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公开(公告)号：WO2016038594A1
公开(公告)日：2016-03-17
申请号：PCT/IL2015/000042
申请日：2015-09-16
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： VAID, Alok, , WAINREB, Gilad , LITTWIN, Etai , KLOTS, Michael , BOZDOG, Cornel , SENDELBACH, Matthew
CPC classification number: G01B11/06 , G01B2210/56 , G03F7/705 , G03F7/70625
Abstract: A method and system are presented for use in model-based optical measurements in patterned structures. The method comprises: selecting an optimal optical model for interpretation of optical measured data indicative of optical response of the structure under measurements. The selection of the optimal optical model comprises: creating a complete optical model with floating parameters defining multiple configurations of said complete model including one or more model configurations describing an optical response of the structure under measurements, utilizing the complete model for predicting a reference optical response from the structure and generating corresponding virtual reference data, and using the virtual reference data for selecting the optimal optical model for interpretation of the optical measured data.
Abstract translation: 提出了一种用于图案化结构中基于模型的光学测量的方法和系统。 该方法包括：选择用于解释表示测量结构的光学响应的光学测量数据的最佳光学模型。 最佳光学模型的选择包括：创建具有定义所述完整模型的多个配置的浮动参数的完整光学模型，包括描述测量结构的光学响应的一个或多个模型配置，利用完整模型来预测参考光学响应 并从该结构生成对应的虚拟参考数据，并使用虚拟参考数据来选择用于解释光学测量数据的最佳光学模型。
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公开(公告)号：WO2015128866A1
公开(公告)日：2015-09-03
申请号：PCT/IL2015/050216
申请日：2015-02-26
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： SENDELBACH, Matthew , SARIG, Niv , ARCHIE, Charles N.
CPC classification number: G03F7/70625 , G01B2210/56 , H01J37/28 , H04B17/309 , H04B17/3912
Abstract: A method for use in planning metrology measurements, the method comprising: providing inverse total measurement uncertainty (TMU) analysis equations for upper and lower confidence limits TMU UL and TMU LL of the TMU being independent on prior knowledge of measurements by a tool under test (TuT) and a reference measurement system (RMS), thereby enabling estimation of input parameters for said equations prior to conducting an experiment of the TMU analysis; and determining at least one of a total number N of samples to be measured in the TMU analysis and an average number n s of measurements per sample by the RMS.
Abstract translation: 一种用于规划度量测量的方法，所述方法包括：提供用于上限和下限置信限的反向总测量不确定度（TMU）分析方程，TMUU和TMU独立于被测试工具（TuT）的现有测量知识， 和参考测量系统（RMS），从而能够在进行TMU分析的实验之前估计所述方程的输入参数; 并且在TMU分析中确定待测量的样本的总数N中的至少一个以及RMS的每个样本的平均值n s。
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公开(公告)号：WO2015121867A1
公开(公告)日：2015-08-20
申请号：PCT/IL2015/050174
申请日：2015-02-16
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： BARAK, Gilad , VERDENE, Tal , YACHINI, Michal , SHAFIR, Dror , MOON, Changman , WOLFLING, Shay
IPC: G06F17/50
CPC classification number: G06F17/5081 , G03F7/70633 , G03F7/70683 , G06F17/5072
Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.
Abstract translation: 呈现包括覆盖目标的样本。 所述覆盖目标包括至少一对图案化结构，所述对的图案化结构在样品的分别底部和顶层中以它们之间的一定垂直距离h容纳在其中，其中至少一个图案化结构中的图案具有 对于具有预定波长范围的预定光学覆盖测量方案优化的至少一个图案参数。
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24.发明申请
公开(公告)号：WO2014016839A1
公开(公告)日：2014-01-30
申请号：PCT/IL2013/050635
申请日：2013-07-24
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： BARAK, Gilad , HAINICK, Yanir , SHAFIR, Dror
CPC classification number: G01N21/9501 , G01N21/8806 , G01N2021/8848 , G01N2201/061 , G01N2201/0683 , G01N2201/12 , G02B21/0016 , G02B21/002 , G02B21/0092 , G02B27/46
Abstract: An optical method and system are presented for use in measurement of isolated features of a structure. According to this technique, Back Focal Plane Microscopy (BFM) measurements are applied to a structure and measured data indicative thereof is obtained, wherein the BFM measurements utilize dark-field detection mode while applying pinhole masking to incident light propagating through an illumination channel towards the structure, the measured data being thereby indicative of a scattering matrix characterizing scattering properties of the structure, enabling identification of one or more isolated features of the structure.
Abstract translation: 提出了一种光学方法和系统，用于测量结构的隔离特征。 根据该技术，将后焦距平面显微镜（BFM）测量应用于结构，并且获得表示其的测量数据，其中BFM测量利用暗场检测模式，同时对通过照明通道传播的入射光施加针孔掩蔽 结构，因此所测量的数据表示表征结构的散射特性的散射矩阵，使得能够识别结构的一个或多个隔离特征。
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公开(公告)号：WO2013011508A2
公开(公告)日：2013-01-24
申请号：PCT/IL2012/050253
申请日：2012-07-18
Applicant: NOVA MEASURING INSTRUMENTS LTD. , BARAK, Gilad , BRILL, Boaz
Inventor： BARAK, Gilad , BRILL, Boaz
CPC classification number: G01B11/22 , G01B11/24 , G01N21/27 , G01N21/9501 , G03F7/70625 , H01L22/12 , H01L2924/0002 , H01L2924/00
Abstract: An optical system is presented for use in measuring in patterned structures having vias. The optical system comprises an illumination channel for propagating illuminated light onto the structure being measured; a detection channel for collecting light returned from the illuminated structure to a detection unit; and an attenuation assembly accommodated in the illumination and detection channels and being configured and operable for selectively attenuating light propagating along the detection channel, the attenuation creating a predetermined condition for the selectively attenuated light, said predetermined condition being defined by a predetermined ratio between a first light portion corresponding to a dark field condition and a second light portion corresponding to a bright field condition in said selectively attenuated light, detected selectively attenuated light being therefore indicative of at least one parameter of the via being illuminated.
Abstract translation: 提出了一种用于在具有通孔的图案化结构中进行测量的光学系统。 该光学系统包括用于将照明光传播到被测量的结构上的照明通道; 检测通道，用于收集从照明结构返回到检测单元的光; 以及衰减组件，其容纳在所述照明和检测通道中，并且被配置并可操作用于选择性地衰减沿着所述检测通道传播的光，所述衰减为所述选择性衰减的光创建预定条件，所述预定条件由第一 因此检测到的选择性衰减的光因此指示通孔的至少一个参数被照亮。
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Patent Agency Ranking
公开(公告)号：WO2012095808A1
公开(公告)日：2012-07-19
申请号：PCT/IB2012/050157
申请日：2012-01-12
Applicant: NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz
Inventor： BRILL, Boaz
IPC: G01B11/14
CPC classification number: G03F7/70516 , G01B11/14 , G01B2210/56 , G01N21/4788 , G01N2021/8416 , G03F7/705 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G03G15/50 , H01L22/12 , H01L2924/0002 , H01L2924/00
Abstract: A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of patterned features, b) illuminating the periodic structure with a light, thereby producing a non-zero order diffraction signal, c) collecting the diffraction signal to produce a test signature, d) matching the test signature with a reference signature, where the reference signature was previously produced by performing steps a), b), and c) with respect to a reference structure that is at least similar to the periodic structure, and e) controlling a manufacturing process using a control setting set associated with the matching reference signature.
Abstract translation: 一种控制制造过程的方法，所述方法包括以下步骤：a）提供具有周期性结构的测试区域，其中周期性结构包括一系列图案化特征，b）用光照射周期性结构，从而产生 非零级衍射信号，c）收集衍射信号以产生测试签名，d）使测试签名与参考签名相匹配，其中先前通过执行步骤a），b）和c）产生参考签名; 相对于至少类似于周期性结构的参考结构，以及e）使用与匹配参考签名相关联的控制设置集来控制制造过程。
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公开(公告)号：WO2012093400A9
公开(公告)日：2012-07-12
申请号：PCT/IL2012/050003
申请日：2012-01-03
Applicant: NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz , SHERMAN, Boris
Inventor： BRILL, Boaz , SHERMAN, Boris
Abstract: A method and system are presented for use in measuring in complex patterned structures. A full model and at least one approximate model are provided for the same measurement site in a structure, said at least one approximate model satisfying a condition that a relation between the full model and the approximate model is defined by a predetermined function. A library is created for simulated data calculated by the approximate model for the entire parametric space of the approximate model. Also provided is data corresponding to simulated data calculated by the full model in selected points of said parametric space. The library for the approximate model data and said data of the full model are utilized for creating a library of values of a correction term for said parametric space, the correction term being determined as said predetermined function of the relation between the full model and the approximate model. This enable to process measured data by fitting said measured data to the simulated data calculated by the approximate model corrected by a corresponding value of the correction term.
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28.发明申请METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED STRUCTURES 审中-公开用于优化图形结构光学检测的方法和系统
公开(公告)号：WO2011158239A1
公开(公告)日：2011-12-22
申请号：PCT/IL2011/000479
申请日：2011-06-16
Applicant: NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz
Inventor： BRILL, Boaz
IPC: G01B15/04
CPC classification number: G06T7/0004 , G01B11/02 , G01B21/02 , G01B2210/56 , G03F7/70625 , G06T7/80 , G06T2207/30148
Abstract: A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.
Abstract translation: 提出了一种用于图案化结构检查的系统和方法。 该系统包括：用于接收指示图案化结构的至少一部分上的图像数据的第一类型数据的数据输入实用程序，以及被配置和可操作用于分析图像数据的数据处理和分析实用程序，以及至少确定几何模型 所述结构中的图案的一个特征，并且使用所述几何模型来确定用于指示图案化结构上的光学测量的第二类型数据的光学模型。
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公开(公告)号：WO2003075042A3
公开(公告)日：2003-09-12
申请号：PCT/IL2003/000168
申请日：2003-03-04
Applicant: NOVA MEASURING INSTRUMENTS LTD. , BRILL, Boaz , GOV, Shahar
Inventor： BRILL, Boaz , GOV, Shahar
IPC: G03B27/54
Abstract: A method and a system for optical measuring in a structure having a pattern in the form of spaced-apart parallel elongated regions of optical properties different from that of spaces between said regions. The system comprises a broadband illuminator (8) for generating incident radiation, a spectrophotometer arrangement (30) for detecting a spectral response of the structure to the incident radiation, and an optical arrangement (2) for directing the incident light to the structure and collecting the response of the structure, said optical arrangement (2) comprising a numerical aperture (32) selectively limiting the range of at least one of light incidence or collecting angles in direction substantially perpendicular to longitudinal axes of said elongated regions of the pattern.
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公开(公告)号：WO2003017322A3
公开(公告)日：2003-02-27
申请号：PCT/IL2002/000655
申请日：2002-08-08
Applicant: NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe
Inventor： FINAROV, Moshe
Abstract: A method and system are presented for measuring in a patterned structure to thereby enabling to control a process. An image of at least a region of patterned structure formed by light returned from the illuminated region is acquired and analysed to determine sites of the structure to which electrical measurements are to be applied. Electrical measurements to the predetermined sites of the structure are applied and measured data indicative of at least one parameter of the structure is generated for adjusting operating conditions of the process.
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