 ,  H01J37/026 ,  H01J37/3244 ,  H01J2237/006 ,  H01J2237/022 ,  H01L21/265 ,  H01L21/67213

Abstract: Compositions, methods, and apparatus are described for carrying out nitrogen ion implantation, which avoid the incidence of severe glitching when the nitrogen ion implantation is followed by another ion implantation operation susceptible to glitching, e.g., implantation of arsenic and/or phosphorus ionic species. The nitrogen ion implantation operation is advantageously conducted with a nitrogen ion implantation composition introduced to or formed in the ion source chamber of the ion implantation system, wherein the nitrogen ion implantation composition includes nitrogen (N 2 ) dopant gas and a glitching-suppressing gas including one or more selected from the group consisting of NF 3 , N 2 F 4 , F 2 , SiF4, WF 6 , PF 3 , PF 5 , AsF 3 , AsF 5 , CF 4 and other fluorinated hydrocarbons of C x F y (x≥1, y≥1) general formula, SF 6 , HF, COF 2 , OF 2 , BF 3 , B 2 F 4 , GeF 4 , XeF 2 , O 2 , N 2 O, NO, NO 2 , N 2 O 4 , and O 3 , and optionally hydrogen-containing gas, e.g., hydrogen-containing gas including one or more selected from the group consisting of H 2 , NH 3 , N 2 H 4 , B 2 H 6 , AsH 3 , PH 3 , SiH 4 , Si 2 H 6 , H 2 S, H 2 Se, CH 4 and other hydrocarbons of C x H y (x≥1, y≥1) general formula and GeH 4 .

Abstract translation: 描述了用于进行氮离子注入的组合物，方法和设备，其避免了在氮离子注入之后进行另一离子注入操作易受到毛刺影响的严重毛刺的发生，例如植入 砷和/或磷离子物质。 氮离子注入操作有利地利用引入或形成在离子注入系统的离子源室中的氮离子注入组合物来进行，其中氮离子注入组合物包括氮（N 2）掺杂剂气体 以及包含选自由NF 3，N 2，F 4，F 2组成的组中的一种或多种的抑制脉冲的气体 SiF4，WF6，PF3，PF5，AsF3，AsF _{5，CF 4和其它C≡FY（x≥1，y≥1）的氟化烃通式 ，SF 6，HF，COF 2，OF 2，BF 3，B 2， subF 4，GeF 4，XeF 2 0，O 2，N 2，...，sub / 2， > O，NO，NO 2，N 2 O 4和O 3，以及任选含有氢的 气体，例如含氢气体，包括选自由以下组成的组中的一种或多种： H 2，NH 3，N 2，H 4，B 2，H 4， AsH 3，PH 3，SiH 4，Si 2 H 的其它烃 > H （x≥1，y≥1）通式和GeH 4 。}

公开(公告)号：WO2017183980A2

公开(公告)日：2017-10-26

申请号：PCT/NL2017/050256

申请日：2017-04-21

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc ,  KONING, Johan Joost ,  LODEWIJK, Chris Franciscus Jessica ,  MOOK, Hindrik Willem ,  LATTARD, Ludovic

IPC: H01J37/317 ,  H01J37/02

Abstract: A charged particle beam system is disclosed, comprising: -a charged particle beam generator for generating a beam of charged particles; -a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; -a source for providing a cleaning agent; -a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: -a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and -at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

Abstract translation: 公开了带电粒子束系统，其包括： - 用于产生带电粒子束的带电粒子束发生器; - 设置在真空室中的带电粒子光学镜筒，其中，所述带电粒子光学镜筒布置成用于将所述带电粒子束投射到目标上，并且其中，所述带电粒子光学镜筒包括带电粒子光学元件，用于影响所述带电粒子束 粒子; - 提供清洁剂的来源; - 连接到源的导管，用于将清洁剂引向带电粒子光学元件; 其中所述带电粒子光学元件包括： - 用于传输和/或影响所述带电粒子束的带电粒子传输孔径，以及 - 至少一个通风孔，用于在所述带电粒子的第一侧和第二侧之间提供流动路径 光学元件，其中所述通气孔具有比所述带电粒子发射孔的横截面大的横截面。 此外，公开了一种用于防止或去除带电粒子透射孔中的污染的方法，包括在束发生器处于活动状态时引入清洁剂的步骤。

公开(公告)号：WO2016030004A2

公开(公告)日：2016-03-03

申请号：PCT/EP2015/001685

申请日：2015-08-14

Applicant: MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.

Inventor： HIRSCHT, Julian

IPC: H01J37/02

CPC classification number: H01J37/023 ,  H01J37/065 ,  H01J37/073 ,  H01J37/26 ,  H01J37/295 ,  H01J2237/06333 ,  H01J2237/06341 ,  H01J2237/16

Abstract: A high voltage feedthrough assembly (100) for providing an electric potential in a vacuum environment comprises a flange connector (10) being adapted for a connection with a vacuum vessel (201), wherein the flange connector (10) has an inner side (11) facing to the vacuum vessel (201) and an outer side (12) facing to an environment of the vacuum vessel 201, a vacuumtight insulator tube (20) having a longitudinal extension with a first end (21) facing to the flange connector (10) and a second end (22) being adapted for projecting into the vacuum vessel (201), and an electrode device (30) coupled to the second end (22) of the insulator tube (20), wherein the electrode device (30) has a front electrode (31), including a photocathode or a field emitter tip and facing to the vacuum vessel (201) and a cable adapter (32) for receiving a high-voltage cable (214), wherein a flexible tube connector (40) is provided for a vacuum-tight coupling of the insulator tube (20) with the flange connector (10), and a manipulator device (50) is connected with the insulator tube (20) for adjusting a geometrical arrangement of the insulator tube (20) relative to the flange connector (10). Furthermore, an electron diffraction or imaging apparatus (transmission electron microscope, TEM) 200 for static and/or time-resolved diffraction, including (nano-) crystallography, and real space imaging for structural investigations including the high voltage feedthrough assembly (100) and a method of manipulating an electrode device (30) in a vacuum environment are described.

Abstract translation: 用于在真空环境中提供电位的高压馈通组件（100）包括适于与真空容器（201）连接的凸缘连接器（10），其中所述凸缘连接器（10）具有内侧（11 ）和面向真空容器201的环境的外侧（12）的真空密封绝缘管（20），其具有纵向延伸部，第一端部（21）面向凸缘连接器（20） 10）和适于突出到真空容器（201）中的第二端（22）和耦合到绝缘管（20）的第二端（22）的电极装置（30），其中电极装置（30） ）具有包括光电阴极或场发射极尖端并面向真空容器（201）的前电极（31）和用于接收高压电缆（214）的电缆适配器（32），其中柔性管连接器 40）用于绝缘管（20）与法兰连接器的真空密封联接 （10），并且操纵器装置（50）与所述绝缘管（20）连接，用于调节所述绝缘管（20）相对于所述法兰连接器（10）的几何布置。 此外，用于静态和/或时间分辨衍射的电子衍射或成像装置（透射电子显微镜，TEM）200，包括（纳米）结晶学和用于结构研究的实际空间成像，包括高压馈通组件（100）和 描述了在真空环境中操作电极装置（30）的方法。

公开(公告)号：WO2011152866A1

公开(公告)日：2011-12-08

申请号：PCT/US2011/000989

申请日：2011-06-02

Applicant: AXCELIS TECHNOLOGIES INC. ,  OTA, Kan ,  LEE, William D.

Inventor： OTA, Kan ,  LEE, William D.

IPC: H01J37/317 ,  H01J37/20 ,  H01J37/18 ,  H01J37/02

CPC classification number: H01J37/3171 ,  H01J37/18 ,  H01J37/20 ,  H01J2237/002 ,  H01J2237/166 ,  H01J2237/2001 ,  H01J2237/2005 ,  H01J2237/20278 ,  H01J2237/31701

Abstract: A method for warming a rotational interface in an ion implantation environment provides a scan arm configured to rotate about a first axis and an end effector coupled to the scan arm via a motor to selectively secure a workpiece. The end effector is configured to rotate about a second axis having a bearing and a seal associated with the second axis and motor. The motor is activated, and the rotation of motor is reversed after a predetermined time or when the motor faults due to a rotation the end effector about the second axis. A determination is made as to whether the rotation of the end effector about the second axis is acceptable, and the scan arm is reciprocated about the first axis when the rotation of the end effector is unacceptable, wherein inertia of the end effector causes a rotation of the end effector about the second axis.

Abstract translation: 用于在离子注入环境中加热旋转界面的方法提供了扫描臂，该扫描臂被配置为通过电动机围绕第一轴线和与扫描臂耦合的端部执行器旋转以选择性地固定工件。 末端执行器构造成围绕具有与第二轴和马达相关联的轴承和密封件的第二轴线旋转。 电动机被激活，并且电动机的旋转在预定时间之后或当电动机由于端部执行器围绕第二轴线的旋转而故障时被反转。 确定末端执行器围绕第二轴线的旋转是否可接受，并且当端部执行器的旋转是不可接受的时，扫描臂围绕第一轴线往复运动，其中末端执行器的惯性导致旋转 末端执行器围绕第二轴。