公开(公告)号：WO2003066932A1

公开(公告)日：2003-08-14

申请号：PCT/US2003/003057

申请日：2003-02-03

Applicant: DOW GLOBAL TECHNOLOGIES INC. ,  GABELNICK, Aaron, M. ,  FOX, Richard, T. ,  HU, Ing-Feng ,  DINEGA, Dmitry, P.

Inventor： GABELNICK, Aaron, M. ,  FOX, Richard, T. ,  HU, Ing-Feng ,  DINEGA, Dmitry, P.

IPC: C23C16/509

CPC classification number: C23C16/45565 ,  B05D1/62 ,  C23C16/401 ,  C23C16/503 ,  C23C16/509 ,  C23C16/54

Abstract: A process for creating plasma polymerized deposition on a substrate by a corona discharge is described. The corona discharge is created between an electrode and a counterelectrode supporting a substrate. A mixture of a balance gas and a working gas is flowed rapidly through the electrode, plasma polymerized by corona discharge, and deposited onto the substrate as an optically clear coating. The process, which is preferably carried out at or near atmospheric pressure, can be designed to create an optically clear powder-free or virtually powder free deposit that provides a substrate with properties such as surface modification, chemical resistance, and barrier to gases.

Abstract translation: 描述了通过电晕放电在基板上产生等离子体聚合沉积的工艺。 在电极和支撑衬底的反电极之间产生电晕放电。 平衡气体和工作气体的混合物快速流过电极，等离子体通过电晕放电聚合，并作为光学透明涂层沉积到基底上。 优选在大气压或接近大气压下进行的方法可以被设计成产生光学透明的无粉末或实质上无粉末的沉积物，其提供具有诸如表面改性，耐化学性和气体阻挡性的基材。

公开(公告)号：WO02061787A3

公开(公告)日：2003-03-13

申请号：PCT/US0202622

申请日：2002-01-31

Applicant: PLASMION CORP ,  KIM STEVEN ,  SONG SEOK-KYUN ,  YU DONG WOO

Inventor： KIM STEVEN ,  SONG SEOK-KYUN ,  YU DONG WOO

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/503 ,  H01J37/32 ,  H05K3/00 ,  H05H1/24

CPC classification number: C23C16/45595 ,  C23C16/503 ,  H01J37/32009 ,  H01J37/32532 ,  H05K3/0055

Abstract: A method and an apparatus for treating a workpiece using a plasma are disclosed in the present invention. In treating a workpiece using a plasma, the apparatus includes at least one pin electrode (11) for receiving a power source(10), a dielectric body (12) having first and second sides, wherein the first side is coupled to the pin electrode (11) and the second side has at least one capillary (13) extending to a direction of the first side of the dielectric body, and each capillary (13) is substantially aligned with each pin electrode (11), and a counter electrode (15) electrically coupled to the pin electrode for generating the plasma from each capillary.

Abstract translation: 在本发明中公开了一种使用等离子体处理工件的方法和装置。 在使用等离子体处理工件时，该装置包括用于接收电源（10）的至少一个引脚电极（11），具有第一和第二侧面的电介质体（12），其中第一侧耦合到引脚电极 （11），并且所述第二侧具有延伸到所述电介质体的第一侧的方向的至少一个毛细管（13），并且每个毛细管（13）与每个针电极（11）基本对准，并且对电极 15），电耦合到引脚电极，用于从每个毛细管产生等离子体。

公开(公告)号：WO2003019624A2

公开(公告)日：2003-03-06

申请号：PCT/US2002/027360

申请日：2002-08-27

Applicant: UNIVERSITY OF NEW HAMPSHIRE

Inventor： AMATO-WIERDA, Carmela ,  MOHAN, Chandra ,  MATTHEI, Keith ,  HARIHARAN, Alleppey

IPC: H01L

CPC classification number: C23C16/45519 ,  C23C16/4407 ,  C23C16/4408 ,  C23C16/45595 ,  C23C16/503 ,  C23C16/54 ,  H01J37/32009 ,  H01J37/32348 ,  H01L21/3185

Abstract: In one embodiment, the present invention is a method of coating at least one wafer with silicon nitride. The first step in the method is assembling at least one electrode set, wherein each electrode set includes at least one dielectric barrier between a top electrode and a bottom electrode. The second step is flowing at least one purge gas and at least one reactant at least partially between the electrodes, of at least one electrode set, substantially at atmospheric pressure. The next step in the inventive method is placing a wafer between the electrodes of at least one electrode set, wherein the wafer is substantially encompassed by the flowing gas. The last step in this embodiment of the inventive method is supplying AC power to at least one electrode set thereby causing a dielectric barrier discharge.

Abstract translation: 在一个实施例中，本发明是一种用氮化硅涂覆至少一个晶片的方法。 该方法的第一步是组装至少一个电极组，其中每个电极组包括在顶部电极和底部电极之间的至少一个电介质阻挡层。 第二步骤是基本上在大气压力下使至少一种吹扫气体和至少一种反应物至少部分地在至少一个电极组的电极之间流动。 本发明方法中的下一步是将晶片放置在至少一个电极组的电极之间，其中晶片基本上由流动气体包围。 本发明方法的该实施例中的最后一步是向至少一个电极组供应AC功率，从而引起电介质阻挡放电。

公开(公告)号：WO02025693A1

公开(公告)日：2002-03-28

申请号：PCT/CH2001/000559

申请日：2001-09-17

IPC: H05H1/24 ,  B01J19/08 ,  C08J7/00 ,  C08J7/06 ,  C23C16/503 ,  C23C16/505 ,  H01J37/32

CPC classification number: H01J37/32018 ,  C23C16/503 ,  H01J37/32532

Abstract: During a process, in which a surface is treated using a glow discharge plasma, which is held between two electrodes (10, 10') inside a gas under essentially ambient pressure, undesired effects of plasma filaments, which occur in plasmas of this type, are prevented. To this end, the surface (17) to be treated is positioned inside a peripheral area (14') of the plasma, that is to say, at one side of the plasma space (14) defined by the electrode surfaces (11, 11'), beyond a pair of edges (13, 13'), which are aligned with one another, of the electrode surfaces (11, 11'), and at a distance of a few millimeters from these edges (13, 13'), and said surface is positioned such that it is pointed toward the edges (13, 13'). The treatment gas or the treatment gas mixture is fed to the plasma space (14) from one side, which is located opposite the side of the plasma peripheral area (14'), inside of which the surface (17) to be treated is positioned. During treatment, a substrate (16), whose one surface (17) is to be treated, is stationary or is advanced in direction that is essentially perpendicular to the electrode surfaces (11, 11'), for example, on the peripheral surface of an appropriately arranged rotating drum.

Abstract translation: 在其中一个表面与其中保持基本上环境压力的气体中的辉光放电等离子体的两个电极（10，10“）之间的辅助处理的过程中，避免了发生Plasmafilamenten在这样的等离子体不期望的影响 通过在边缘区域中的待处理表面（17）（14“）露出所述等离子体的，即通过在电极表面（11，11上的一个侧面说”限定等离子室（14）），一对对齐的边缘（13之外， 对置配置）“Eletrodenflächen（11,11）” 13，具有几毫米的距离（从这些边缘13，13“）并抵靠边缘（13，13”）。 处理气体或处理气体混合物从相反的一侧供给到等离子体边缘区域（14“），其中，待处理的表面（17）侧的等离子体室（14）被定位。 在处理过程中，具有表面（17）的基板（16），待治疗，静止的或它是在一个方向上大致垂直于定向方向的电极表面（11，11“）前进时，一个相应地布置，例如，在周缘表面上， 旋转滚筒。

公开(公告)号：WO01068941A1

公开(公告)日：2001-09-20

申请号：PCT/FR2001/000746

申请日：2001-03-13

IPC: B01J19/08 ,  C23C16/40 ,  C23C16/503 ,  C23C16/509 ,  H01J37/32 ,  H01L21/31

CPC classification number: H01J37/32009 ,  C23C16/402 ,  C23C16/503

Abstract: The invention concerns a method for performing chemical reactions between gaseous species in accordance with a selective reaction path, by generating an electric discharge (12) in a starting gas between two energizing electrodes (23, 24) whereto is applied an electric supply voltage, so that the discharge brings about energization of at least one of the gaseous species of said starting gas. The invention is characterised in that it consists in providing the following: the starting gas includes at least a carrier gas and at least a reaction gas; the conditions of electric supply of the electrodes are adapted to enable the generation of metastable species among the species of said carrier gas, so that the ratio, in the inter-electrode space, between the concentration in said metastable species and the concentration in electrons is not less than 1.

Abstract translation: 本发明涉及一种通过在施加电源电压的两个通电电极（23,24）之间的起始气体中产生放电（12），根据选择性反应路径进行气态物质之间的化学反应的方法，因此 放电导致所述起始气体的至少一种气态物质的通电。 本发明的特征在于其提供以下内容：起始气体至少包括载气和至少一种反应气体; 电极的供电条件适于使得能够在所述载气的种类中产生亚稳态物质，使得在所述亚稳态物质中的浓度与电子浓度之间的电极间空间中的比例为 不低于1。

公开(公告)号：WO1998032892A1

公开(公告)日：1998-07-30

申请号：PCT/RU1997000253

申请日：1997-08-12

Applicant: RYABKOV, Danila Vitalievich

IPC: C23C16/44

CPC classification number: C23C16/45565 ,  C23C4/134 ,  C23C16/0245 ,  C23C16/503 ,  H01J37/3244

Abstract: The present invention concerns a method of multifunctional surface treatment, involving a cleaning process and a subsurface plasma coating, whereby the mixture is injected in a gas phase onto the surface to be treated, across through holes provided in the working surface of the anode system. The surface treatment device contains a source and a chamber in which are placed the object to be treated in the working surface as well as the anode and cathode systems. The inventive device is characterized by the presence of a reactor mounted on the anode system and an electrolyte container, arranged inside the chamber and connected to said anode system. The invention enables the surface cleaning to be improved, the operational life of the coating to be guaranteed and the technical process to be accelerated.

Abstract translation: 本发明涉及一种多功能表面处理方法，涉及清洗工艺和地下等离子体涂层，其中混合物通过设在阳极系统的工作表面上的通孔在气相中注入待处理的表面上。 表面处理装置包含源和室，其中放置待处理对象在工作表面以及阳极和阴极系统中。 本发明的装置的特征在于存在安装在阳极系统上的反应器和布置在室内并连接到所述阳极系统的电解质容器。 本发明能够改善表面清洁，保证涂层的使用寿命和加速技术过程。

公开(公告)号：WO1997013886A1

公开(公告)日：1997-04-17

申请号：PCT/US1996016146

申请日：1996-10-09

Applicant: HE HOLDINGS, INC., doing business as HUGHES ELECTRONICS

Inventor： HE HOLDINGS, INC., doing business as HUGHES ELECTRONICS ,  WEI, Ronghua, R. ,  MATOSSIAN, Jesse, N.

IPC: C23C16/26

CPC classification number: H01J37/32009 ,  C23C16/26 ,  C23C16/503 ,  H01J37/32706

Abstract: Diamondlike carbon is deposited on a deposition substrate (46) ina deposition apparatus (40) that can be evacuated and backfilled with a carbonaceous gas. A plasma (68) is generated in the gas by heating a filament (62) within the chamber (42) to produce electrons, and positively biasing the filament (62) with respect to the deposition chamber wall (44) to accelerate the electrons into the carbonaceous gas. The carbonaceous gas dissociates and ionizes in the resulting plasma (68) to produce positively charged carbon ions. The deposition substrate (46) within the chamber (42) is negatively biased with respect to the deposition chamber wall (44), acccelerating the carbon ions so that they are deposited onto the surface of the substrate (46).

Abstract translation: 钻石状碳沉积在沉积设备（40）中的沉积基板（46）上，沉积设备（40）可以被抽气并用碳质气体回填。 通过加热室（42）内的细丝（62）以产生电子，并且相对于沉积室壁（44）使灯丝（62）积极地偏压，从而在气体中产生等离子体（68），以将电子加速 含碳气体。 碳质气体在所得等离子体（68）中离解并离子化以产生带正电荷的碳离子。 室（42）内的沉积衬底（46）相对于沉积室壁（44）被负偏压，加速碳离子，使得它们沉积在衬底（46）的表面上。

公开(公告)号：WO1997012757A1

公开(公告)日：1997-04-10

申请号：PCT/US1996015358

申请日：1996-09-25

Applicant: ADVANCED REFRACTORY TECHNOLOGIES, INC.

Inventor： ADVANCED REFRACTORY TECHNOLOGIES, INC. ,  GOEL, Arvind ,  BRAY, Donald, J.

IPC: B32B09/00

CPC classification number: C23C16/30 ,  B26B21/60 ,  B82Y30/00 ,  C23C16/44 ,  C23C16/4483 ,  C23C16/503 ,  Y10T428/265 ,  Y10T428/30 ,  Y10T428/31678

Abstract: A method for preserving the precision-edges of a precision-edged substrate by applying to a substrate a corrosion resistant coating comprising a diamond-like solid state material having interpenetrating atomic scale networks comprising a first diamond-like carbon network stabilized by hydrogen, a silicon network stabilized by oxygen, and optionally at least one network made from dopant elements or dopant compounds containing elements from Groups 1-7b and 8 of the periodic table.

Abstract translation: 一种用于通过向基板施加包含具有互穿原子尺度网络的类金刚石固体材料的耐腐蚀涂层来保持精密边缘的精密边缘的方法，该网络包括由氢稳定的第一类金刚石碳网络，硅 由氧稳定的网络，以及任选的至少一个由掺杂元素构成的网络或包含周期表第1-7b和8族元素的掺杂剂化合物。

公开(公告)号：WO1996041034A1

公开(公告)日：1996-12-19

申请号：PCT/US1996008820

申请日：1996-06-05

Applicant: ADVANCED REFRACTORY TECHNOLOGIES, INC.

Inventor： ADVANCED REFRACTORY TECHNOLOGIES, INC. ,  DORFMAN, Veniamin, F. ,  GOEL, Arvind

IPC: C23C14/06

CPC classification number: A61L27/30 ,  A61F2310/00574 ,  A61L27/303 ,  A61L27/306 ,  B82Y30/00 ,  C04B41/5002 ,  C04B41/85 ,  C23C14/0036 ,  C23C14/06 ,  C23C14/0605 ,  C23C14/221 ,  C23C16/30 ,  C23C16/4483 ,  C23C16/4485 ,  C23C16/45568 ,  C23C16/503 ,  F42B12/80 ,  G02B1/105 ,  G02B1/111 ,  G02B1/16 ,  G11B5/72 ,  G11B5/8408 ,  Y10T428/24917 ,  Y10T428/24926 ,  Y10T428/30

Abstract: An electrically tunable coating and method for its fabrication and deposition comprising, as a coating on a substrate, a diamond-like nanocomposite solid-state material having interpenetrating atomic scale networks of carbon in a diamond-like carbon network stabilized by hydrogen, a glass-like silicon network stabilized by oxygen, and optionally at least one additional network of dopant elements or dopant compounds having elements from groups 1-7b and 8 of the periodic table.

Abstract translation: 一种用于其制造和沉积的电可调涂层和方法，包括作为衬底上的涂层的金刚石状纳米复合固体材料，其具有由氢稳定的类金刚石碳网络中的碳互穿原子尺度网络，玻璃 - 由氧稳定的硅网络，以及任选地至少一个具有元素周期表的组1-7b和8的元素的掺杂元素或掺杂剂化合物的附加网络。

公开(公告)号：WO1996039943A1

公开(公告)日：1996-12-19

申请号：PCT/US1996008754

申请日：1996-06-05

Applicant: ADVANCED REFRACTORY TECHNOLOGIES, INC.

Inventor： ADVANCED REFRACTORY TECHNOLOGIES, INC. ,  DORFMAN, Veniamin, F. ,  GOEL, Arvind

IPC: A61B17/00

CPC classification number: C04B41/009 ,  A61F2310/00574 ,  A61L27/30 ,  A61L27/303 ,  A61L27/306 ,  B82Y30/00 ,  C04B41/5002 ,  C04B41/85 ,  C23C14/0036 ,  C23C14/06 ,  C23C14/0605 ,  C23C14/221 ,  C23C16/30 ,  C23C16/4483 ,  C23C16/4485 ,  C23C16/45568 ,  C23C16/503 ,  F42B12/80 ,  G02B1/105 ,  G02B1/111 ,  G02B1/14 ,  G11B5/72 ,  G11B5/8408 ,  Y10T428/30 ,  C04B41/4554 ,  C04B41/50 ,  C04B35/10

Abstract: A method for inhibiting corrosion of a substrate by applying to a substrate a corrosion resistant coating comprising a diamond-like solid state material having interpenetrating atomic scale networks of class of diamond-like solid state materials formed from interpenetrating networks comprising a first network of carbon in a diamond-like carbon network stabilized by hydrogen, a silicon network stabilized by oxygen, and optionally at least one network made from dopant elements or dopant compounds containing elements from groups 1-7b and 8 of the periodic table.

Abstract translation: 一种通过向基体施加包含类金刚石状固体材料的耐腐蚀涂层来抑制基材腐蚀的方法，所述耐腐蚀涂层具有由互穿网络形成的类金刚石状固态材料的互穿原子尺度网络，所述互穿网络包括第一碳网络 通过氢稳定的类金刚石碳网络，由氧稳定的硅网络，以及任选的至少一个由掺杂元素或含有元素周期表1-7b和8元素的掺杂剂构成的网络。